Method for III-v/silicon hybrid integration

US11953728B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11953728-B2
Application numberUS-202217858021-A
CountryUS
Kind codeB2
Filing dateJul 5, 2022
Priority dateAug 6, 2018
Publication dateApr 9, 2024
Grant dateApr 9, 2024

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method of transfer printing. The method comprising: providing a precursor photonic device, comprising a substrate and a bonding region, wherein the precursor photonic device includes one or more alignment marks located in or adjacent to the bonding region; providing a transfer die, said transfer die including one or more alignment marks; aligning the one or more alignment marks of the precursor photonic device with the one or more alignment marks of the transfer die; and bonding at least a part of the transfer die to the bonding region.

First claim

Opening claim text (preview).

The invention claimed is: 1. An optoelectronic device comprising: a precursor photonic device comprising: a substrate; a bonding region, for receiving and bonding to a transfer die; and a plurality of alignment marks, for use in transfer printing, said alignment marks being located in or adjacent to the bonding region, wherein the plurality of alignment marks comprise two or more different types of alignment marks. 2. The optoelectronic device of claim 1 , wherein the bonding region is in a cavity in the substrate. 3. The optoelectronic device of claim 1 , further comprising an input waveguide, wherein the alignment marks are configured to align a photonic device, located on the transfer die, relative to the input waveguide. 4. The optoelectronic device of claim 1 , wherein the alignment marks are provided as one or more etched regions and/or as one or more patterned metal surfaces. 5. The optoelectronic device of claim 4 , wherein the alignment marks are provided as one or more etched regions and the etched regions have a depth of at least 100 nm and no more than 3000 nm. 6. The optoelectronic device of claim 1 , wherein the alignment marks include one or more coarse alignment marks, and one or more fine alignment marks. 7. The optoelectronic device of claim 6 , wherein the one or more coarse alignment marks project in at least two non-parallel directions. 8. The optoelectronic device of claim 6 , wherein the one or more coarse alignment marks are shaped as any one or more of: an arrow, a cross, a T shape, and an L shape. 9. The optoelectronic device of claim 6 , wherein the alignment marks include two or more fine alignment marks which respectively project in at least two non-parallel directions. 10. The optoelectronic device of claim 6 , wherein the one or more fine alignment marks include Vernier patterns. 11. The optoelectronic device of claim 1 , wherein the precursor photonic device is a silicon-on-insulator wafer, including either or both of an input waveguide and an output waveguide, each adjacent to the bonding region. 12. The optoelectronic device of claim 1 , further comprising: a transfer die comprising: a photonic device, said photonic device having a bonding surface suitable for bonding to a precursor photonic device; wherein the transfer die includes a plurality of alignment marks, for use in a transfer-print process, wherein each of the plurality of alignment marks of the transfer die is selected from two or more different types of alignment mark. 13. The optoelectronic device of claim 12 , wherein the photonic device is a III-V semiconductor device and/or the transfer die includes a sacrificial layer. 14. The optoelectronic device of claim 12 , wherein the photonic device is a laser, semiconductor optical amplifier, or an electro-absorption modulator. 15. The optoelectronic device of claim 14 , wherein the photonic device is an electro-absorption modulator, wherein said electro-absorption modulator comprises an input waveguide and an output waveguide, and wherein both of said input waveguide and said output waveguide comprise a port located on a same side of the transfer die. 16. The optoelectronic device of claim 12 , wherein the photonic device is formed at least partially from indium phosphide, and/or a sacrificial layer is formed of indium gallium arsenide. 17. The optoelectronic device of claim 12 , wherein the alignment marks of the transfer die are provided on an optically transparent region of the transfer die. 18. The optoelectronic device of claim 12 , formed on an indium phosphide substrate. 19. An optoelectronic device comprising: a precursor photonic device comprising: a substrate; a bonding region, for receiving and bonding to a transfer die; and a plurality of alignment marks, for use in transfer printing, said alignment marks being located in or adjacent to the bonding region, wherein the alignment marks allow for alignment in at least two non-parallel directions, the two non-parallel directions being parallel to the bonding region. 20. An optoelectronic device comprising: a precursor photonic device comprising: a substrate; a bonding region, for receiving and bonding to a transfer die; and a plurality of alignment marks, for use in transfer printing, said alignment marks being located in or adjacent to the bonding region, wherein the optoelectronic device further comprises a transfer die comprising a photonic device, said photonic device having a bonding surface suitable for bonding to a precursor photonic device, wherein the transfer die includes a plurality of alignment marks, for use in a transfer-print process, wherein each of the plurality of alignment marks of the transfer die is selected from two or more different types of alignment marks, and wherein the alignment marks of the transfer die are voids in the transfer die which extend entirely through the transfer die.

Assignees

Inventors

Classifications

  • Vertical transfer of a single workpiece · CPC title

  • using optical controlling means · CPC title

  • for alignment · CPC title

  • Package configurations · CPC title

  • Marks applied to devices, e.g. for alignment or identification · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11953728B2 cover?
A method of transfer printing. The method comprising: providing a precursor photonic device, comprising a substrate and a bonding region, wherein the precursor photonic device includes one or more alignment marks located in or adjacent to the bonding region; providing a transfer die, said transfer die including one or more alignment marks; aligning the one or more alignment marks of the precurs…
Who is the assignee on this patent?
Rockley Photonics Ltd
What technology area does this patent fall under?
Primary CPC classification G02B6/13. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 09 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 9 related publications on this page (citations in our corpus or others sharing the same primary CPC).