Heating zone separation for reactant evaporation system

US11624113B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11624113-B2
Application numberUS-202017011828-A
CountryUS
Kind codeB2
Filing dateSep 3, 2020
Priority dateSep 13, 2019
Publication dateApr 11, 2023
Grant dateApr 11, 2023

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Systems and methods related to temperature zone control systems can include a reactant source cabinet that is configured to be at least partially evacuated, a vessel base that is configured to hold solid source chemical reactant therein, and a lid that is coupled to a distal portion of the vessel base. The lid may include one or more lid valves. The system may further include a plurality of gas panel valves that are configured to deliver gas from a gas source to the vessel. The system may include a heating element that is configured to heat the one or more lid valves. The system may include a heat shield, a first portion of which is disposed between the one or more lid valves and the vessel base. A second portion of the heat shield may be disposed between the first heating element and the plurality of gas panel valves.

First claim

Opening claim text (preview).

What is claimed is: 1. A temperature zone control system comprising: a reactant source cabinet configured to be at least partially evacuated; a vessel base configured to hold solid source chemical reactant therein, the vessel base configured to be disposed within the reactant source cabinet; a lid coupled to a distal portion of the vessel base, the lid comprising one or more lid valves; a plurality of gas panel valves configured to deliver gas from a gas source to the vessel; a first heating element configured to heat the one or more lid valves; and a heat shield, a first portion of which is disposed between the one or more lid valves and the vessel base, and a second portion of which is disposed between the first heating element and the plurality of gas panel valves, the heat shield configured to impede a transfer of heat from the lid valve to the vessel base. 2. The system of claim 1 , further comprising a cooling element in thermal communication with a proximal portion of the vessel base, and configured to preferentially cool the proximal portion of the vessel base, thereby establishing a temperature gradient from the proximal portion to the distal portion of the vessel base. 3. The system of claim 2 , wherein the cooling element in conjunction with the first heating element maintains the one or more lid valves above a first threshold temperature without raising the vessel base above a second threshold temperature that is lower than the first threshold temperature. 4. The system of claim 1 , wherein the first portion of the heat shield comprises a first plate, and the second portion of the heath shield comprises a second plate, the first plate disposed at an angle to the second plate. 5. The system of claim 4 , wherein the first plate is disposed between the one or more lid valves and the vessel base, and wherein the second plate is disposed approximately parallel to an axis of the vessel base. 6. The system of claim 5 , further comprising a second heating element, the second heating element disposed such that the second plate is disposed between the one or more lid valves and the plurality of gas panel valves. 7. The system of claim 1 , wherein the heat shield is configured to impede a heat transfer to the vessel base such that a ratio of a rate of heat transfer from the first heating element to the one or more lid valves to a rate of heat transfer from the first heating element to the vessel base is greater than about 5. 8. The system of claim 1 , wherein the first portion of the heat shield is configured to be disposed between the one or more lid valves and at least a portion of the lid. 9. The system of claim 1 , wherein the first heating element is configured to maintain the one or more lid valves above a first threshold temperature without raising the vessel base above a second threshold temperature that is lower than the first threshold temperature. 10. The system of claim 1 , wherein each of the one or more lid valves comprises a respective filter configured to prevent a passage of particulate matter therethrough. 11. The system of claim 10 , wherein a porosity of at least one of the plurality of filters is configured to prevent a passage of the reactant therethrough below a threshold temperature and to allow a passage of the reactant therethrough above the threshold temperature.

Assignees

Inventors

Classifications

  • Gas plumbing upstream of the reaction chamber · CPC title

  • by evaporation without using carrier gas in contact with the source material (C23C16/4486 takes precedence) · CPC title

  • C23C16/448Primary

    characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials · CPC title

  • Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title

  • by radiant heating of the substrate · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11624113B2 cover?
Systems and methods related to temperature zone control systems can include a reactant source cabinet that is configured to be at least partially evacuated, a vessel base that is configured to hold solid source chemical reactant therein, and a lid that is coupled to a distal portion of the vessel base. The lid may include one or more lid valves. The system may further include a plurality of gas…
Who is the assignee on this patent?
Asm Ip Holding Bv
What technology area does this patent fall under?
Primary CPC classification C23C16/4485. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 11 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).