3D nanochannel interleaved devices

US11779918B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11779918-B2
Application numberUS-201916704878-A
CountryUS
Kind codeB2
Filing dateDec 5, 2019
Priority dateDec 5, 2019
Publication dateOct 10, 2023
Grant dateOct 10, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

3D nanochannel interleaved devices for molecular manipulation are provided. In one aspect, a method of forming a device includes: forming a pattern on a substrate of alternating mandrels and spacers alongside the mandrels; selectively removing the mandrels from a front portion of the pattern forming gaps between the spacers; selectively removing the spacers from a back portion of the pattern forming gaps between the mandrels; filling i) the gaps between the spacers with a conductor to form first electrodes and ii) the gaps between the mandrels with the conductor to form second electrodes; and etching the mandrels and the spacers in a central portion of the pattern to form a channel (e.g., a nanochannel) between the first electrodes and the second electrodes, wherein the first electrodes and the second electrodes are offset from one another across the channel, i.e., interleaved. A device formed by the method is also provided.

First claim

Opening claim text (preview).

What is claimed is: 1. A device, comprising: a channel; spacers on a first side of the channel; first electrodes disposed in between the spacers on the first side of the channel; mandrels on a second side of the channel; and second electrodes disposed in between the mandrels on the second side of the channel, wherein the first electrodes and the second electrodes are interleaved such that, instead of being directly opposite one another, the first electrodes and the second electrodes are offset from one another across the channel, wherein the channel comprises an opening between the first electrodes and the spacers on the first side of the channel, and the second electrodes and the mandrels on the second side of the channel. 2. The device of claim 1 , wherein the mandrels comprise an oxide material, and wherein the spacers comprise a nitride material. 3. The device of claim 1 , wherein the first electrodes and the second electrodes comprise a conductor selected from the group consisting of: copper (Cu), tungsten (W), cobalt (Co), ruthenium (Ru), and combinations thereof. 4. The device of claim 1 , wherein the mandrels have a width of from about 5 nm to about 10 nm, and a pitch of from about 10 nm to about 20 nm. 5. The device of claim 1 , wherein the spacers have a width of from about 5 nm to about 10 nm. 6. The device of claim 1 , wherein the channel comprises a nanochannel having a width of from about 2 nm to about 10 nm. 7. The device of claim 1 , wherein the channel comprises a fluidic passage.

Assignees

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Classifications

  • characterised by the manufacture of the container or its components · CPC title

  • characterised by interfacing components, e.g. fluidic, electrical, optical or mechanical interfaces · CPC title

  • Devices without movable or flexible elements · CPC title

  • without movable or flexible elements · CPC title

  • Specific details about manufacturing devices · CPC title

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What does patent US11779918B2 cover?
3D nanochannel interleaved devices for molecular manipulation are provided. In one aspect, a method of forming a device includes: forming a pattern on a substrate of alternating mandrels and spacers alongside the mandrels; selectively removing the mandrels from a front portion of the pattern forming gaps between the spacers; selectively removing the spacers from a back portion of the pattern fo…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification B01L3/502707. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Oct 10 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).