Substrate processing device and etching liquid

Patent metadata

Field	Value
Publication number	US-12203021-B2
Application number	US-202217654640-A
Country	US
Kind code	B2
Filing date	Mar 14, 2022
Priority date	Jan 30, 2018
Publication date	Jan 21, 2025
Grant date	Jan 21, 2025

Abstract

A substrate processing method includes holding a substrate; and supplying an etching liquid to the substrate held in the holding of the substrate. The etching liquid contains an etching agent configured to etch a metal-based first material and a silicon-based second material exposed on the substrate and a protection agent configured to react with the second material between the first material and the second material to form a protection layer on a surface of the second material. Here, the etching agent is a liquid which contains fluorine atoms and an organic solvent and substantially does not contain water, and the protection layer protects the second material from etching with the etching agent.

First claim

We claim:

1. A substrate processing device, comprising:
a holder configured to hold a substrate;
a first nozzle for supplying an etching liquid and a second nozzle for supplying an organic processing liquid to the substrate held by the holder, the etching liquid containing an etching agent configured to etch a metal-based first material and a silicon-based second material exposed on the substrate and a protection agent configured to react with the second material between the first material and the second material to form a protection layer on a surface of the second material, the etching agent being a liquid which contains fluorine atoms and an organic solvent and substantially does not contain water, and the protection layer protecting the second material from etching with the etching agent;
a separation unit configured to separate the organic solvent from a used etching liquid serving as the etching liquid supplied to the substrate by the first nozzle;
a first drain pipe configured to discharge the used etching liquid when the etching liquid is supplied by the first nozzle; and
a second drain pipe configured to discharge a used organic processing liquid when the organic processing liquid is supplied by the second nozzle,
wherein the separation unit includes:
a heater provided at an outer circumference of the first drain pipe and configured to heat the used etching liquid flowing through the first drain pipe; and
a connection pipe, including a cooler provided at the connection pipe and configured to liquefy the organic solvent, the connection pipe configured to connect the first drain pipe and the second drain pipe and guide the organic solvent, which is vaporized by being heated with the heater, to the second drain pipe.

2. The substrate processing device of claim 1 ,
wherein the heater is an electric pipe heater used by being wound around the outer circumference of the first drain pipe.

Assignees

• Tokyo Electron Ltd

Inventors

• Hiroshiro Koukichi
• Sakazaki Tetsuya
• Kagawa Koji
• Sekiguchi Kenji
• Mizumoto Kazuyoshi

Classifications

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0424

  using mainly spraying means, e.g. nozzles · CPC title

• H10P50/667 Primary

  by liquid etching only · CPC title

• H10P50/283

  by chemical means · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title