Overlap susceptor and preheat ring

Patent metadata

Field	Value
Publication number	US-11781212-B2
Application number	US-202117224537-A
Country	US
Kind code	B2
Filing date	Apr 7, 2021
Priority date	Apr 7, 2021
Publication date	Oct 10, 2023
Grant date	Oct 10, 2023

Abstract

Embodiments disclosed herein generally provide improved control of gas flow in processing chambers. In at least one embodiment, a liner for a processing chamber includes an annular body having a sidewall and a vent formed in the annular body for exhausting gas from inside to outside the annular body. The vent comprises one or more vent holes disposed through the sidewall. The liner further includes an opening in the annular body for substrate loading and unloading.

First claim

What is claimed is:

1. An assembly for a processing chamber, comprising:
a susceptor, the susceptor comprising:
a substrate-receiving top surface;
a raised border radially outward of and surrounding the substrate-receiving top surface, the raised border having a top surface; and
an outer flange;

a liner radially outwardly of and surrounding a first volume below a plane of the susceptor; and
a preheat ring coupled to and extending radially inwardly from the liner and radially overlapping the susceptor, wherein:
an inner flange of the preheat ring radially overlaps the outer flange of the susceptor; and
a lower surface of the inner flange of the preheat ring is spaced apart vertically from a top surface of the outer flange of the susceptor.

2. The assembly of claim 1 , wherein radially overlapping portions of the preheat ring and the susceptor are spaced apart vertically from one another, wherein the top surface of the raised border of the susceptor, a top surface of the preheat ring, and a top surface of the liner are substantially coplanar with each other.

3. The assembly of claim 1 , wherein a radially overlapping portion of the lower surface of the inner flange of the preheat ring is disposed above a radially overlapping portion of the top surface of the outer flange of the susceptor.

4. The assembly of claim 1 , wherein a vertical gap between a radially overlapping portion of the lower surface of the inner flange of the preheat ring and the top surface of the outer flange of the susceptor is about 1 mm or less.

5. The assembly of claim 1 , wherein the preheat ring comprises:
an annular body, comprising:
the inner flange which is radially inwardly extending and configured to overlap the outer flange of the susceptor which is radially outwardly extending; and

an outer flange of the preheat ring extending below a lower surface of the preheat ring annular body; and
an inner flange of the liner, the inner flange of the liner comprising:
an upper surface configured to support the outer flange of the preheat ring; and
a raised portion configured to fit radially within the outer flange of the preheat ring, wherein the outer flange of the preheat ring is configured to be in contact with the liner.

6. The assembly of claim 1 , wherein the liner comprises:
an annular body having a sidewall;
a vent formed in the annular body for exhausting gas from inside to outside the annular body, wherein the vent comprises one or more vent holes disposed through the sidewall; and
an opening in the annular body for substrate loading and unloading.

7. An assembly for a processing chamber, comprising:
a susceptor, comprising:
a substrate-receiving top surface;
a raised border radially outward of and surrounding the substrate-receiving top surface; and
an outer flange, the outer flange extending radially outwardly in relation to the raised border;

a liner radially outward of and surrounding a first volume below a plane of the susceptor; and
a preheat ring coupled to and extending radially inwardly from the liner, the preheat ring comprising:
an inner flange, the inner flange being spaced apart horizontally from the raised border and radially overlapping the outer flange of the susceptor, wherein the outer flange of the susceptor is horizontally spaced apart from the preheat ring; and
a lower surface of the inner flange of the preheat ring spaced apart vertically from a top surface of the outer flange of the susceptor.

8. The assembly of claim 7 , wherein the lower surface of the inner flange of the preheat ring is disposed above the top surface of the outer flange of the of the susceptor.

9. The assembly of claim 7 , wherein a vertical gap between the lower surface of the inner flange of the preheat ring and the top surface of the outer flange of the susceptor are about 1 mm or less.

10. The assembly of claim 7 , further comprising:
an outer flange of the preheat ring extending below a lower surface of the preheat ring; and
an inner flange of the liner, the inner flange of the liner comprising:
an upper surface configured to support the outer flange of the preheat ring; and
a raised portion configured to fit radially within the outer flange of the preheat ring, wherein the outer flange of the preheat ring is configured to be in contact with the liner.

11. An assembly for a processing chamber, comprising:
a susceptor having a substrate-receiving top surface and an outer flange;
a preheat ring coupled to and extending radially inwardly from a liner, the preheat ring comprising:
an outer flange of the preheat ring extending below a lower surface of the preheat ring; and

the liner radially outward of and surrounding a first volume below a plane of the susceptor, the liner comprising:
an inner flange of the liner, the inner flange of the liner comprising:
an upper surface configured to support the outer flange of the preheat ring; and
a raised portion configured to fit radially within the outer flange of the preheat ring, wherein the outer flange of the preheat ring is configured to be in contact with the liner.

12. The assembly of claim 11 , further comprising:
an inner flange of the preheat ring radially overlapping the outer flange of the susceptor; and
a lower surface of the inner flange of the preheat ring spaced apart vertically from a top surface of the outer flange of the susceptor.

13. The assembly of claim 12 , wherein the lower surface of the inner flange of the preheat ring is disposed above the top surface of the outer flange of the of the susceptor.

14. The assembly of claim 12 , wherein a vertical gap between the lower surface of the inner flange of the preheat ring and the top surface of the outer flange of the susceptor are about 1 mm or less.

15. The assembly of claim 11 , further comprising:
a raised border of the susceptor radially outward of and surrounding the substrate-receiving top surface, the raised border having a top surface, wherein the outer flange of the susceptor extends radially outwardly from the raised border.

16. The assembly of claim 15 , wherein the top surface of the raised border of the susceptor, a top surface of the preheat ring, and a top surface of the liner are substantially coplanar with each other.

Assignees

• Applied Materials Inc

Inventors

• Cong Zhepeng
• Chu Schubert
• Myo Nyi Oo
• Shah Kartik Bhupendra
• Ye Zhiyuan
• Collins Richard O

Classifications

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/7611

  characterised by edge profile or support profile · CPC title

• H10P72/0462

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• H10P72/0436 Primary

  mainly by radiation · CPC title