Substrate support pedestal having plasma confinement features
US-2017306494-A1 · Oct 26, 2017 · US
Ground electrode formed in an electrostatic chuck for a plasma processing chamber
US11640917B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11640917-B2 |
| Application number | US-201916600997-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 14, 2019 |
| Priority date | Dec 7, 2018 |
| Publication date | May 2, 2023 |
| Grant date | May 2, 2023 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
Disclosed herein is a substrate support assembly having a ground electrode mesh disposed therein along a side surface of the substrate support assembly. The substrate support assembly has a body. The body has an outer top surface, an outer side surface and an outer bottom surface enclosing an interior of the body. The body has a ground electrode mesh disposed in the interior of the body and adjacent the outer side surface, wherein the ground electrode does not extend through to the outer top surface or the outer side surface.
First claim
Opening claim text (preview).
What is claimed is: 1. A substrate support assembly, comprising: a body having an outer top surface, an outer side surface and an outer bottom surface enclosing an interior of the body, the body comprising: a cylindrical ground electrode vertically disposed in the interior of the body and adjacent the outer side surface; and an RF electrode electrically coupled to the cylindrical ground electrode, wherein the RF electrode is horizontally disposed in the interior of the body, wherein the cylindrical ground electrode is electrically coupled to a contact pad extending through the outer bottom surface. 2. The substrate support assembly of claim 1 further comprising: a heater disposed in the interior of the body; and a HV ESC electrode disposed in the interior of the body. 3. The substrate support assembly of claim 2 , wherein each of the heaters, RF electrode, HV ESC electrode are disposed on parallel layers in the body. 4. The substrate support assembly of claim 3 , wherein the body is fabricated from aluminum nitride or aluminum oxide. 5. The substrate support assembly of claim 1 , further comprising: a shaft coupled to the outer bottom surface of the body. 6. The substrate support assembly of claim 1 , wherein the cylindrical ground electrode is a cage. 7. The substrate support assembly of claim 1 , wherein the cylindrical ground electrode is continuously solid along a radius of the cylindrical shape.
Assignees
Inventors
Classifications
mainly by conduction · CPC title
- H10P72/722Primary
Details of electrostatic chucks · CPC title
characterised by the mechanical construction of the susceptor, stage or support · CPC title
characterised by a coating, a hardness or a material · CPC title
characterised by lifting arrangements, e.g. lift pins · CPC title
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- What does patent US11640917B2 cover?
- Disclosed herein is a substrate support assembly having a ground electrode mesh disposed therein along a side surface of the substrate support assembly. The substrate support assembly has a body. The body has an outer top surface, an outer side surface and an outer bottom surface enclosing an interior of the body. The body has a ground electrode mesh disposed in the interior of the body and adj…
- Who is the assignee on this patent?
- Applied Materials Inc
- What technology area does this patent fall under?
- Primary CPC classification H10P72/722. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue May 02 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).