Method for operating a solid-state actuator in a microlithographic projection exposure apparatus
US-2026072357-A1 · Mar 12, 2026 · US
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Raab Markus patents
Raab Markus is listed as an inventor on 25 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Raab Markus |
| Total patents | 25 |
| First publication | Jun 18, 2015 |
| Latest publication | Mar 12, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Adaptive optical module
US-2026064008-A1 · Mar 5, 2026 · US
Adaptive optical module for a microlithographic projection exposure apparatus
US-2025390024-A1 · Dec 25, 2025 · US
Optical assembly, method for controlling an optical assembly, and projection exposure apparatus
US-12443110-B2 · Oct 14, 2025 · US
Optical system, and method for operating an optical system
US-2025258444-A1 · Aug 14, 2025 · US
Projection exposure apparatus for semiconductor lithography
US-12372877-B2 · Jul 29, 2025 · US
Mirror device, for example for a microlithographic projection exposure system, and method for measuring the temperature of a mirror
US-2025216794-A1 · Jul 3, 2025 · US
Optical assembly, projection exposure apparatus and method
US-12313978-B2 · May 27, 2025 · US
Optical element and projection exposure apparatus for semiconductor lithography
US-2025130504-A1 · Apr 24, 2025 · US
Method for compensating actuator effects of actuators
US-2025110413-A1 · Apr 3, 2025 · US
Recent patents
Latest publications not already listed above.
Optical system and lithography apparatus
US-12130557-B2 · Oct 29, 2024 · US
Method for operating a vehicle equipped for an automated driving operation
US-2024262389-A1 · Aug 8, 2024 · US
Optical device, method for adjusting a setpoint deformation and lithography system
US-2024085783-A1 · Mar 14, 2024 · US
Projection exposure apparatus and method for designing a component of a projection exposure apparatus
US-2024085800-A1 · Mar 14, 2024 · US
Projection exposure apparatus for semiconductor lithography
US-2024012334-A1 · Jan 11, 2024 · US
Adaptive optical element for microlithography
US-2023229091-A1 · Jul 20, 2023 · US
Adaptive optical element for microlithography
US-2023229092-A1 · Jul 20, 2023 · US
Method and device for measuring actuators in a projection exposure apparatus for semiconductor lithography
US-2023228798-A1 · Jul 20, 2023 · US
Optical assembly, method for controlling an optical assembly, and projection exposure apparatus
US-2023176486-A1 · Jun 8, 2023 · US
Optical system and lithography apparatus
US-2022382166-A1 · Dec 1, 2022 · US
Optical assembly, projection exposure apparatus and method
US-2022382165-A1 · Dec 1, 2022 · US
Gripper device, and use of a gripper device
US-10695914-B2 · Jun 30, 2020 · US
Sensor means for detection of bioelectrical signals
US-10172560-B2 · Jan 8, 2019 · US
Gripper device, and use of a gripper device
US-2017225338-A1 · Aug 10, 2017 · US
Sensor means for detection of bioelectrical signals
US-2015164425-A1 · Jun 18, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 20 |
| Eto Magnetic Gmbh | 2 |
| Cortec Gmbh | 2 |
| Univ Freiburg Albert Ludwigs | 2 |
| Mercedes Benz Group Ag | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70266 | 20 |
| G02B26/0825 | 13 |
| G02B5/0891 | 10 |
| G03F7/7085 | 9 |
| G03F7/70891 | 9 |