Method and system for prevention of metal contamination by using a self-assembled monolayer coating

US11460775B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11460775-B2
Application numberUS-201916560776-A
CountryUS
Kind codeB2
Filing dateSep 4, 2019
Priority dateSep 4, 2018
Publication dateOct 4, 2022
Grant dateOct 4, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Methods for processing a substrate are provided. The method includes receiving a substrate. The substrate has a front side surface, a backside surface, and a side edge surface. The method also includes forming a first material in a first annular region of the front side surface, resulting in the first annular being coated with the first material. The first annular region is immediately adjacent to a perimeter of the substrate. The first annular region has a first outer perimeter proximate to the perimeter of the substrate and a first inner perimeter away from the perimeter of the substrate. The method also includes forming a second material in an interior region of the front side surface, the second material coating the front side surface without adhering to the annular region.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of processing a substrate, the method comprising: receiving a substrate, the substrate having a front side surface, a backside surface, and a side edge surface; positioning a dispense nozzle proximate an edge region of the front side surface, the edge region of the front side surface being an annular region extending from a perimeter of the front side surface a predetermined distance towards a center point of the front side surface; depositing a first material from the dispense nozzle onto the edge region of the front side surface and depositing a second material from the dispense nozzle onto the edge region of the front side surface, resulting in the edge region of the substrate being coated with the first and second materials; and depositing a third material onto a central region of the front side surface, the third material coating the front side surface without adhering to the edge region of the front side surface, wherein the first material and the second material are different. 2. The method of claim 1 , wherein the first material is a first self-assembled monolayer. 3. The method of claim 2 , wherein a cleavable group of the self-assembled monolayer is Nitrobenzyl based, Carbonyl based, or Benzyl based. 4. The method of claim 1 , wherein the first material is a fluorinated material. 5. The method of claim 1 , wherein the first material is selected to be hydrophobic. 6. The method of claim 1 , wherein the first material is dispensed as a liquid. 7. The method of claim 1 , wherein the first material is dispensed as a vapor. 8. The method of claim 1 , further comprising cleaning the front side surface subsequent to depositing the first material and the second material and prior to depositing the third material. 9. The method of claim 1 , wherein the third material is a photoresist. 10. The method of claim 1 , wherein the third material is a metal-containing film. 11. The method of claim 1 , wherein the dispense nozzle is also configured to dispense solvent on an edge portion of the substrate as part of an edge bead removal process. 12. The method of claim 1 , further comprising cleaning the substrate after depositing the third material. 13. The method of claim 1 , wherein the first material, the second material, and the third material are deposited while spinning the substrate. 14. A method of processing a substrate, the method comprising: receiving a substrate, the substrate having a front side surface, a backside surface, and a side edge surface; forming a first material and a second material in an annular region of the front side surface, resulting in the annular region being coated with the first material and the second material, the annular region being immediately adjacent to a perimeter of the substrate, the annular region having an outer perimeter proximate to the perimeter of the substrate and an inner perimeter away from the perimeter of the substrate; and forming a third material in an interior region of the front side surface, the third material coating the front side surface without adhering to the annular region, wherein the first material and the second material are different. 15. The method of claim 14 , wherein the first material is a self-assembled monolayer. 16. The method of claim 15 , wherein the first material is a fluorinated self-assembled monolayer. 17. The method of claim 14 , wherein the first material, the second material, and the third material are deposited via a dispense nozzle. 18. The method of claim 17 , wherein the first material is dispensed as a liquid. 19. The method of claim 17 , wherein the first material is dispensed as a vapor. 20. A method of processing a substrate, the method comprising: receiving a substrate, the substrate having a front side surface, a backside surface, and a side edge surface; depositing a first material that is fluorinated self-assembled monolayer coating on a peripheral edge of the front side surface of the substrate without dispensing the first material on interior surfaces of the front side surface, the peripheral edge being immediately adjacent to a perimeter of the substrate; depositing a second material on the peripheral edge of the front side surface of the substrate without dispensing the second material on the interior surfaces of the front side surface; and depositing a third material on the interior surfaces of the front side surface while spinning the substrate, the spinning causing the third material to cover the front side surface and the first and second materials preventing the third material from adhering to the peripheral edge of the front side surface, wherein the first material and the second material are different.

Assignees

Inventors

Classifications

  • G03F7/165Primary

    Monolayers, e.g. Langmuir-Blodgett · CPC title

  • Coating on a rotating support, e.g. using a whirler or a spinner · CPC title

  • involving the use of fluoropolymers · CPC title

  • B05D5/08Primary

    to obtain an anti-friction or anti-adhesive surface (rendering particulate materials free-flowing in general, e.g. making them hydrophobic B01J2/30) · CPC title

  • Preventing deposition of fouling or of dust · CPC title

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What does patent US11460775B2 cover?
Methods for processing a substrate are provided. The method includes receiving a substrate. The substrate has a front side surface, a backside surface, and a side edge surface. The method also includes forming a first material in a first annular region of the front side surface, resulting in the first annular being coated with the first material. The first annular region is immediately adjacent…
Who is the assignee on this patent?
Tokyo Electron Ltd
What technology area does this patent fall under?
Primary CPC classification G03F7/165. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 04 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).