EUV radiation source, insert for an EUV radiation source and insert for an insert for an EUV radiation source

Patent metadata

Field	Value
Publication number	US-11550225-B2
Application number	US-202117336480-A
Country	US
Kind code	B2
Filing date	Jun 2, 2021
Priority date	Jun 3, 2020
Publication date	Jan 10, 2023
Grant date	Jan 10, 2023

Abstract

An inner insert for a passage opening in an outer insert for an EUV radiation source is embodied in multiple parts and/or has a plurality of sections that extend in the longitudinal direction and have different internal diameters (di, da).

First claim

What is claimed is:

1. An EUV radiation source, comprising
a source chamber with
a chamber wall having at least one chamber opening,
a first insert, inserted into the chamber opening, with an outer passage channel extending in a longitudinal direction, and
an inner insert, arranged in the outer passage channel, with an inner passage channel extending in the longitudinal direction,

wherein the inner insert
is embodied in two or more separate parts that adjoin one another in the longitudinal direction and
has a plurality of sections that extend in the longitudinal direction and have different internal diameters (di, da), which are constant in the longitudinal direction.

2. The EUV radiation source of claim 1 , wherein the inner insert is arranged in the outer passage channel such that it completely covers an inner wall, which extends parallel to the longitudinal direction from a first end region to a second end region, of the outer passage channel in the region of the first end region in the direction perpendicular to the longitudinal direction.

3. An insert configured to be disposed in a source chamber of an EUV radiation source, in which the source chamber comprises a chamber wall having at least one chamber opening, the insert comprising
an outer passage channel extending in a longitudinal direction, and
an inner insert, arranged in the outer passage channel, with an inner passage channel extending in the longitudinal direction,
wherein the inner insert
is embodied in two or more separate parts that adjoin one another in the longitudinal direction and
has a plurality of sections that extend in the longitudinal direction and have different internal diameters (di, da), which are constant in the longitudinal direction.

4. The insert of claim 3 , wherein the inner insert lies flat against the inside of the outer passage channel.

5. The insert of claim 3 , wherein the inner insert is arranged in the outer passage channel such that it completely covers an inner wall, which extends parallel to the longitudinal direction from a first end region to a second end region, of the outer passage channel in the region of the first end region in the direction perpendicular to the longitudinal direction.

6. An illumination system for a projection exposure apparatus, a mask inspection apparatus or a metrology system, having an EUV radiation source with an insert according to claim 3 .

7. A projection exposure apparatus for EUV lithography, comprising
the illumination system according to claim 6 for illuminating a reticle arranged in an object field, and
a projection optical unit for imaging the reticle onto a wafer arranged in an image field.

8. The projection exposure apparatus of claim 7 , wherein the inner insert lies flat against the inside of the outer passage channel.

9. The projection exposure apparatus of claim 7 , wherein the inner insert is arranged in the outer passage channel such that it completely covers an inner wall, which extends parallel to the longitudinal direction from a first end region to a second end region, of the outer passage channel in the region of the first end region in the direction perpendicular to the longitudinal direction.

10. A metrology system for inspecting a mask for EUV lithography, having the illumination system according to claim 6 .

11. The illumination system of claim 6 , wherein the inner insert lies flat against the inside of the outer passage channel.

12. The illumination system of claim 6 , wherein the inner insert is arranged in the outer passage channel such that it completely covers an inner wall, which extends parallel to the longitudinal direction from a first end region to a second end region, of the outer passage channel in the region of the first end region in the direction perpendicular to the longitudinal direction.

13. The illumination system of claim 6 , wherein the inner insert is produced at least partially from molybdenum or a molybdenum compound.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Pilch Iris
• Hasbun Wood Juan Jose
• Metzmacher Christof
• Hagg Michael

Classifications

• G03F7/70058

  Mask illumination systems · CPC title

• G03F7/70033 Primary

  by plasma extreme ultraviolet [EUV] sources · CPC title

• G03F7/70975

  Assembly, maintenance, transport or storage of apparatus · CPC title

• H05G2/001

  Production of X-ray radiation generated from plasma · CPC title