High temperature biasable heater with advanced far edge electrode, electrostatic chuck, and embedded ground electrode
US-2024412957-A1 · Dec 12, 2024 · US
Electrostatic chuck and processing apparatus
US11955360B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11955360-B2 |
| Application number | US-202017642083-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 24, 2020 |
| Priority date | Dec 24, 2020 |
| Publication date | Apr 9, 2024 |
| Grant date | Apr 9, 2024 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
A Johnsen-Rahbek force type electrostatic chuck including: a metal substrate; an electrode for electrostatic attraction provided on the metal substrate with an insulating layer interposed between the metal substrate and the electrode for electrostatic attraction; and a dielectric layer constituting an electrostatic attraction surface in contact with a workpiece. The dielectric layer includes a ceramic spray coating and a sealing component with which pores of the ceramic spray coating are filled, and the sealing component contains a metal organic salt containing a rare earth element.
First claim
Opening claim text (preview).
The invention claimed is: 1. A Johnsen-Rahbek force type electrostatic chuck comprising: a metal substrate; an electrode for electrostatic attraction provided on the metal substrate with an insulating layer interposed between the metal substrate and the electrode for electrostatic attraction; and a dielectric layer constituting an electrostatic attraction surface in contact with a workpiece, wherein the dielectric layer includes a ceramic spray coating and a sealing component with which pores of the ceramic spray coating are filled, and the sealing component contains a metal organic salt containing a rare earth element. 2. The electrostatic chuck according to claim 1 , wherein a volume resistivity of the ceramic spray coating is 1.0×10 8 to 1.0×10 13 Ω·cm. 3. The electrostatic chuck according to claim 2 , wherein the ceramic spray coating is made of aluminum-titanium oxide. 4. The electrostatic chuck according to claim 2 , wherein the rare earth element is yttrium or ytterbium. 5. The electrostatic chuck according to claim 1 , wherein the ceramic spray coating is made of aluminum-titanium oxide. 6. The electrostatic chuck according to claim 5 , wherein the rare earth element is yttrium or ytterbium. 7. The electrostatic chuck according to claim 1 , wherein the rare earth element is yttrium or ytterbium. 8. A processing apparatus comprising the electrostatic chuck according to claim 1 .
Assignees
Inventors
Classifications
characterised by a coating, a hardness or a material · CPC title
- H10P72/722Primary
Details of electrostatic chucks · CPC title
using electrostatic chucks · CPC title
for supporting or gripping · CPC title
- H01L21/6833Primary
Electricity · mapped topic
Patent family
Related publications grouped by family.
External sources
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US11955360B2 cover?
- A Johnsen-Rahbek force type electrostatic chuck including: a metal substrate; an electrode for electrostatic attraction provided on the metal substrate with an insulating layer interposed between the metal substrate and the electrode for electrostatic attraction; and a dielectric layer constituting an electrostatic attraction surface in contact with a workpiece. The dielectric layer includes a …
- Who is the assignee on this patent?
- Tocalo Co Ltd, Hitachi High Tech Corp
- What technology area does this patent fall under?
- Primary CPC classification H10P72/722. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Apr 09 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).