Patterning scheme to improve EUV resist and hard mask selectivity

Patent metadata

Field	Value
Publication number	US-11437238-B2
Application number	US-201916504646-A
Country	US
Kind code	B2
Filing date	Jul 8, 2019
Priority date	Jul 9, 2018
Publication date	Sep 6, 2022
Grant date	Sep 6, 2022

Abstract

Methods and film stacks for extreme ultraviolet (EUV) lithography are described. The film stack comprises a substrate with a hard mask, bottom layer, middle layer and photoresist. Etching of the photoresist is highly selective to the middle layer and a modification of the middle layer allows for a highly selective etch relative to the bottom layer.

First claim

What is claimed is:

1. A method of etching a substrate, the method comprising:
etching a middle layer of a substrate through a patterned photoresist to form a patterned middle layer and expose portions of a bottom layer, the substrate comprising a film stack thereon, the film stack comprising the bottom layer on a hard mask, the middle layer on the bottom layer, and the patterned photoresist on the middle layer, wherein the middle layer comprises amorphous silicon and is etched selectively over the patterned photoresist;
exposing the substrate to a reactant to convert the patterned middle layer to a modified patterned middle layer comprising silicon oxide; and
etching the bottom layer through the modified patterned middle layer to form a patterned bottom layer and expose portions of the substrate, wherein the bottom layer is selectively etched over the modified patterned middle layer.

2. The method of claim 1 , further comprising patterning a photoresist to form the patterned photoresist.

3. The method of claim 2 , wherein patterning the photoresist comprises lithographically patterning the photoresist using EUV radiation to form openings in the photoresist with photoresist residue in the openings, and cleaning the photoresist of the residue.

4. The method of claim 3 , wherein cleaning the residue from the photoresist comprises exposing the substrate to a plasma comprising one or more of HBr, oxygen gas (O 2 ), nitrogen gas (N 2 ) or hydrogen gas (H 2 ).

5. The method of claim 2 , wherein the photoresist comprises an organic resist having a thickness less than or equal to about 280 Å.

6. The method of claim 2 , wherein the photoresist comprises a metal oxide photoresist with a thickness less than or equal to about 130 Å.

7. The method of claim 1 , wherein the bottom layer comprises a diamond-like carbon material, and the bottom layer has a thickness less than or equal to about 300 Å.

8. The method of claim 1 , wherein the middle layer comprises amorphous silicon doped with boron.

9. The method of claim 8 , wherein the middle layer comprises one or more of a bottom anti-reflective coating (BARC), dielectric anti-reflective coating (DARC), and the middle layer has a thickness less than or equal to about 200 Å.

10. The method of claim 1 , wherein selectively etching the middle layer comprises exposing the substrate to a chlorine-based etchant.

11. The method of claim 1 , wherein the reactant comprises an O2 inductively coupled plasma.

12. The method of claim 11 , wherein the reactant removes the patterned photoresist at the same time as forming the modified patterned middle layer.

13. The method of claim 11 , wherein modifying the patterned middle layer increases etch selectively relative to the bottom layer.

14. The method of claim 1 , wherein the substrate comprises substrate structure, the substrate structure comprising a low-k dielectric having a hard mask formed thereon, the hard mask having an optional silicon dioxide layer formed thereon, and the film stack is formed on the hard mask or the optional silicon dioxide layer.

15. The method of claim 14 , wherein the optional silicon dioxide layer has a thickness less than or equal to about 200 Å.

16. The method of claim 14 , wherein the hard mask comprises one or more of titanium nitride or tungsten carbide, and the hard mask has a thickness less than or equal to about 200 Å.

17. The method of claim 16 , further comprising:
removing the modified patterned middle layer;
etching the optional silicon dioxide layer through the patterned bottom layer to form a patterned optional silicon dioxide layer;
removing the patterned bottom layer;
etching the hard mask through the patterned optional silicon dioxide layer to form a patterned hard mask;
etching the low-k dielectric through the patterned hard mask to form a patterned substrate; and
removing the patterned hard mask.

18. An EUV patterning method comprising:
patterning a photoresist of a substrate using EUV radiation and a developer to form a patterned photoresist to expose portions of a middle layer and leave a residue of the photoresist, the substrate comprising a substrate structure and a hard mask structure, the substrate structure comprising a low-k dielectric with a metal hard mask formed thereon, the hard mask structure formed on the metal hard mask, wherein the hard mask structure comprises a bottom layer formed on the metal hard mask, the middle layer comprising amorphous silicon and formed on the bottom layer, and the photoresist formed on the middle layer, the bottom layer comprising a diamond-like carbon material;
removing the photoresist residue by exposing the substrate to a plasma comprising one or more of O 2 , N 2 , H 2 or HBr;
selectively etching the middle layer relative to the patterned photoresist to expose portions of the bottom layer and form a patterned middle layer;
removing the patterned photoresist;
exposing the patterned middle layer to an oxidizing agent to convert the patterned middle layer to a modified patterned middle layer comprising silicon oxide, the oxidizing agent comprising an inductively coupled O 2 plasma;
selectively etching the bottom layer relative to the modified patterned middle layer to expose portions of the metal hard mask and form a patterned bottom layer;
removing the modified patterned middle layer;
etching the metal hard mask relative to the patterned bottom layer to expose portions of the low-k dielectric and form a patterned hard mask;
removing the patterned bottom layer;
etching the low-k dielectric through the patterned hard mask; and
removing the patterned hard mask.

Assignees

• Applied Materials Inc

Inventors

• Fung Nancy
• Lang Chi-I
• Hwang Ho-Yung David

Classifications

• H10P76/405

  characterised by their composition, e.g. multilayer masks · CPC title

• H10P70/23

  during, before or after processing of insulating materials · CPC title

• H10P50/73 Primary

  using masks for insulating materials · CPC title

• H10P76/4085 Primary

  characterised by the processes involved to create the masks · CPC title

• G03F7/70033

  by plasma extreme ultraviolet [EUV] sources · CPC title