Plasma generator, cleaning liquid processing apparatus, semiconductor device cleaning apparatus, cleaning liquid processing method, and method of manufacturing semiconductor device

Patent metadata

Field	Value
Publication number	US-11545372-B2
Application number	US-201916421473-A
Country	US
Kind code	B2
Filing date	May 24, 2019
Priority date	Jul 13, 2018
Publication date	Jan 3, 2023
Grant date	Jan 3, 2023

Abstract

A plasma generator, a cleaning liquid processing apparatus including the same, a semiconductor cleaning apparatus, and a cleaning liquid processing method are provided. The cleaning liquid processing apparatus comprising a bubble formation section configured to lower a pressure of a mixed liquid obtained by mixing a liquid and a gas to form bubbles in the mixed liquid, a plasma generator connected to the bubble formation section and configured to apply a voltage to the mixed liquid to form plasma in the bubbles formed in the mixed liquid, a mixing section connected to the plasma generator and configured to dissolve radicals included in the plasma into the mixed liquid, and a discharge nozzle connected to the mixing section and configured to discharge the mixed liquid to a wafer.

First claim

What is claimed is:

1. A cleaning liquid processing apparatus comprising:
a blending section configured to increase a pressure of a mixed liquid obtained by mixing a liquid and a gas to dissolve the gas into the liquid;
a bubble formation section configured to lower the pressure of the mixed liquid to form bubbles in the mixed liquid, the bubble formation section including a wall having an orifice, wherein when the orifice is closed, the pressure of the mixed liquid in the blending section increases, and when the orifice is open, the mixed liquid flows from the blending section through the wall via the orifice;
a plasma generator connected to the bubble formation section and configured to apply a voltage to the mixed liquid to form plasma in the bubbles formed in the mixed liquid, the plasma generator configured such that the plasma is formed in the bubbles while the mixed liquid flows between a first electrode and a second electrode included in the plasma generator, the voltage applied between the first electrode and the second electrode;
a mixing section connected to the plasma generator and configured to dissolve radicals included in the plasma into the mixed liquid; and
a discharge nozzle connected to the mixing section and configured to discharge the mixed liquid to a wafer.

2. The cleaning liquid processing apparatus of claim 1 ,
wherein the first electrode and the second electrode have an area disposed therebetween, and a third electrode is disposed between the first electrode and the second electrode and overlaps at least a portion of the area defined between the first electrode and the second electrode.

3. The cleaning liquid processing apparatus of claim 1 , further comprising:
a pump configured to increase the pressure of the mixed liquid disposed inside the blending section to supersaturate and dissolve the gas into the liquid.

4. The cleaning liquid processing apparatus of claim 1 ,
wherein the first electrode is connected to an RF pulse power supply, and
wherein the second electrode is grounded.

5. The cleaning liquid processing apparatus of claim 1 , wherein the mixed liquid in the plasma generator moves in a first direction, and
the first and second electrodes extend in the first direction.

6. The cleaning liquid processing apparatus of claim 5 , wherein the first electrode has a cylindrical shape having a first diameter in a cross-sectional view, and
wherein the second electrode is located at the center of a cylinder defined by the first electrode.

7. The cleaning liquid processing apparatus of claim 1 , wherein the mixing section includes an uneven shape on an inner wall.

8. The cleaning liquid processing apparatus of claim 7 , wherein the uneven shape is a spiral.

9. The cleaning liquid processing apparatus of claim 7 , wherein the mixing section includes a mixer configured to guide a rotational movement of the mixed liquid therein, and
wherein the mixer is disposed in a central area of the mixing section spaced apart from side walls of the mixing section.

10. The cleaning liquid processing apparatus of claim 1 , further comprising:
a bubble cutter connected to the mixing section, the bubble cutter configured to remove bubbles disposed inside the mixed liquid.

11. The cleaning liquid processing apparatus of claim 1 , wherein the apparatus is configured to sequentially pass the mixed liquid through the bubble formation section, the plasma generator, the mixing section, and the discharge nozzle, and
wherein the apparatus is configured to directly inject the mixed liquid onto the wafer.

12. The cleaning liquid processing apparatus of claim 1 , wherein the plasma generator includes a plasma electrode outer wall extending in a first direction and a filling film defined by the plasma electrode outer wall and including first and second penetration holes formed in the first direction and spaced apart from each other,
the first electrode is formed on a part of an inner wall of the first penetration hole,
the second electrode is formed on a part of an inner wall of the second penetration hole.

13. A semiconductor cleaning apparatus comprising:
a chamber;
a chuck disposed inside the chamber, the chuck configured to receive a wafer;
a cleaning liquid processing apparatus configured to inject a cleaning liquid onto an upper surface of the wafer,
wherein the cleaning liquid processing apparatus includes:
a blending section configured to increase a pressure of a mixed liquid obtained by mixing a liquid and a gas to dissolve the gas into the liquid;
a bubble formation section configured to lower the pressure of a mixed liquid to form bubbles in the mixed liquid, the bubble formation section including a wall having a plurality of orifices, wherein when the orifices are closed, the pressure of the mixed liquid in the blending section increases, and when the orifices are open, the mixed liquid flows from the blending section through the wall via the orifices;
a plasma generator connected to the bubble formation section and configured to apply a voltage to the mixed liquid to form plasma in the bubbles formed in the bubble formation section;
a mixing section connected to the plasma generator and configured to dissolve radicals included in the plasma into the mixed liquid to form the cleaning liquid, the mixing section including a mixer disposed in a central area spaced apart from side walls of the mixing section; and
a discharge nozzle connected to the mixing section and configured to discharge the cleaning liquid to the wafer.

14. The semiconductor cleaning apparatus of claim 13 , wherein the cleaning liquid processing apparatus is movable in a horizontal direction over an upper surface of the wafer.

15. The semiconductor cleaning apparatus of claim 13 , wherein the chuck is configured to rotate the wafer, and
the cleaning liquid processing apparatus is disposed over the chuck.

16. The semiconductor cleaning apparatus of claim 13 , wherein the discharge nozzle is movable over the wafer.

17. The semiconductor cleaning apparatus of claim 13 , wherein the plasma generator includes a plasma electrode outer wall and a filling film defined by the plasma electrode outer wall and including first and second penetration holes formed in a horizontal direction and spaced apart from each other,
a first electrode is formed on a part of an inner wall of the first penetration hole,
a second electrode is formed on a part of an inner wall of the second penetration hole.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Yoo Beom Jin
• Kim Min Hyoung
• Nam Sang Ki
• Siqing Lu
• Jang Won Hyuk
• Han Kyu Hee

Classifications

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0414 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• H05H1/46

  using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title

• B08B3/08 Primary

  the liquid having chemical or dissolving effect · CPC title

• B08B3/10

  with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration · CPC title