Resist composition and method for producing resist pattern

Patent metadata

Field	Value
Publication number	US-2016291464-A1
Application number	US-201615085386-A
Country	US
Kind code	A1
Filing date	Mar 30, 2016
Priority date	Mar 31, 2015
Publication date	Oct 6, 2016
Grant date	—

Abstract

A resist composition contains: a novolak resin (A1) having a protective group capable of being cleaved by action of an acid, an acid generator (B), an anticorrosive agent (G), and a solvent (D) as well as a method for producing a resist pattern includes steps (1) to (4); (1) applying the resist composition according to the above onto a substrate; (2) drying the applied composition to form a composition layer; (3) exposing the composition layer; and (4) developing the exposed composition layer.

First claim

What is claimed is:

1 . A resist composition comprising:
a novolak resin (A1) having a protective group capable of being cleaved by action of an acid, an acid generator (B), an anticorrosive agent (G), and a solvent (D).

2 . The resist composition according to claim 1 wherein
the resin (A1) has an acetal group.

3 . The resist composition according to claim 2 wherein
the acetal group has a structure represented by —O—CH(CH 3 )—O—.

4 . The resist composition according to claim 1 wherein
the protective group is selected from the group consisting of an ethoxyethyl group, an isopropyloxyethyl group and a cyclohexyloxyethyl group.

5 . The resist composition according to claim 1 further comprising a novolak resin having no protective group.

6 . The resist composition according to claim 1 further comprising a resin that has an acid-labile group and is different from the resin (A1).

7 . The resist composition according to claim 1 wherein
the anticorrosive agent (G) is at least one selected from the group consisting of a sulfur-containing compound, an aromatic hydroxyl compound, a silicon-containing compound, a benzotriazol compound and a triazine compound.

8 . The resist composition according to claim 7 wherein
the sulfur-containing compound is a compound having a mercapto group and a sulfide bond.

9 . The resist composition according to claim 8 wherein
the compound having a mercapto group and a sulfide bond is a compound represented by formula (IA):

wherein R i1 represents a hydrogen atom, a C 1 to C 10 aliphatic hydrocarbon group, a C 3 to C 18 alicyclic hydrocarbon group, a C 6 to C 14 aromatic hydrocarbon group, —SR 11 or —N(R 12 )(R 13 );
R 11 , R 12 and R 13 each independently represent a hydrogen atom, a C 1 to C 10 aliphatic hydrocarbon group, a C 3 to C 10 alicyclic hydrocarbon group, a C 6 to C 14 aromatic hydrocarbon group or a C 1 to C 12 acyl group;
R i2 and R i3 each independently represent a hydrogen atom, a C 1 to C 10 aliphatic hydrocarbon group, a C 3 to C 18 alicyclic hydrocarbon group or a C 6 to C 14 aromatic hydrocarbon group;
A and B each independently represent a nitrogen atom or a carbon atom; and
“n” and “m” each independently represent 0 or 1, or
a polymer having a structural unit that has a mercapto group and a sulfide bond in a side chain.

10 . A method for producing a resist pattern comprising steps (1) to (4);
(1) applying the resist composition according to claim 1 onto a substrate; (2) drying the applied composition to form a composition layer; (3) exposing the composition layer; and (4) developing the exposed composition layer.

Assignees

• Sumitomo Chemical Co

Inventors

• Kawamura Maki
• Akita Makoto

Classifications

• C07D221/14

  Aza-phenalenes, e.g. 1,8-naphthalimide · CPC title

• G03F7/0392

  the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title

• G03F7/0397 Primary

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title

• C09K15/30

  containing heterocyclic ring with at least one nitrogen atom as ring member · CPC title

• C08L63/04

  Epoxynovolacs · CPC title