High-power acoustic device with improved performance
US-2018061744-A1 · Mar 1, 2018 · US
US12074096B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12074096-B2 |
| Application number | US-202016793887-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 18, 2020 |
| Priority date | Oct 5, 2017 |
| Publication date | Aug 27, 2024 |
| Grant date | Aug 27, 2024 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A microelectronic device is formed by thinning a substrate of the microelectronic device from a die attach surface of the substrate, and forming a copper-containing layer on the die attach surface of the substrate. A protective metal layer is formed on the copper-containing layer. Subsequently, the copper-containing layer is attached to a package member having a package die mount area. The protective metal layer may optionally be removed prior to attaching the copper-containing layer to the package member. Alternatively, the protective metal layer may be left on the copper-containing layer when the copper-containing layer is attached to the package member. A structure formed by the method is also disclosed.
Opening claim text (preview).
What is claimed is: 1. A microelectronic device, comprising: a substrate having a component surface and a die attach surface located opposite from the component surface; a wire bond attached to the component surface; a copper containing layer on the die attach surface, wherein the copper containing layer occupies more than 50% surface area of the die attach surface; and a die attach material on the copper containing layer, wherein the copper containing layer is attached to a portion of a lead frame by the die attach material, wherein the copper containing layer is recessed from a lateral perimeter of the die attach surface in its entirety from a bottom view of the microelectronics device. 2. The microelectronic device of claim 1 , wherein the copper containing layer is 5 microns to 10 microns thick. 3. The microelectronic device of claim 1 , further comprising an intermediate layer between the copper containing layer and the die attach surface. 4. The microelectronic device of claim 3 , wherein the intermediate layer includes titanium. 5. The microelectronic device of claim 1 , further comprising a protective metal layer between the copper containing layer and the die attach material, the protective metal layer including at least one metal selected from the group consisting of tin, silver, and nickel. 6. The microelectronic device of claim 1 , wherein the die attach material includes solder. 7. A microelectronic device, comprising: a substrate having a component surface and a die attach surface located opposite from the component surface, the component surface including an I/O pad; a solder ball physically contacting the component surface, the solder ball attached to a lead; a copper containing layer on the die attach surface, wherein the copper containing layer occupies more than 50% surface area of the die attach surface; and a die attach material on the copper containing layer, wherein the copper containing layer is attached to a portion of a lead frame by the die attach material, wherein the copper containing layer is recessed from a lateral perimeter of the die attach surface in its entirety from a bottom view of the microelectronics device. 8. The microelectronic device of claim 7 , wherein the copper containing layer is 5 microns to 10 microns thick. 9. The microelectronic device of claim 7 , further comprising an intermediate layer between the copper containing layer and the die attach surface. 10. The microelectronic device of claim 9 , wherein the intermediate layer includes titanium. 11. The microelectronic device of claim 7 , further comprising a protective metal layer between the copper containing layer and the die attach material, the protective metal layer including at least one metal selected from the group consisting of tin, silver, and nickel. 12. The microelectronic device of claim 7 , wherein the die attach material includes solder.
of bond wires · CPC title
of die-attach connectors · CPC title
batch processes · CPC title
Die-attach connectors and bond wires · CPC title
Bump connectors and die-attach connectors · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.