Resist composition and method for producing resist pattern

Patent metadata

Field	Value
Publication number	US-12164229-B2
Application number	US-201916724455-A
Country	US
Kind code	B2
Filing date	Dec 23, 2019
Priority date	Dec 27, 2018
Publication date	Dec 10, 2024
Grant date	Dec 10, 2024

Abstract

A resist composition includes a novolak resin in which a hydroxy group is substituted with a group represented by formula (3), an acid generator, a quencher, and a solvent:

wherein, in formula (3), R a10 represents a hydrocarbon group having 1 to 20 carbon atoms (e.g., a chain hydrocarbon group such as an alkyl group, an alkenyl group and an alkynyl group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, groups formed by combining these groups, etc.) and * represents a bond.

First claim

The invention claimed is:

1. A resist composition comprising a novolak resin in which a hydroxy group is substituted with a group represented by formula (3), an alkali-soluble resin, an acid generator, a quencher, and a solvent:

wherein, in formula (3), R a10 represents a hydrocarbon group having 1 to 20 carbon atoms, and * represents a bond.

2. The resist composition according to claim 1 , wherein the novolak resin is a phenol novolak resin.

3. The resist composition according to claim 1 , further comprising a resin having a group represented by formula (2):

wherein, in formula (2), R a1′ and R a2′ each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, and R a3′ represents a hydrocarbon group having 1 to 20 carbon atoms, or
R a1′ represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, R a2′ and
R a3′ are bonded to each other to form a heterocyclic group having 2 to 20 carbon atoms together with carbon atoms and oxygen atoms to which R a2′ and R a3′ are bonded, a methylene group included in the hydrocarbon group having 1 to 12 carbon atoms, the hydrocarbon group having 1 to 20 carbon atoms, and the heterocyclic group having 2 to 20 carbon atoms may be substituted with an oxygen atom or a sulfur atom, and * represents a bond.

4. The resist composition according to claim 3 , wherein the resin having a group represented by formula (2) is a resin including a structural unit represented by formula (a1-2):

wherein, in formula (a1-2),
R a1′ and R a2′ each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, R a3′ represents a hydrocarbon group having 1 to 20 carbon atoms, or

R a1′ represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, R 2′ and R 3 are bonded to each other to form a divalent heterocyclic group having 2 to 20 carbon atoms together with carbon atoms and oxygen atoms to which R a2′ and R a3′ are bonded, a methylene group included in the hydrocarbon group having 1 to 12 carbon atoms, the hydrocarbon group having 1 to 20 carbon atoms, and the heterocyclic group having 2 to 20 carbon atoms may be substituted with an oxygen atom or a sulfur atom,
R a5 represents a hydrogen atom or a methyl group,
R a6 represents an alkyl group having 1 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms, and
m represents an integer of 0 to 4, and when m is 2 or more, a plurality of R a6 may be the same or different from each other.

5. The resist composition according to claim 3 , wherein the resin having a group represented by formula (2) is a novolak resin and a hydroxy group of the novolak resin is substituted with a group represented by formula (2).

6. A method for producing a resist pattern, which comprises:
(1) a step of applying the resist composition according to claim 1 on a substrate,
(2) a step of drying the applied composition to form a composition layer,
(3) a step of exposing the composition layer, and
(4) a step of developing the exposed composition layer.

7. The resist composition according to claim 1 , wherein the acid generator is a compound having a group represented by formula (B1):

wherein, in formula (B1), R b1 represents a hydrocarbon group having 1 to 18 carbon atoms which may have a fluorine atom, and a methylene group included in the hydrocarbon group may be substituted with an oxygen atom or a carbonyl group, and
* represents a bond.

8. The resist composition according to claim 7 , wherein the acid generator is a compound represented by formula (b1), formula (b2), or formula (b3):

wherein, in formula (b1) to formula (b3), R b1 is the same as defined in claim 7 , R b12′ , R b3 , and R b4 each independently represent a hydrogen atom , an alkyl group having 1 to 8carbon atoms, or an alkoxy group having 1 to 8 carbon atoms,
ring Wb 1 represents an aromatic hydrocarbon ring having 6 to 14 carbon atoms or an aromatic heterocyclic ring having 6 to 14 carbon atoms, and
x represents an integer of 0 to 2, and when x is 2, a plurality of R b12′ may be the same or different.

9. The resist composition according to claim 1 , wherein the acid generator is a compound represented by formula (b8) or formula (b9):

wherein, in formula (b8) and formula (b9), A b1 and A b2 each independently represent an oxygen atom or a sulfur atom,
R b8 , R b9 , R b10 and R b11 each independently represent an alkyl group having 1 to 10 carbon atoms or an aromatic hydrocarbon group having 6 to 12 carbon atoms, and
X1 - and X2 - represent an organic anion.

10. The resist composition according to claim 1 , wherein the quencher is a compound represented by formula (C1) or formula (C2):

wherein, in formula (C1), R c1 , R c2 and R c3 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alicyclic hydrocarbon group having 5 to 10 carbon atoms, or an aromatic hydrocarbon group having 6 to 10 carbon atoms, a hydrogen atom included in the alkyl group and the alicyclic hydrocarbon group may be substituted with a hydroxy group, an amino group, or an alkoxy group having 1 to 6 carbon atoms, and a hydrogen atom included in the aromatic hydrocarbon group may be substituted with an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an alicyclic hydrocarbon group having 5 to 10 carbon atoms;

wherein, in formula (C2), ring W 1 represents a heterocyclic ring having a nitrogen atom as a ring-constituting atom, or a benzene ring having a substituted or unsubstituted amino group, and the heterocyclic ring and the benzene ring may have at least one selected from the group consisting of a hydroxy group and an alkyl group having 1 to 4 carbon atoms,
A 1 represents a phenyl group or a naphthyl group, and
nc represents 2 or 3 and a plurality of A 1 may be the same or different.

11. The resist composition according to claim 1 , wherein the quencher is a basic nitrogen-containing organic compound.

12. The resist composition according to claim 1 , wherein the group represented by formula (3) is a group represented by formula (3A):

wherein, in formula (3A), R a1 , R a2 and R a3 each independently represent an alkyl group having 1to 8 carbon atoms or an alicyclic hydrocarbon group having 3 to 20 carbon atoms, or
R a1 and R a2 may be bonded to each other to form an alicyclic hydrocarbon group having 3 to 20carbon atoms together with carbon atoms to which R a1 and R a2 are bonded, R a3 represents an alkyl group having 1 to 8 carbon atoms or an alicyclic hydrocarbon group having 3 to 20 carbon atoms, and * represents a bo

Assignees

• Sumitomo Chemical Co

Inventors

• Sugihara Masako
• Higo Mutsuko

Classifications

• G03F7/2004

  characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light · CPC title

• C08L25/18

  Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen · CPC title

• C07C49/175

  containing ether groups, [IMAGE cpc-sch-C07C-0958.gif] groups,[IMAGE cpc-sch-C07C-0959.gif] groups, or[IMAGE cpc-sch-C07C-0960.gif] groups · CPC title

• G03F7/32

  Liquid compositions therefor, e.g. developers · CPC title

• C08L61/14

  Modified phenol-aldehyde condensates · CPC title