Liquid treatment device, liquid treatment method, and plasma treatment liquid

US9540256B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9540256-B2
Application numberUS-201514662182-A
CountryUS
Kind codeB2
Filing dateMar 18, 2015
Priority dateMay 14, 2013
Publication dateJan 10, 2017
Grant dateJan 10, 2017

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure provides a liquid treatment device, a liquid treatment method, and a plasma treatment liquid each capable of efficiently generating plasma and treating a liquid in a short time period. A liquid treatment device according to the present disclosure includes a first electrode, a second electrode disposed in a liquid to be treated, an insulator disposed around the first electrode with a space between the first electrode and the insulator, the insulator has an opening portion in a position in contact with the liquid to be treated, a power supply that applies voltage between the first electrode and the second electrode, and a supply device supplying a liquid to the space before the power source applies the voltage.

First claim

Opening claim text (preview).

The invention claimed is: 1. A liquid treatment device comprising: a first electrode; a second electrode disposed in a liquid to be treated; an insulator disposed around the first electrode with a space between the first electrode and the insulator, wherein the insulator has an opening portion in a position in contact with the liquid to be treated; a power source applying voltage between the first electrode and the second electrode so as to generate plasma in the vicinity of the opening portion of the insulator; and a liquid supply device supplying a liquid to the space through a path which is different from the opening portion before the power source applies the voltage. 2. The liquid treatment device of claim 1 , wherein the liquid supply device supplies the liquid to the space to form a state in which the space is filled with the liquid, the power source applies voltage between the first electrode and the second electrode after the space is filled with the liquid to evaporate the liquid in the space so as to generate a gas, and to discharge in the gas when the gas is released from the opening portion of the insulator into the liquid to be treated so as to generate the plasma. 3. The liquid treatment device of claim 1 , further comprising a holding block holding the first electrode and connected to the insulator, wherein the holding block has a structure sealing the first electrode. 4. The liquid treatment device of claim 3 , wherein the holding block includes a flow channel connecting the space formed between the first electrode and the insulator to the liquid supply device. 5. The liquid treatment device of claim 1 , wherein the first electrode has therein a flow channel connecting the space formed between the first electrode and the insulator to the liquid supply device. 6. The liquid treatment device of claim 1 , wherein the opening portion of the insulator is disposed in an opening direction that is a vertically upper direction relative to a side surface of the insulator. 7. The liquid treatment device of claim 1 , wherein a plurality of the opening portions of the insulator are arranged at the insulator. 8. The liquid treatment device of claim 1 , further comprising a first tank storing the liquid to be treated. 9. The liquid treatment device of claim 8 , further comprising a second tank connected to the first tank by a circulating pump and pipe. 10. The liquid treatment device of claim 9 , wherein the second tank is connected to ground. 11. A system with a cleaning or purifying function comprising: the liquid treatment device of claim 1 . 12. A liquid treatment method comprising: supplying a liquid to a space formed between a first electrode and an insulator having an opening portion through a path which is different from an opening portion, wherein the insulator is disposed around the first electrode through the space, and the opening portion is disposed in contact with a liquid to be treated; and applying voltage between the first electrode and a second electrode to generate plasma in the opening portion of the insulator, wherein the second electrode is disposed in the liquid to be treated. 13. The liquid treatment method of claim 12 , wherein after the space is filled with the liquid by supplying the liquid, the voltage is applied between the first electrode and the second electrode to evaporate the liquid in the space so as to generate a gas, and to discharge in the gas when the gas is released from the opening portion of the insulator into the liquid to be treated so as to generate the plasma in the gas. 14. The liquid treatment device of claim 1 , wherein the first electrode does not directly contact the insulator. 15. The liquid treatment method of claim 12 , wherein the first electrode does not directly contact the insulator.

Assignees

Inventors

Classifications

  • using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes · CPC title

  • Disinfection · CPC title

  • employing two or more electrodes · CPC title

  • Electricity · mapped topic

  • giving rise to electric discharges (for heating purposes H05B7/00; for the production of ozone C01B13/11, H01T19/00) · CPC title

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Frequently asked questions

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What does patent US9540256B2 cover?
The present disclosure provides a liquid treatment device, a liquid treatment method, and a plasma treatment liquid each capable of efficiently generating plasma and treating a liquid in a short time period. A liquid treatment device according to the present disclosure includes a first electrode, a second electrode disposed in a liquid to be treated, an insulator disposed around the first elect…
Who is the assignee on this patent?
Panasonic Ip Man Co Ltd
What technology area does this patent fall under?
Primary CPC classification C02F1/4608. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 10 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).