Substrate support pedestal

Patent metadata

Field	Value
Publication number	US-11456161-B2
Application number	US-201916422692-A
Country	US
Kind code	B2
Filing date	May 24, 2019
Priority date	Jun 4, 2018
Publication date	Sep 27, 2022
Grant date	Sep 27, 2022

Abstract

The systems and methods discussed herein are associated with substrate support pedestals used in processing chambers to manufacture semiconductors, electronics, optics, and other devices. The substrate support pedestals include an electrostatic chuck body bonded to a cooling base via a bond layer. A gas flow passage is formed between a top surface of the electrostatic chuck body and a bottom surface of the cooling base, and a porous plug is positioned in the gas flow passage. The gas flow passage passes through a hole in the bond layer and the porous plug and has a swept volume physically shielded from an inside edge of the hole in the bond layer, protecting the bond layer from erosion.

First claim

What is claimed is:

1. A substrate support pedestal, comprising:
an electrostatic chuck body bonded to a cooling base via a bond layer;
a porous plug;
a gas flow passage formed between a top surface of the electrostatic chuck body and a bottom surface of the cooling base, the gas flow passage passing through a hole in the bond layer and the porous plug, the gas flow passage having a swept volume physically shielded from an inside edge of the hole in the bond layer; and
a ring extending from a top surface of the cooling base and into the electrostatic chuck body.

2. The substrate support pedestal of claim 1 , wherein the porous plug is at least partially disposed in a chuck cavity formed in a bottom surface of the electrostatic chuck body.

3. The substrate support pedestal of claim 1 , wherein the porous plug is coupled to the electrostatic chuck body via an adhesive layer or via a press fit.

4. The substrate support pedestal of claim 1 further comprising:
a sleeve disposed around the porous plug.

5. The substrate support pedestal of claim 4 , wherein a dead volume is defined between the sleeve and the inside edge of the hole.

6. The substrate support pedestal of claim 1 , wherein the ring extends across a gap formed between the electrostatic chuck body and the cooling base, the inside edge of the hole formed in the bond layer physically shielded from the swept volume of the gas flow passage by the ring.

7. The substrate support pedestal of claim 1 further comprising:
a sleeve positioned between the ring and the porous plug residing in the ring.

8. The substrate support pedestal of claim 7 , wherein the sleeve extends from the ring to the cooling base, the inside edge of the hole formed in the bond layer physically shielded from the swept volume of the gas flow passage by the ring and the sleeve.

9. The substrate support pedestal of claim 7 , wherein the sleeve extends from the ring to the electrostatic chuck body, the inside edge of the hole formed in the bond layer physically shielded from the swept volume of the gas flow passage by the ring and the sleeve.

10. The substrate support pedestal of claim 1 , wherein the ring comprises a plurality of separate rings.

11. The substrate support pedestal of claim 1 , wherein the gas flow passage extends through the ring.

12. The substrate support pedestal of claim 1 , wherein the inside edge of the hole formed in the bond layer physically shielded from the swept volume of the gas flow passage by the ring.

13. The substrate support pedestal of claim 1 further comprising:
a sleeve secured to the electrostatic chuck body, the sleeve capturing a projection extending from the porous plug.

14. A substrate support pedestal, comprising:
an electrostatic chuck body bonded to a cooling base via a bond layer, wherein a cavity is formed in a bottom surface of the electrostatic chuck body;
a porous plug;
a sleeve disposed around the porous plug;
a ring positioned on a top surface of the cooling base; and
a gas flow passage formed between a top surface of the electrostatic chuck body and a bottom surface of the cooling base, the gas flow passage passing through a hole in the bond layer and the porous plug, the gas flow passage having a swept volume physically shielded from an inside edge of the hole in the bond layer by at least one of the sleeve or the ring.

15. The substrate support pedestal of claim 14 , wherein the inside edge of the hole formed in the bond layer physically shielded from the swept volume of the gas flow passage by the ring.

16. The substrate support pedestal of claim 14 , wherein the ring comprises a plurality of separate rings.

17. The substrate support pedestal of claim 14 , wherein a dead volume is defined between the sleeve and the inside edge of the hole.

18. The substrate support pedestal of claim 14 , wherein the porous plug is coupled to the electrostatic chuck body via an adhesive layer.

19. The substrate support pedestal of claim 14 , wherein the porous plug is coupled to the electrostatic chuck body via a press fit.

Assignees

• Applied Materials Inc

Inventors

• Larosa Steven Joseph
• Prouty Stephen

Classifications

• H10P72/722

  Details of electrostatic chucks · CPC title

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/72 Primary

  using electrostatic chucks · CPC title

• H10P72/0434

  mainly by convection · CPC title

• H10P72/70

  for supporting or gripping · CPC title