Silicon and silica nanostructures and method of making silicon and silica nanostructures

Patent metadata

Field	Value
Publication number	US-11807571-B2
Application number	US-202117545493-A
Country	US
Kind code	B2
Filing date	Dec 8, 2021
Priority date	Jul 2, 2014
Publication date	Nov 7, 2023
Grant date	Nov 7, 2023

Abstract

Provided herein are methods for forming one or more silicon nanostructures, such as silicon nanotubes, and a silica-containing glass substrate. As a result of the process used to prepare the silicon nanostructures, the silica-containing glass substrate comprises one or more nanopillars and the one or more silicon nanostructures extend from the nanopillars of the silica-containing glass substrate. The silicon nanostructures include nanotubes and optionally nanowires. A further aspect is a method for preparing silicon nanostructures on a silica-containing glass substrate. The method includes providing one or more metal nanoparticles on a silica-containing glass substrate and then performing reactive ion etching of the silica-containing glass substrate under conditions that are suitable for the formation of one or more silicon nanostructures.

First claim

What is claimed is:

1. A composition comprising:
a plurality of silicon nanostructures; and
a silica-containing glass substrate, the silica-containing glass substrate comprising a plurality of nanopillars etched into a surface of the silica-containing glass substrate, the plurality of nanopillars comprising different depths in the silica-containing glass substrate;
wherein the plurality of silicon nanostructures extend from the plurality of nanopillars of the silica-containing glass substrate; and
wherein the plurality of silicon nanostructures comprise one or more nanotubes.

2. The composition of claim 1 , wherein the silica-containing glass substrate is fused silica glass.

3. The composition of claim 1 , wherein the plurality of silicon nanostructures have external diameters between about 30 nm and about 200 nm.

4. The composition of claim 1 , wherein the plurality of silicon nanostructures have lengths between about 50 nm and about 2000 nm.

5. The composition of claim 1 , wherein the plurality of silicon nanostructures have a surface density on the silica-containing glass substrate of at least 10 10 cm −2 .

6. The composition of claim 1 , wherein plurality of the silicon nanostructures are coated with a hydrophobic and/or oleophobic coating.

7. A composition comprising:
one or more silica nanostructures; and
a silica-containing glass substrate, the silica-containing glass substrate comprising one or more nanopillars comprising different depths etched into a surface of the silica-containing glass substrate;
wherein the silica nanostructures extend from the nanopillars of the silica-containing glass substrate; and
wherein the silica nanostructures comprise one or more nanotubes.

8. The composition of claim 7 , wherein the silica nanostructures also comprise nanowires.

9. The composition of claim 7 , wherein the silica nanostructures are substantially transparent.

10. The composition of claim 7 , wherein the silica nanostructures have external diameters between about 30 nm and about 200 nm.

11. The composition of claim 7 , wherein the silica nanostructures have lengths between about 50 nm and about 2000 nm.

12. A method for preparing the composition of claim 7 , the method comprising the steps of:
providing one or more metal nanoparticles on the surface of the silica-containing glass substrate;
performing reactive ion etching on the surface of the silica-containing glass substrate under conditions suitable for the formation of silicon nanostructures comprising silicon nanotubes using the one or more metal nanoparticles as an etching mask; and
oxidizing the silicon nanostructures to form the one or more silica nanostructures.

13. A method for preparing a silica nanotube comprising the steps of:
providing one or more metal nanoparticles on a silica-containing glass substrate;
performing reactive ion etching of the silica-containing glass substrate under conditions suitable for the formation of a silicon nanotube; and
oxidizing the silicon nanotube to form a silica nanotube.

14. The method of claim 13 further comprising the step of removing the silicon nanotube from the silica-containing glass substrate prior to oxidation.

15. The composition of claim 1 , wherein the plurality of silicon nanostructures consist of amorphous silicon.

Assignees

• Corning Inc
• Icfo

Inventors

• Carrilero Albert
• Mazumder Prantik
• Pruneri Valerio

Classifications

• C03C15/00 Primary

  Surface treatment of glass, not in the form of fibres or filaments, by etching (etching or surface-brightening compositions, in general C09K13/00) · CPC title

• C01B33/12

  Silica; Hydrates thereof, e.g. lepidoic silicic acid · CPC title

• C30B11/12 Primary

  Vaporous components, e.g. vapour-liquid-solid-growth · CPC title

• C30B29/06

  Silicon · CPC title

• C30B29/18

  Quartz · CPC title