Dielectric separator for fuel cell stack assembly and manufacturing method thereof
US-11374232-B2 · Jun 28, 2022 · US
US12027728B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12027728-B2 |
| Application number | US-202218053834-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 9, 2022 |
| Priority date | Mar 26, 2022 |
| Publication date | Jul 2, 2024 |
| Grant date | Jul 2, 2024 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A method of making an interconnect for an electrochemical cell stack includes providing the interconnect, and creep flattening the interconnect prior to placing the interconnect into the electrochemical cell stack.
Opening claim text (preview).
What is claimed is: 1. A method of making an interconnect for an electrochemical cell stack, comprising: forming the interconnect by a powder metallurgy method by pressing a metal powder to form a green interconnect and sintering the green interconnect, such that the interconnect has a density of at least 6.5 grams per cubic centimeter after the sintering the green interconnect; and creep flattening the interconnect after the step of sintering the green interconnect and prior to placing the interconnect into the electrochemical cell stack, wherein the creep flattening is conducted from 4 hours to 60 hours at an elevated temperature ranging from 920° C. to 1100° C., and under a load ranging from 100 to 500 pounds. 2. The method of claim 1 , wherein the creep flattening is conducted in an oxidizing ambient such that the interconnect is oxidized during the creep flattening. 3. The method of claim 2 , further comprising: removing a metal oxide from a surface of the interconnect; and forming a coating comprising at least one of lanthanum strontium manganite (LSM) or (Mn, Co) 3 O 4 spinel (MCO) on air-side ribs located in an air flow field of the interconnect. 4. The method of claim 3 , further comprising performing an initial oxidation of the interconnect in the oxidizing ambient at a temperature above room temperature prior to the creep flattening. 5. The method of claim 4 , wherein: the removing the metal oxide occurs after the initial oxidation and before the creep flattening; and the forming the coating occurs after the creep flattening. 6. The method of claim 4 , wherein: the removing the metal oxide occurs after the initial oxidation and before the creep flattening; and the forming the coating occurs after the removing the metal oxide and before the creep flattening. 7. The method of claim 4 , wherein: the creep flattening occurs after the initial oxidation and before removing the metal oxide; and the removing the metal oxide occurs after the creep flattening and before the forming the coating. 8. The method of claim 3 , wherein the removing the metal oxide occurs after the creep flattening and before the forming the coating. 9. The method of claim 3 , wherein: the air side further comprises riser seal surfaces disposed on two opposing sides of the air flow field and which surround fuel inlets and outlets; and the riser seal surfaces are recessed with respect to a plane extending across a top surface of the coating on tips of the air-side ribs. 10. The method of claim 1 , wherein: the interconnect comprises a chromium alloy comprising 3 to 6 weight percent iron, 0 to 1 weight percent yttrium, and 94 to 97 weight percent chromium. 11. The method of claim 10 , wherein the interconnect comprises the chromium alloy comprising 3 to 3.9 weight percent iron, and 96.1 to 97 weight percent chromium. 12. The method of claim 1 , further comprising placing the interconnect into the electrochemical stack after the creep flattening, wherein the electrochemical stack comprises a solid oxide fuel cell stack containing solid oxide fuel cells, or a solid oxide electrolyzer cell stack containing solid oxide electrolyzer cells. 13. The method of claim 1 , wherein the interconnect comprises: fuel inlets and outlets that extend through the interconnect adjacent to opposing first and second peripheral edges of the interconnect; an air side comprising an air flow field comprising air-side ribs and air channels that extend in a first direction, from a third peripheral edge of the interconnect to a fourth peripheral edge of the interconnect that is opposite to the third peripheral edge, and riser seal surfaces disposed on the first and second peripheral edges of the interconnect, wherein the riser seal surfaces surround the fuel inlets and outlets; a fuel side opposing the air side, the fuel side comprising a fuel flow field comprising fuel-side ribs and fuel channels that extend in a second direction substantially perpendicular to the first direction between the fuel inlets and outlets; and a coating comprising at least one of lanthanum strontium manganite (LSM) or (Mn, Co) 3 O 4 spinel (MCO) located on the air-side ribs but not on the riser seal surfaces, wherein the riser seal surfaces are recessed with respect to a plane extending across a top surface of the coating on tips of the air-side ribs.
characterised by the configuration of channels, e.g. by the flow field of the reactant or coolant · CPC title
Sealing or supporting means around electrodes, matrices or membranes · CPC title
by electrolytic decomposition of the electrolytic solution or the formed water product · CPC title
with both reactants being gaseous or vaporised · CPC title
Alloys based on refractory metals · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.