Thin semiconductor package and related methods
US-10319639-B2 · Jun 11, 2019 · US
US11404276B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11404276-B2 |
| Application number | US-202016879251-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 20, 2020 |
| Priority date | Aug 17, 2017 |
| Publication date | Aug 2, 2022 |
| Grant date | Aug 2, 2022 |
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Official abstract text for this publication.
Implementations of a semiconductor device may include a semiconductor die including a first largest planar surface, a second largest planar surface and a thickness between the first largest planar surface and the second largest planar surface; and one of a permanent die support structure, a temporary die support structure, or any combination thereof coupled to one of the first largest planar surface, the second largest planar surface, the thickness, or any combination thereof where the semiconductor die may be coupled with one of a substrate, a leadframe, an interposer, a package, a bonding surface, or a mounting surface. The thickness may be between 0.1 microns and 125 microns.
Opening claim text (preview).
What is claimed is: 1. A semiconductor device comprising: a first largest planar surface, a second largest planar surface and a thickness between the first largest planar surface and the second largest planar surface; and one of a permanent die support structure, a temporary die support structure, or any combination thereof coupled to one of the first largest planar surface, the second largest planar surface, the thickness, or any combination thereof; wherein the first largest planar surface, the second largest planar surface, and the thickness are formed by at least two singulated semiconductor die coupled through a common die street; and wherein the at least two singulated semiconductor die are coupled to one of a substrate, a leadframe, an interposer, a package, a bonding surface, or a mounting surface and wherein a warpage of the at least two singulated semiconductor die is less than 200 microns. 2. The device of claim 1 , wherein the thickness is between 0.1 microns and 125 microns. 3. The device of claim 1 , wherein a perimeter of the at least two singulated semiconductor die is rectangular and a size of the at least two singulated semiconductor die is at least 6 mm by 6 mm to 211 mm by 211 mm. 4. The device of claim 1 , wherein a perimeter of the at least two singulated semiconductor die comprises a closed shape and wherein the one of the permanent die support structure, the temporary die support structure, or any combination thereof comprises a perimeter comprising a closed shape. 5. The device of claim 1 , further comprising one of a second permanent die support structure or a temporary die support structure coupled to one of the first largest planar surface, the second largest planar surface, the thickness, or any combination thereof. 6. The device of claim 1 , wherein the one of the permanent die support structure, the temporary die support structure, or any combination thereof comprises two or more layers.
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