Substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-11610790-B2
Application number	US-202117245079-A
Country	US
Kind code	B2
Filing date	Apr 30, 2021
Priority date	Feb 18, 2015
Publication date	Mar 21, 2023
Grant date	Mar 21, 2023

Abstract

A supply flow passage branches into a plurality of upstream flow passages. The plurality of upstream flow passages include a branching upstream flow passage that branches into a plurality of downstream flow passages. A plurality of discharge ports are respectively disposed at a plurality of positions differing in distance from a rotational axis and discharge processing liquids, supplied via the plurality of upstream flow passages, toward an upper surface of a substrate held by a substrate holding unit.

First claim

What is claimed is:

1. A substrate processing apparatus comprising:
a substrate holding unit rotating a substrate around a vertical rotational axis passing through a central portion of the substrate while holding the substrate horizontally; and
a processing liquid supplying system including a supply flow passage, a plurality of upstream flow passages, a plurality of discharge ports, a first nozzle and a second nozzle, the processing liquid supplying system supplying a processing liquid to the substrate held by the substrate holding unit,
wherein the supply flow passage guides the processing liquid toward the plurality of upstream flow passages,
the plurality of upstream flow passages branch from the supply flow passage, are connected to the plurality of discharge ports, respectively and guide the processing liquid, supplied from the supply flow passage, toward the plurality of discharge ports,
the plurality of discharge ports include a first discharge port disposed in the first nozzle and a second discharge port disposed in the second nozzle, the plurality of discharge ports are aligned in a plan view in a radial direction orthogonal to the rotational axis, and the plurality of discharge ports discharge the processing liquid, supplied via the plurality of upstream flow passages, toward a plurality of positions within an upper surface of the substrate including an upper surface central portion of the substrate, respectively,
the first nozzle includes a first arm portion extending in a horizontal longitudinal direction and a first tip portion extending downward from a tip of the first arm portion,
the second nozzle includes a second arm portion extending in the longitudinal direction and a second tip portion extending downward from a tip of the second arm portion,
the first arm portion and the second arm portion are aligned in a horizontal alignment direction orthogonal to the longitudinal direction,
a length of the first arm portion and a length of the second arm portion are different from each other, and
the tip of the first arm portion and the tip of the second arm portion are separated in the longitudinal direction in a plan view such that the tip of the first arm portion is positioned at the rotational axis side.

2. The substrate processing apparatus according to claim 1 , wherein the length of the second arm portion is shorter than the length of the first arm portion.

3. The substrate processing apparatus according to claim 2 , wherein the tip of the first arm portion and the tip of the second arm portion are aligned in the radial direction in a plan view.

4. The substrate processing apparatus according to claim 3 , wherein
the first discharge port is the only discharge port disposed in the first nozzle,
a plurality of the second discharge ports are disposed in the second nozzle, and
the first discharge port and the plurality of the second discharge port are aligned in the radial direction in a plan view.

5. The substrate processing apparatus according to claim 1 , further comprising:
a holder that holds the first nozzle and the second nozzle; and
a nozzle moving unit that moves the first nozzle and the second nozzle by moving the holder.

6. The substrate processing apparatus according to claim 5 , wherein
the processing liquid supplying system further includes a third nozzle held by the holder,
the third nozzle includes a third arm portion extending in the longitudinal direction and a third tip portion extending downward from a tip of the third arm portion,
a length of the third arm portion is shorter than the length of the second arm portion,
the plurality of discharge ports further include a third discharge port disposed in the third nozzle, and
the nozzle moving unit moves the first nozzle, the second nozzle and the third nozzle.

7. The substrate processing apparatus according to claim 6 , wherein the tip of the first arm portion, the tip of the second arm portion and the tip of the third arm portion are linearly aligned in the radial direction in a plan view.

8. The substrate processing apparatus according to claim 1 , further comprising:
a cup surrounding the substrate holding unit about the rotational axis;
a standby pot arranged outside the cup in a plan view; and
a nozzle moving unit that moves the first nozzle and the second nozzle between a processing position, in which the tip of the first arm portion and the tip of the second arm portion overlap the substrate held by the substrate holding unit in a plan view, and a standby position, in which the tip of the first arm portion and the tip of the second arm portion overlap the standby pot in a plan view, by horizontally turning the first nozzle and the second nozzle.

9. The substrate processing apparatus according to claim 8 , wherein at the standby position, the tips of the first nozzle and the second nozzle are positioned outside the cup along an outer circumferential surface of the cup in a plan view and aligned in a circumferential direction in order of the first nozzle to the second nozzle.

Assignees

• Screen Holdings Co Ltd

Inventors

• Kobayashi Kenji
• Sawashima Jun
• Nishimura Yuta
• Hatano Akito
• Shimai Motoyuki
• Hayashi Toyohide

Classifications

• H10P72/0602

  Temperature monitoring · CPC title

• H10P72/0434

  mainly by convection · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0406

  for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title