Substrate-cleaning apparatus having tiltable roll brush

US11654458B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11654458-B2
Application numberUS-202017081855-A
CountryUS
Kind codeB2
Filing dateOct 27, 2020
Priority dateMay 21, 2020
Publication dateMay 23, 2023
Grant dateMay 23, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A substrate-cleaning apparatus may include a tilting arm to which a roll brush and a motor are coupled, a support arm positioned on the tilting arm, a first spring and a second spring coupling the tilting arm to the support arm, a first air bag and a second air bag mounted between the tilting arm and the support arm, and a controller configured to adjust an internal pressure of each of the first air bag and the second air bag. The controller may adjust a difference in internal pressure between the first air bag and the second air bag to control the inclination of the roll brush, and may adjust the internal pressure of each of the first air bag and the second air bag to move the roll brush vertically.

First claim

Opening claim text (preview).

What is claimed is: 1. A substrate-cleaning apparatus comprising: a roll brush coupled to a tilting arm; a support arm positioned on the tilting arm; a first spring and a second spring coupling the tilting arm to the support arm; a first air bag and a second air bag mounted between the tilting arm and the support arm; and a controller configured to adjust a first internal pressure of the first air bag and a second internal pressure of the second air bag, wherein the controller defines an inclination of the roll brush by adjusting a difference between the first internal pressure and the second internal pressure. 2. The substrate-cleaning apparatus of claim 1 , wherein the tilting arm comprises a motor-coupling portion secured to a motor, and a driving shaft of the motor penetrates the motor-coupling portion and is connected to the roll brush. 3. The substrate-cleaning apparatus of claim 1 , wherein the first air bag is located further away from one end of the roll brush than the second air bag, and the controller adjusts the first internal pressure to be greater than the second internal pressure to tilt the roll brush, such that the one end of the roll brush is higher than another end of the roll brush. 4. The substrate-cleaning apparatus of claim 3 , wherein controller adjusts the first internal pressure to expand the first air bag, and adjusts the second internal pressure to contract the second air bag. 5. The substrate-cleaning apparatus of claim 3 , wherein controller adjusts the first internal pressure to expand the first air bag, and adjusts the second internal pressure to expand the second air bag less than first air bag. 6. The substrate-cleaning apparatus of claim 1 , wherein the first air bag is located further away from one end of the roll brush than the second air bag, and the controller adjusts the first internal pressure to be less than the second internal pressure to tilt the roll brush, such that the one end of the roll brush is lower than another end of the roll brush. 7. The substrate-cleaning apparatus of claim 6 , wherein controller adjusts the first internal pressure to contract the first spring, and adjusts the second internal pressure to extend the second spring. 8. The substrate-cleaning apparatus of claim 6 , wherein controller adjusts the first internal pressure to expand the first air bag, and adjusts the second internal pressure to expand the second air bag greater than first air bag. 9. The substrate-cleaning apparatus of claim 1 , wherein the controller further adjusts at least one of the first internal pressure and the second internal pressure to move the roll brush vertically. 10. The substrate-cleaning apparatus of claim 1 , wherein the first air bag and the second air bag are laterally disposed between the first spring and the second spring. 11. The substrate-cleaning apparatus of claim 1 , further comprising: a lower plate laterally penetrating the first air bag and secured to the tilting arm. 12. The substrate-cleaning apparatus of claim 1 , further comprising: an upper plate coupled to the support arm within the first air bag, wherein the upper plate includes a hole allowing gas to pass therethrough. 13. The substrate-cleaning apparatus of claim 1 , wherein the tilting arm further comprises: a first lower protruding portion and a second lower protruding portion protruding from a top surface, and the support arm further comprises: a first upper protruding portion and a second upper protruding portion protruding from a bottom surface. 14. The substrate-cleaning apparatus of claim 13 , wherein the first air bag is disposed between the first lower protruding portion and the first upper protruding portion, and the second air bag is disposed between the second lower protruding portion and the second upper protruding portion. 15. The substrate-cleaning apparatus of claim 1 , wherein the support arm comprises therein a through-hole communicating with an interior of the first air bag. 16. The substrate-cleaning apparatus of claim 15 , further comprising: a nozzle connected to the through-hole. 17. A substrate-cleaning apparatus comprising: a roll brush coupled to a tilting arm, wherein the tilting arm includes a motor-coupling portion securing a motor; a support arm positioned on the tilting arm; a first air bag and a second air bag mounted between the tilting arm and the support arm; an upper bracket positioned between the first air bag and the second air bag and protruding from a bottom surface of the support arm; a lower bracket protruding from a top surface of the tilting arm; a pivot shaft inserted into the upper bracket and the lower bracket; and a controller configured to adjust a first internal pressure of the first air bag and a second internal pressure of the second air bag, wherein the controller defines an inclination of the roll brush by adjusting a difference between the first internal pressure and the second internal pressure. 18. The substrate-cleaning apparatus of claim 17 , wherein the controller adjust the first internal pressure to be greater than the second internal pressure to tilt the roll brush about the pivot shaft, such that a distal end of the roll brush is higher than a proximate end of the roll brush. 19. The substrate-cleaning apparatus of claim 17 , wherein the controller adjusts the first internal pressure to be less than the second internal pressure to tilt the roll brush about the pivot shaft, such that a distal end of the roll brush is lower than a proximate end of the roll brush. 20. A substrate-cleaning apparatus comprising: a roll brush; a motor configured to rotate the roll brush; a tilting arm including a bracket to support the roll brush and a motor-coupling portion to secure the motor, a driving shaft of the motor penetrating the motor-coupling portion to be connected to the roll brush; a support arm positioned on the tilting arm; a first air bag and a second air bag suspending the tilting arm from the support arm; a vertical shaft securing the support arm; an vertical adjustment driving unit coupled to the vertical shaft to vertically adjust the tilting arm and the support arm; a regulator connected to the first air bag and the second air bag; and a controller configured to control the regulator to adjust a first internal pressure of the first air bag and a second internal pressure of the second air bag, wherein the controller adjusts a difference between the first internal pressure and the second internal pressure to control an inclination of the tilting arm.

Assignees

Inventors

Classifications

  • rotating about an axis parallel to the surface · CPC title

  • Brushes · CPC title

  • A46B13/001Primary

    Cylindrical or annular brush bodies · CPC title

  • Brushes for cleaning or polishing · CPC title

  • power-driven {carriers} · CPC title

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What does patent US11654458B2 cover?
A substrate-cleaning apparatus may include a tilting arm to which a roll brush and a motor are coupled, a support arm positioned on the tilting arm, a first spring and a second spring coupling the tilting arm to the support arm, a first air bag and a second air bag mounted between the tilting arm and the support arm, and a controller configured to adjust an internal pressure of each of the firs…
Who is the assignee on this patent?
Samsung Electronics Co Ltd
What technology area does this patent fall under?
Primary CPC classification A46B13/001. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Tue May 23 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).