Multicathode deposition system and methods
US-12051576-B2 · Jul 30, 2024 · US
US9695500B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9695500-B2 |
| Application number | US-201514974356-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 18, 2015 |
| Priority date | Apr 24, 2015 |
| Publication date | Jul 4, 2017 |
| Grant date | Jul 4, 2017 |
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A mask frame assembly including a frame including a first opening, a first mask including second openings that each has an area smaller than the first opening and a first surface having portions of the first surface connected to the frame. The mask frame assembly includes second masks disposed on a second surface of the first mask extending across the first opening in a first direction and arranged in a second direction that is substantially perpendicular. The second masks include pattern parts having a shape corresponding to the second openings. The pattern parts each include pattern holes configured to allow a deposition material to pass through. The second masks include a rib part disposed between the pattern parts. The rib part includes dummy holes each having an area greater than each of the pattern holes. The first mask is configured to block the deposition material passing through the dummy holes.
Opening claim text (preview).
What is claimed is: 1. A mask frame assembly, comprising: a frame comprising a first opening; a first mask comprising: second openings that each have an area smaller than the first opening; and a first surface having portions of the first surface connected to the frame; and second masks disposed on a second surface of the first mask extending across the first opening in a first direction and arranged in a second direction that is substantially perpendicular, the second masks comprising: pattern parts having a shape corresponding to the second openings, the pattern parts each comprising pattern holes configured to allow a deposition material to pass through; and a rib part disposed between the pattern parts, the rib part comprises dummy holes each having an area greater than each of the pattern holes, wherein the first mask is configured to block the deposition material passing through the dummy hole. 2. The mask frame assembly of claim 1 , further comprising an alignment stick disposed outside at least one of two second masks disposed at both ends of the first mask in the second direction, wherein portions of the alignment stick are connected to the second surface of the first mask to be a reference point for disposing the second masks. 3. The mask frame assembly of claim 1 , wherein the frame comprises a first alignment key passing through portions of the frame. 4. The mask frame assembly of claim 3 , wherein the first mask comprises a second alignment key passing through the first mask. 5. The mask frame assembly of claim 4 , wherein at least one second mask comprise a third alignment key passing through the at least one second mask. 6. The mask frame assembly of claim 5 , wherein the first alignment key, the second alignment key, and the third alignment key are formed to overlap each other. 7. The mask frame assembly of claim 2 , wherein the frame comprises a first alignment key passing through portions of the frame. 8. The mask frame assembly of claim 7 , wherein the first mask comprises a second alignment key passing through the first mask. 9. The mask frame assembly of claim 8 , wherein the alignment stick comprises a third alignment key passing through the second masks. 10. The mask frame assembly of claim 9 , wherein the first alignment key, the second alignment key, and the third alignment key are formed to overlap each other. 11. The mask frame assembly of claim 1 , wherein the pattern holes are formed in a polygonal shape. 12. The mask frame assembly of claim 1 , wherein the dummy holes are formed in a polygonal shape. 13. A method of manufacturing a mask frame assembly, the method comprising: preparing a frame comprising a first opening; preparing a first mask comprising second openings each having an area smaller than the first opening; disposing a portion of a first surface of the first mask on the frame; preparing second masks, the second masks comprising: pattern parts formed in a shape corresponding to the second openings; and a rib part formed between the pattern parts; and disposing the second masks on a second surface of the first mask to extend across the first opening in a first direction and arranged in a second direction substantially perpendicular to the first direction, wherein the preparing the second masks comprises: forming pattern holes in each of the pattern parts configured to allow a deposition material to pass through; and forming dummy holes in the rib part, each having an area greater than each of the pattern holes. 14. The method of claim 13 , wherein the disposing the second masks on the second surface of the first mask comprises preparing an alignment stick disposed outside at least one of two second masks disposed at both ends of the first mask in the second direction, wherein portions of the alignment stick are disposed on the second surface of the first mask, and the alignment stick is a reference point when the second masks are disposed on the second surface of the first mask. 15. The method of claim 14 , wherein the pattern holes have a polygonal shape. 16. The method of claim 14 , wherein the dummy holes have a polygonal shape. 17. A method of manufacturing a display apparatus, the method comprising: depositing at least one of an organic layer and an electrode by using a mask frame assembly, the mask frame comprising: a frame comprising a first opening; a first mask comprising second openings that each have an area smaller than the first opening, and a portion of a first surface of the first mask is connected to the frame; and second masks disposed on a second surface of the first mask extending across the first opening in a first direction and arranged in a second direction substantially perpendicular to the first direction, the second masks comprising: pattern parts formed in a shape corresponding to the second opening, each of the pattern parts comprising pattern holes configured to allow a deposition material to pass through; and a rib part formed between the pattern parts, the rib part comprising dummy holes each having an area greater than each of the pattern holes, wherein the first mask is configured to block the deposition material passing through the dummy holes.
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