Cleaning materials and processes for lithium processing equipment

Patent metadata

Field	Value
Publication number	US-12134822-B2
Application number	US-202117529463-A
Country	US
Kind code	B2
Filing date	Nov 18, 2021
Priority date	Nov 20, 2020
Publication date	Nov 5, 2024
Grant date	Nov 5, 2024

Abstract

Exemplary methods of removing lithium-containing deposits may include heating a surface of a lithium-containing deposit. The surface may include oxygen or nitrogen, and the lithium-containing deposit may be disposed on a surface of a processing chamber. The methods may include contacting the surface of the lithium-containing deposit with a hydrogen-containing precursor. The contacting may hydrogenate the surface of the lithium-containing deposit. The methods may include contacting the lithium-containing deposit with a nitrogen-containing precursor to form volatile byproducts. The methods may include exhausting the volatile byproducts of the lithium-containing deposit from the processing chamber.

First claim

The invention claimed is:

1. A method of removing lithium-containing deposits, the method comprising:
heating a surface of a lithium-containing deposit, wherein the surface comprises oxygen or nitrogen, and wherein the lithium-containing deposit is disposed on a surface of a processing chamber;
contacting the surface of the lithium-containing deposit with a hydrogen-containing precursor, wherein the contacting hydrogenates the surface of the lithium-containing deposit;
contacting the lithium-containing deposit with a nitrogen-containing precursor to form volatile byproducts; and
exhausting the volatile byproducts of the lithium-containing deposit from the processing chamber.

2. The method of removing lithium-containing deposits of claim 1 , wherein the hydrogen-containing precursor comprises diatomic hydrogen or ammonia.

3. The method of removing lithium-containing deposits of claim 2 , wherein the surface of the lithium-containing deposit comprises lithium nitride, and wherein the method further comprises:
contacting the surface of the lithium-containing deposit with diatomic hydrogen; and
subsequently contacting the surface of the lithium-containing deposit with ammonia, wherein the subsequent contacting produces lithium amide.

4. The method of removing lithium-containing deposits of claim 1 , wherein the nitrogen-containing precursor comprises hexamethyldisilazane.

5. The method of removing lithium-containing deposits of claim 1 , wherein the volatile byproducts are characterized by a boiling point of less than or about 200° C.

6. The method of removing lithium-containing deposits of claim 1 , wherein the surface of the lithium-containing deposit is heated to a temperature of greater than or about 300° C., while a temperature of a bulk region of the lithium-containing deposit is maintained below or about 200° C.

7. The method of removing lithium-containing deposits of claim 6 , wherein the heating is performed with a heater positioned within the processing chamber.

8. The method of removing lithium-containing deposits of claim 1 , wherein the method of removing lithium-containing deposits is performed under vacuum conditions within the processing chamber.

9. The method of removing lithium-containing deposits of claim 8 , wherein water content within the processing chamber is maintained at less than or about 100 ppm during the method of removing lithium-containing deposits.

10. A method of removing lithium-containing deposits, the method comprising:
heating a surface of a lithium-containing deposit, wherein the surface comprises lithium oxide, wherein a bulk of the lithium-containing deposit comprises lithium, and wherein the lithium-containing deposit is disposed on a surface of a processing chamber;
contacting the surface of the lithium-containing deposit with diatomic hydrogen or ammonia, wherein the contacting produces lithium hydroxide on the surface of the lithium-containing deposit;
contacting the lithium-containing deposit with a removal precursor to form volatile byproducts, wherein a temperature within the processing chamber is maintained below or about 300° C. at processing conditions; and
exhausting the volatile byproducts of the lithium-containing deposit from the processing chamber.

11. The method of removing lithium-containing deposits of claim 10 , wherein the removal precursor comprises a beta-diketone, 1,4,7,10-tetraoxacyclododecane, tetramethylpiperidine, diisopropylamine, or hexamethyldisilazane.

12. The method of removing lithium-containing deposits of claim 10 , wherein the removal precursor is a first removal precursor, wherein the first removal precursor removes a surface layer of the lithium-containing deposit, and wherein the method further comprises:
contacting the lithium-containing deposit with a second removal precursor to form volatile byproducts of bulk material of the lithium-containing deposit.

13. The method of removing lithium-containing deposits of claim 10 , wherein the lithium-containing deposit further comprises lithium nitride at the surface of the lithium-containing deposit.

14. The method of removing lithium-containing deposits of claim 10 , wherein the method of removing lithium-containing deposits is performed under vacuum conditions within the processing chamber.

15. The method of removing lithium-containing deposits of claim 10 , wherein water content within the processing chamber is maintained at less than or about 100 ppm during the method of removing lithium-containing deposits.

16. A method of removing lithium-containing deposits, the method comprising:
heating a surface of a lithium-containing deposit, wherein the surface comprises lithium nitride, wherein a bulk of the lithium-containing deposit comprises lithium, and wherein the lithium-containing deposit is disposed on a surface of a processing chamber;
contacting the surface of the lithium-containing deposit with diatomic hydrogen or ammonia, wherein the contacting produces lithium hydroxide on the surface of the lithium-containing deposit;
contacting the lithium-containing deposit with a removal precursor to form volatile byproducts, wherein a temperature within the processing chamber is maintained below or about 300° C. at processing conditions; and
exhausting the volatile byproducts of the lithium-containing deposit from the processing chamber.

17. The method of removing lithium-containing deposits of claim 16 , wherein contacting the surface of the lithium-containing deposit with diatomic hydrogen or ammonia comprises:
contacting the surface of the lithium-containing deposit with diatomic hydrogen; and
subsequently contacting the surface of the lithium-containing deposit with ammonia, wherein the subsequent contacting produces lithium amide.

18. The method of removing lithium-containing deposits of claim 16 , wherein the removal precursor comprises one or more of 1,4,7,10-tetraoxacyclododecane, tetramethylpiperidine, dimethylamine, diethylamine, di-n-propylamine, di-isopropylamine, di-t-butylamine, isopropylamine, t-butylamine, hexamethyldisilazane, or a beta-diketone including dipivaloylmethane, isobutyrylpivaloylmethane, hexafluoropentanedione, or trifluoroacetylpivaloylmethane.

19. The method of removing lithium-containing deposits of claim 16 , wherein the removal precursor is a first removal precursor, wherein the first removal precursor removes a surface layer of the lithium-containing deposit, and wherein the method further comprises:
contacting the lithium-containing deposit with a second removal precursor to form volatile byproducts of bulk material of the lithium-containing deposit.

20. The method of removing lithium-containing deposits of claim 16 , wherein the method of removing lithium-containing deposits is performed under vacuum conditions within the processing chamber, and wherein water content within the processing chamber is maintained at less than or about 100 ppm during the method of removing lithium-containing deposits.

Assignees

• Applied Materials Inc

Inventors

• Chakraborty Tapash
• Deepak Nitin
• Goradia Prerna Sonthalia
• Upadhye Bahubali S
• Bagul Nilesh Chimanrao
• Herle Subramanya P
• Sivaramakrishnan Visweswaren

Classifications

• C23C14/16

  on metallic substrates or on substrates of boron or silicon · CPC title

• C23C14/562

  for coating elongated substrates · CPC title

• C23C14/564

  Means for minimising impurities in the coating chamber such as dust, moisture, residual gases · CPC title

• C23C16/4407

  Cleaning of reactor or reactor parts by using wet or mechanical methods · CPC title

• C23C16/4412

  Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title