Mask and method of manufacturing the same

US12063848B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12063848-B2
Application numberUS-202318187047-A
CountryUS
Kind codeB2
Filing dateMar 21, 2023
Priority dateJul 17, 2020
Publication dateAug 13, 2024
Grant dateAug 13, 2024

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A mask includes a first mask that includes a first long side that extends in a first direction and a first short side that extends in a second direction that crosses the first direction and that includes a first edge portion, a first center portion, and a first welded portion, that are sequentially arranged in the first direction. The mask further includes a second mask that includes a second long side that extends in the first direction and a second short side that extends in the second direction and that includes a second welded portion, a second center portion, and a second edge portion, that are sequentially arranged in the first direction. The first welded portion is in contact with the second welded portion.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of manufacturing a mask, comprising: preparing a first mask that includes a first long side that extends in a first direction and a first short side that extends in a second direction that crosses the first direction, wherein the first long side is longer than the first short side, wherein the first mask includes a first edge portion, a first center portion, and a first welded portion, that are sequentially arranged in the first direction, preparing a second mask that includes a second long side that extends in the first direction and a second short side that extends in the second direction, wherein the second long side is longer than the second short side, wherein the second mask includes a second welded portion, a second center portion, and a second edge portion, that are sequentially arranged in the first direction; and welding the first welded portion of the first mask to the second welded portion of the second mask, wherein the first welded portion of the first mask includes a first pattern formed at one end, the second welded portion of the second mask includes a second pattern formed at one end, and wherein the first pattern and the second pattern are formed by a half-etching process. 2. The method of claim 1 , further comprising aligning the first and second masks with each other, wherein the first pattern includes a first perforated hole formed through the first welded portion, the second pattern includes a second perforated hole formed through the second welded portion, wherein aligning the first and second masks allows the first perforated hole to overlap the second perforated hole after preparing the first and second masks. 3. The method of claim 1 , further comprising aligning the first and second masks with each other, wherein the first pattern includes a first alignment mark disposed on an upper surface of the first welded portion, the second pattern includes a second alignment mark disposed on an upper surface of the second welded portion, wherein aligning the first and second masks allows the first alignment mark to overlap the second alignment mark after preparing the first and second masks. 4. The method of claim 1 , wherein the method further includes aligning the first pattern with the second pattern after preparing the first and second masks. 5. The method of claim 4 , wherein each of the first pattern and the second pattern includes an inclined surface or steps. 6. The method of claim 4 , wherein each of the first pattern and the second pattern has an oscillating shape. 7. The method of claim 4 , wherein the first welded portion further includes a first perforated hole formed adjacent to the first pattern, the second welded portion further includes a second perforated hole formed adjacent to the second pattern, wherein aligning the first and second masks further includes aligning the first mask with the second mask wherein the first perforated hole overlaps the second perforated hole. 8. The method of claim 4 , further comprising disposing a metallic film on the first welded portion and the second welded portion after aligning the first and second masks with each other, wherein welding the first and second welded portions includes welding the first welded portion, the second welded portion, and the metallic film to each other.

Assignees

Inventors

Classifications

  • H10K71/166Primary

    using selective deposition, e.g. using a mask · CPC title

  • C23C14/042Primary

    using masks · CPC title

  • using vacuum deposition · CPC title

  • Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

  • Masking devices (stencils B05C17/06; masking devices for which the means for applying liquids or other fluent material is spraying or is not important B05B12/20) · CPC title

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Frequently asked questions

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What does patent US12063848B2 cover?
A mask includes a first mask that includes a first long side that extends in a first direction and a first short side that extends in a second direction that crosses the first direction and that includes a first edge portion, a first center portion, and a first welded portion, that are sequentially arranged in the first direction. The mask further includes a second mask that includes a second l…
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10K71/166. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 13 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).