Substrate cleaning apparatus and substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-10575697-B2
Application number	US-201815946607-A
Country	US
Kind code	B2
Filing date	Apr 5, 2018
Priority date	Apr 7, 2017
Publication date	Mar 3, 2020
Grant date	Mar 3, 2020

Abstract

Various examples of a substrate cleaning apparatus and a substrate processing apparatus are described in the present disclosure. One example of the present invention is a substrate cleaning apparatus including a roll cleaning member cleaning a substrate, an inclination sensor detecting an inclination of the roll cleaning member, and an output device outputting a detection result of the inclination sensor.

First claim

What is claimed is:

1. A substrate cleaning apparatus comprising:
a substrate holding member holding a substrate;
a roll cleaning member cleaning the substrate held by the substrate holding member;
an inclination sensor detecting an inclination of the roll cleaning member; and
an output device outputting a detection result of the inclination sensor.

2. The substrate cleaning apparatus according to claim 1 , comprising, as the output device, an inclination correction device correcting the inclination of the roll cleaning member based on a detection result of the inclination sensor.

3. The substrate cleaning apparatus according to claim 2 , comprising: a raising and lowering device approximating or separating the roll cleaning member with respect to the substrate, wherein
the inclination correction device previously corrects the inclination of the roll cleaning member such that a rotation axis of the roll cleaning member is parallel to a surface of the substrate before the raising and lowering device causes the roll cleaning member to be in contact with the substrate.

4. The substrate cleaning apparatus according to claim 2 , comprising:
a raising and lowering device approximating or separating the roll cleaning member with respect to the substrate; and
a cleaning device cleaning the roll cleaning member, wherein
the inclination correction device previously corrects the inclination of the roll cleaning member such that a rotation axis of the roll cleaning member is parallel to a cleaning surface of the cleaning device before the raising and lowering device causes the roll cleaning member to be in contact with the cleaning device.

5. The substrate cleaning apparatus according to claim 2 , comprising:
a raising and lowering device raising and lowering the roll cleaning member;
a cleaning device cleaning the roll cleaning member; and
a horizontal movement device horizontally moving the roll cleaning member between a substrate cleaning position located right above the substrate and a cleaning position located right above the cleaning device, wherein
the inclination correction device previously corrects the inclination of the roll cleaning member such that a rotation axis of the roll cleaning member is parallel to a horizontal plane before the horizontal movement device causes the roll cleaning member to move between the substrate cleaning position and the cleaning position.

6. The substrate cleaning apparatus according to claim 2 , comprising:
a roll holder supporting the roll cleaning member; and
an arm suspending the roll holder, wherein
the inclination correction device includes:
a tilt mechanism connecting the roll holder to the arm; and
an expanding and contracting cylinder device disposed between the roll holder and the arm.

7. The substrate cleaning apparatus according to claim 6 , wherein the inclination sensor is disposed on a straight line passing through a connection center of the tilt mechanism and orthogonal to a rotation axis of the roll cleaning member.

8. The substrate cleaning apparatus according to claim 1 , wherein the inclination sensor is an acceleration sensor.

9. A substrate processing apparatus comprising:
a polishing section polishing a substrate; and
a cleaning section cleaning the substrate polished at the polishing section, wherein
the substrate processing apparatus includes, as the cleaning section, the substrate cleaning apparatus according to claim 1 .

10. A substrate cleaning apparatus comprising:
a substrate holding member holding a substrate;
a roll cleaning member cleaning the substrate held by the substrate holding member;
a cleaning member holder supporting the cleaning member;
an inclination sensor detecting an inclination of the cleaning member; and
an inclination correction device outputting an outputted detection result of the inclination sensor, and moving the cleaning member holder so as to correct the inclination of the roll cleaning member based on the outputted detection result of the inclination sensor.

Assignees

• Ebara Corp

Inventors

• Imamura Akira
• Kunisawa Junji
• Miyazaki Mitsuru

Classifications

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0472

  comprising at least one polishing chamber · CPC title

• H10P72/0412

  using mainly scrubbing means, e.g. brushes · CPC title

• B24B37/10

  for single side lapping · CPC title

• B24B27/0023

  grinding machines with a plurality of working posts · CPC title