Particle-induced x-ray emission (PIXE) using hydrogen and multi-species focused ion beams

Patent metadata

Field	Value
Publication number	US-12061159-B2
Application number	US-202217728869-A
Country	US
Kind code	B2
Filing date	Apr 25, 2022
Priority date	Apr 25, 2022
Publication date	Aug 13, 2024
Grant date	Aug 13, 2024

Abstract

Practical implementation of Particle-Induced X-ray Emission (PIXE) on a focused ion beam apparatus or on a dual-beam apparatus comprising both focused-ion beam and scanning microscopy capabilities is described. Accordingly, an analytical method comprises: directing and focusing a beam of ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV); and detecting and measuring X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample.

First claim

What is claimed is:

1. An analytical method comprising:
directing ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV); and
detecting and measuring X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample.

2. An analytical method as recited in claim 1 , wherein the directing of the ions includes directing separate proton and non-hydrogen ion beams onto the sample, wherein the separate proton and non-hydrogen ion beams overlap.

3. An analytical method as recited in claim 1 , wherein the directing of the beam of ions is performed by a focused-ion-beam column of a stand-alone focused ion beam microscope.

4. An analytical method as recited in claim 1 , wherein the mixture of protons and non-hydrogen ions is generated by passing a mixture of hydrogen gas and a second gas through a plasma ion source.

5. An analytical method as recited in claim 1 , wherein the plasma ion source is an inductively coupled plasma ion source.

6. An analytical method as recited in claim 4 , wherein the hydrogen gas is provided from a source of purified hydrogen gas, the second gas is provided from a source of purified second gas, and the hydrogen and second gas are mixed in a manifold that is fluidically coupled to the inductively coupled plasma ion source.

7. An analytical method as recited in claim 1 , further comprising:
measuring proportions of ion species comprising the beam of ions.

8. An analytical method as recited in claim 7 , where the measuring of the proportions of the ion species comprises:
separating the ion beam into a plurality of individual beamlets, whereby the ion species are separated in accordance with their respective mass-to-charge ratios; and
measuring an electric current of each respective beamlet.

9. An analytical method as recited in claim 8 , wherein the measuring of the electric current of each respective beamlet comprises introducing each beamlet into an isolating Faraday cup comprising:
a grounded first electrode having an aperture therethrough that, in operation, receives the beamlets, one at a time;
a second electrode that is spaced apart from the first electrode and that comprises a charge collection cavity;
one or more electrical insulators between the first and second electrodes; and
an electrometer electrically coupled to the second electrode.

10. An analytical method as recited in claim 9 , wherein the measuring of the electric current of each respective beamlet comprises scanning said each beamlet across the aperture of the of the grounded first electrode.

11. An analytical method as recited in claim 9 , wherein the measuring of the electric current of each respective beamlet comprises moving the isolating Faraday cup so that each beamlet passes, in turn, through the aperture of the grounded first electrode and to the second electrode.

12. An analytical method as recited in claim 1 , wherein the directing and focusing of the beam of ions is performed by a focused-ion-beam column of a dual-beam apparatus that also comprises a scanning electron microscope (SEM) column.

13. An analytical method as recited in claim 12 , further comprising:
generating an image of a sample area surrounding a position on the sample at which the protons and non-hydrogen ions impinge onto the sample, the image generated by performing a raster scan of a beam of electrons across the area while detecting either secondary electrons emitted by the sample or electrons backscattered by the sample.

14. An analytical method as recited in claim 12 , further comprising:
detecting and measuring X-rays that are emitted from the sample in response to the impingement of electrons from the SEM column onto the sample area; and
generating an enhanced compositional analysis of the sample area by combining information derived from the detecting and measuring of X-rays emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample with information derived from the detecting and measuring of X-rays emitted from the sample in response to the impingement of electrons from the SEM column onto the sample area.

15. An analytical method as recited in claim 12 , further comprising measuring proportions of ion species comprising the beam of ions by:
causing the beam of ions to pass through a magnetic immersion field generated by a magnetic immersion lens of the SEM column, whereby the ion beam is separated into a plurality of individual beamlets, the ion species being separated into the beamlets in accordance with their respective mass-to-charge ratios; and
measuring an electric current of each respective beamlet.

16. An analytical method as recited in claim 15 , wherein the measuring of the electric current of each respective beamlet comprises introducing each beamlet into an isolating Faraday cup comprising:
a grounded first electrode having an aperture therethrough that, in operation, receives the beamlets, one at a time;
a second electrode that is spaced apart from the first electrode and that comprises a charge collection cavity;
one or more electrical insulators between the first and second electrodes; and
an electrometer electrically coupled to the second electrode.

17. An analytical method as recited in claim 1 , wherein the kinetic energy of ions of the mixture is not greater than 30 keV.

18. An analytical method as recited in claim 1 , wherein the kinetic energy of ions of the mixture is not greater than 24 keV.

19. An analytical method as recited in claim 1 , wherein the directing of the ions comprising the mixture of protons and non-hydrogen ions onto the sample comprises focusing a beam comprising the mixture of protons and non-hydrogen ions onto the sample.

20. An analytical method as recited in claim 1 , wherein the non-hydrogen ions comprise Ar + ions, Xe + ions or Kr + ions.

21. A method of milling an area of a sample surface comprising:
directing ions comprising a mixture of protons and non-hydrogen ions onto the area, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV), wherein the beam of ions is raster scanned across the area and wherein the impingement of the non-hydrogen ions causes sputtering of the sample surface within the area; and
detecting and measuring X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample.

22. A method of milling an area of a sample surface as recited in claim 21 , wherein the directing of the ions onto the area includes directing separate proton and non-hydrogen ion beams onto the area, wherein the separate proton and non-hydrogen ion beams overlap.

23. A method of milling an area of a sample surface as recited in claim 21 , wherein the directing of the ions onto the area includes focusing the ions onto the area.

24. A method of milling an area of a sample surface as recited in claim 21 , further comprising:
ceasing the directing of the ions onto the area upon detecting a change in the emitted X-rays.

25. A method of milling an area of a sample surface as recited in claim 21 , wherein the non-hydrogen ions comprise either Ar + ions, Xe + or Kr + ions.

26. A method of milling an area of a sample surface as recited in cla

Assignees

• Fei Co

Inventors

• Totonjian Daniel
• Botman Aurelien Philippe Jean Maclou
• Toth Milos

Classifications

• G01N23/2257

  Measuring excited X-rays, i.e. particle-induced X-ray emission [PIXE] · CPC title

• G01N23/2252

  Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA] · CPC title

• G01N23/203

  Measuring back scattering · CPC title

• G01N23/2251

  using incident electron beams, e.g. scanning electron microscopy [SEM] · CPC title

• H01J37/3056

  for microworking, e. g. etching of gratings or trimming of electrical components · CPC title