Curing pre-applied and plasma-etched underfill via a laser

Patent metadata

Field	Value
Publication number	US-11563142-B2
Application number	US-202016748685-A
Country	US
Kind code	B2
Filing date	Jan 21, 2020
Priority date	Jun 11, 2019
Publication date	Jan 24, 2023
Grant date	Jan 24, 2023

Abstract

The invention is directed towards enhanced systems and methods for employing a pulsed photon (or EM energy) source, such as but not limited to a laser, to electrically couple, bond, and/or affix the electrical contacts of a semiconductor device to the electrical contacts of another semiconductor devices. Full or partial rows of LEDs are electrically coupled, bonded, and/or affixed to a backplane of a display device. The LEDs may be μLEDs. The pulsed photon source is employed to irradiate the LEDs with scanning photon pulses. The EM radiation is absorbed by either the surfaces, bulk, substrate, the electrical contacts of the LED, and/or electrical contacts of the backplane to generate thermal energy that induces the bonding between the electrical contacts of the LEDs' electrical contacts and backplane's electrical contacts. The temporal and spatial profiles of the photon pulses, as well as a pulsing frequency and a scanning frequency of the photon source, are selected to control for adverse thermal effects.

First claim

What is claimed is:

1. A method for coupling a semiconductor device to a target substrate, wherein the semiconductor device includes a first surface and a first contact disposed on the first surface, the target substrate includes a second surface and a second contact disposed on the second surface, and the method comprises:
depositing uncured underfill (UF) material on the second surface, wherein the uncured UF material substantially covers the second surface and substantially encapsulates the second contact;
removing an excess portion of the uncured UF material to form an exposed layer of the uncured UF material that at least partially exposes a distal portion of the second contact;
positioning the semiconductor device proximate to the target substrate to form a spatial alignment of the first contact with the second contact, wherein the first and the second surfaces are opposed surfaces, a void is disposed between the first surface and the exposed layer of the uncured UF material, and the at least partially exposed distal portion of the second contact is adjacent a distal portion of the first contact; and
transmitting a photon beam, having a spatial profile characterized by at least one of a one dimensional or two dimensional spatial pulse width, and a beam spot size and a temporal profile characterized by a temporal pulse width, into the semiconductor device to provide thermal energy to cure the uncured UF material, wherein the thermal energy increases a volume of the uncured UF material and decreases a volume of the void disposed between the first surface and the exposed layer of the uncured UF material, the cured UF material stabilizes the spatial alignment of the first contact with the second contact, and a wavelength of the photon beam is selected such that a substantial portion of the thermal energy is deposited in an epitaxial layer of the semiconductor device and diffuses into the uncured UR material.

2. The method of claim 1 , further comprising:
transmitting the photon beam to irradiate the semiconductor device.

3. The method of claim 1 , wherein the photon beam includes a photon pulse with a temporal profile that is modulated to control thermal effects associated with the thermal energy and the spatial alignment of the first contact with the second contact, the thermal energy curing the UF material.

4. The method of claim 1 , wherein a temporal profile of the photon beam is based on a thermal diffusivity and a geometry associated with the semiconductor device such that the temporal profile localizes the thermal effects to at least one of the first contact, the second contact, and another portion of the uncured UF material adjacent the second contact.

5. The method of claim 1 , wherein removing the excess portion of the uncured UF material includes:
exposing the uncured UF material to a plasma source that etches away the excess portion of the uncured UF material and functionalizes a surface of the at least partially exposed distal portion of the second contact.

6. The method of claim 1 , wherein providing the thermal energy includes:
localizing the thermal effects such that the localized thermal effects include decreasing a viscosity of a localized portion of the uncured UF material and increasing the volume of the localized portion of the uncured UF material such that at least some of the localized portion of the uncured UF material flows over a surface of the at least partially exposed distal portion of the second contact, wherein the localized portion of the uncured UF material is localized around the second contact.

7. The method of claim 1 , wherein at least a portion of the thermal energy electrically bonds the distal portion of the first contact to the at least partially exposed distal portion of the second contact.

8. The method of claim 1 , wherein the semiconductor device is a micro light emitting diode (μLED) with feature sizes that are less than 3 micrometers (μm) and the target substrate is a backplane of a display device.

9. The method of claim 1 , wherein the photon beam is a scanning photon beam and the method further comprises:
irradiating the at least one of the semiconductor device or the target substrate with the scanning photon beam by scanning the scanning photon beam across the at least one of the semiconductor device or the target substrate.

10. The method of claim 9 , wherein the scanning photon beam is a scanning pulsed laser beam.

11. A method for coupling a semiconductor device to a target substrate, wherein the semiconductor device includes a first surface and a first contact disposed on the first surface, the target substrate includes a second surface and a second contact disposed on the second surface, and the method comprises:
depositing uncured underfill (UF) material on the second surface, wherein the uncured UF material substantially covers the second surface and substantially encapsulates the second contact;
removing an excess portion of the uncured UF material to form an exposed layer of the uncured UF material that at least partially exposes a distal portion of the second contact;
positioning the semiconductor device proximate to the target substrate to form a spatial alignment of the first contact with the second contact, wherein the first and the second surfaces are opposed surfaces, a void is disposed between the first surface and the exposed layer of the uncured UF material, and the at least partially exposed distal portion of the second contact is adjacent a distal portion of the first contact; and
transmitting a pulsed photon beam into at least a portion of at least one of the semiconductor device or the target substrate to provide thermal energy to cure the uncured UF material, wherein the thermal energy increases a volume of the uncured UF material and decreases a volume of the void disposed between the first surface and the exposed layer of the uncured UF material, and a temporal offset between consecutive pulses of the pulsed photon beam is selected to control a mismatch between a coefficient of thermal expansion (CTE) of the semiconductor device and a CTE of the target substrate, which stabilizes the spatial alignment of the first contact with the second contact during curing of the UF material.

12. The method of claim 11 , further comprising: transmitting the photon beam to irradiate the semiconductor device.

13. The method of claim 11 , wherein a temporal profile of the photon beam is based on a thermal diffusivity and a geometry associated with the semiconductor device such that the temporal profile localizes the thermal effects to at least one of the first contact, the second contact, and another portion of the uncured UF material adjacent the second contact.

14. The method of claim 11 , wherein removing the excess portion of the uncured UF material includes:
exposing the uncured UF material to a plasma source that etches away the excess portion of the uncured UF material and functionalizes a surface of the at least partially exposed distal portion of the second contact.

15. The method of claim 11 , wherein providing the thermal energy includes:
localizing the thermal effects such that the localized thermal effects include decreasing a viscosity of a localized portion of the uncured UF material and increasing the volume of the localized portion of the uncured UF material such that at least some of the localized portion of the uncured UF material flows over a surface of the at least partially exposed distal portion of the second contact, wherein the localized portion of the uncured UF material is localized around the second contact.

Assignees

• Facebook Tech Llc
• Meta Platforms Tech Llc

Inventors

• Brodoceanu Daniel
• Abad Oscar Torrents
• Wu Jeb
• Chio Zheng Sung
• Sengul Ali

Classifications

• H10W99/00

  Subject matter not provided for in other groups of this subclass · CPC title

• G02B27/0172

  characterised by optical features · CPC title

• H01L33/0095 Primary

  Electricity · mapped topic

• G02B2027/0178

  Eyeglass type (eyeglass details G02C) · CPC title

• H01L25/0753

  Electricity · mapped topic