Semiconductor device package and a method of manufacturing the same
US-2019067211-A1 · Feb 28, 2019 · US
US12243835B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12243835-B2 |
| Application number | US-202217679082-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 24, 2022 |
| Priority date | Nov 30, 2018 |
| Publication date | Mar 4, 2025 |
| Grant date | Mar 4, 2025 |
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A multi-layer package substrate includes a first build-up layer including a first dielectric layer and at least a second build-up layer including a second dielectric layer on the first build-up layer. The second build-up layer includes a top metal layer with a surface configured for attaching at least one integrated circuit (IC) die. The first build-up layer includes a bottom metal layer and a first microvia extending through the first dielectric layer, and the second build-up layer includes at least a second microvia extending through the second dielectric layer that is coupled to the first microvia. A barrier ring that has a coefficient of thermal expansion (CTE) matching material relative to a CTE of a metal of the second microvia positioned along only a portion of a height of at least the second microvia including at least around a top portion of the second microvia.
Opening claim text (preview).
The invention claimed is: 1. A method of fabricating a multi-layer package substrate, comprising: forming a first build-up layer including a first dielectric layer and at least a second build-up layer including a second dielectric layer on the first build-up layer, wherein the second build-up layer includes a top metal surface that is configured for attaching at least one integrated circuit (IC) die; wherein the first build-up layer includes a first tapered microvia extending through the first dielectric layer and the second build-up layer includes at least a second tapered microvia extending through the second dielectric layer that is coupled to the first microvia; further comprising a barrier ring having a coefficient of thermal expansion (CTE) matching material relative to a metal of the second tapered microvia positioned along only a portion of a height of at least the second tapered microvia along a smallest diameter of the second tapered microvia, the barrier ring directly connected to the metal of the second tapered microvia. 2. The method of claim 1 , wherein the CTE matching material has a CTE that is within 5 ppm/° C. of a CTE of the metal of the second tapered microvia. 3. The method of claim 1 , wherein the CTE matching material and the second tapered microvia both comprise a same material. 4. The method of claim 1 , wherein the first dielectric layer and the second dielectric layer both comprise an organic dielectric polymer. 5. The method of claim 1 , wherein the barrier ring is positioned within 10 millimeters under at least one outer edge of the IC die. 6. The method of claim 1 , wherein the barrier ring is 2 μm to 8 μm thick and has an outer diameter that is at least 10% greater than an outer diameter of the second tapered microvia. 7. The method of claim 1 , further providing a core that the first and second build-up layers are on. 8. A method of fabricating a packaged integrated circuit (IC) device, comprising: providing at least one IC die, and providing a package substrate comprising: a first build-up layer including a first dielectric layer and at least a second build-up layer including a second dielectric layer on the first build-up layer, wherein the second build-up layer includes a top metal surface that is configured for attaching the IC die; wherein the first build-up layer includes a first tapered microvia extending through the first dielectric layer and the second build-up layer includes at least a second tapered microvia extending through the second dielectric layer that is coupled to the first tapered microvia; further comprising a barrier ring having a coefficient of thermal expansion (CTE) matching material relative to a CTE of a metal of the second tapered microvia positioned along only a portion of a height of at least the second tapered microvia along a smallest diameter of the second tapered microvia, the barrier ring directly connected to the metal of the second tapered microvia. 9. The method of claim 8 , wherein the CTE matching material has a CTE that is within 5 ppm/° C. of a CTE of the metal of the second tapered microvia. 10. The method of claim 8 , wherein the barrier ring is 2 μm to 8 μm thick and has an outer diameter that is at least 10% greater than an outer diameter of the second tapered microvia. 11. The method of claim 8 , wherein the CTE matching material and the second tapered microvia both comprise a same material. 12. The method of claim 10 , wherein the CTE matching material has a CTE that is within 5 ppm/° C. of a CTE of the metal of the second tapered microvia. 13. The method of claim 9 , wherein the barrier ring is 2 μm to 8 μm thick and has an outer diameter that is at least 10% greater than an outer diameter of the second tapered microvia. 14. The method of claim 9 , wherein the CTE matching material and the second tapered microvia both comprise a same material. 15. The method of claim 10 , wherein the CTE matching material and the second tapered microvia both comprise a same material. 16. The method of claim 8 , wherein the first dielectric layer and the second dielectric layer both comprise an organic dielectric polymer. 17. The method of claim 8 , wherein the barrier ring is positioned within 10 millimeters under at least one outer edge of the IC die. 18. The method of claim 8 , further comprising a core that the first and second build-up layers are on. 19. The method of claim 7 , wherein the core comprises organic material.
comprising multiple insulating layers · CPC title
Through-vias · CPC title
of vias therein · CPC title
of insulating or insulated package substrates, or of interposers, or of redistribution layers (manufacture or treatment of leadframes H10W70/04) · CPC title
protecting against mechanical damage (H10W76/00, H10W74/00 take precedence) · CPC title
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