Metal dewetting methods and articles produced thereby

Patent metadata

Field	Value
Publication number	US-9296183-B2
Application number	US-201213687208-A
Country	US
Kind code	B2
Filing date	Nov 28, 2012
Priority date	Nov 30, 2011
Publication date	Mar 29, 2016
Grant date	Mar 29, 2016

Abstract

Described herein are improved dewetting methods and improved patterned articles produced using such methods. The improved methods and articles generally implement continuous ultra-thin metal-containing films or film stacks as the materials to be dewetted. For example, a method can involve the steps of providing a substrate that has a continuous ultra-thin metal-containing film or film stack disposed on a surface thereof, and dewetting at least a portion of the continuous ultra-thin metal-containing film or film stack to produce a plurality of discrete metal-containing dewetted islands on the surface of the substrate.

First claim

What is claimed is:

1. A patterned article, comprising:
a substrate;
a continuous ultra-thin metal-containing film or film stack disposed on a surface of the substrate; and
a plurality of discrete dewetted metal-containing islands disposed on a surface of the continuous ultra-thin metal-containing film or film stack;
wherein the plurality of discrete metal-containing dewetted islands have an average height of about 5 nanometers to about 300 nanometers, an average longest lateral cross-sectional dimension of about 10 nanometers to about 1000 nanometers, and are randomly oriented on the surface of the continuous ultra-thin metal-containing film or film stack so as to cover less than or equal to about 0.5 of an area fraction of the surface of the continuous ultra-thin metal-containing film or film stack.

2. The patterned article of claim 1 , wherein the continuous ultra-thin metal-containing film or film stack has an average thickness of less than or equal to about 5 nanometers.

3. The patterned article of claim 1 , wherein the substrate has an average thickness of about 0.02 millimeters to about 2 millimeters.

4. The patterned article of claim 1 , wherein the plurality of discrete dewetted metal-containing islands comprise a metal in its elemental form or a metal that is a constituent of an alloy.

5. The patterned article of claim 1 , wherein the average height of the plurality of discrete metal-containing dewetted islands is about 20 nanometers to about 100 nanometers.

6. The patterned article of claim 1 , wherein the average longest lateral cross-sectional dimension of the plurality of discrete metal-containing dewetted islands is about 30 nanometers to about 200 nanometers.

7. The patterned article of claim 1 , wherein the area fraction covered by the plurality of discrete metal-containing dewetted islands is less than or equal to about 0.25 of the surface of the continuous ultra-thin metal-containing film or film stack.

8. The patterned article of claim 1 , wherein the patterned article is at least a portion of an anti-reflection coating, a metal mask, a localized surface plasmon resonance structure, a catalyst, a catalyst support, an anti-virus coating, or an antibacterial coating.

9. A patterned article, comprising
a strengthened alkali aluminosilicate glass substrate;
a continuous ultra-thin metal-containing film or film stack disposed on a surface of the strengthened alkali aluminosilicate glass substrate, wherein the continuous ultra-thin metal-containing film or film stack has an average thickness of less than or equal to about 5 nanometers; and
a plurality of discrete dewetted metal-containing islands disposed on a surface of the continuous ultra-thin metal-containing film or film stack;
wherein the plurality of discrete metal-containing dewetted islands have an average height of about less than or equal to about 130 nanometers, an average longest lateral cross-sectional dimension of about 50 nanometers to about 200 nanometers, and are randomly oriented on the surface of the continuous ultra-thin metal-containing film or film stack so as to cover less than or equal to about 0.1 of an area fraction of the surface of the continuous ultra-thin metal-containing film or film stack.

10. The patterned article of claim 9 , wherein the plurality of discrete dewetted metal-containing islands comprise a metal in its elemental form or a metal that is a constituent of an alloy.

Assignees

• Baker David Eugene
• Carbonell Carme Gomez
• Dawson-Elli David Francis
• Mazumder Prantik
• Pruneri Valerio
• Tian Lili
• Corning Inc

Inventors

• Baker David Eugene
• Carbonell Carme Gomez
• Dawson-Elli David Francis
• Mazumder Prantik
• Pruneri Valerio
• Tian Lili

Classifications

• C23C14/185 Primary

  by cathodic sputtering · CPC title

• Y10T428/24355

  Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.] · CPC title

• C23C14/5806

  Thermal treatment · CPC title

• C03C17/06

  with metals (C03C17/34, C03C17/44 take precedence) · CPC title

• B05D3/007 Primary

  After-treatment · CPC title