Charged particle beam device
US-2019304745-A1 · Oct 3, 2019 · US
US11399138B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11399138-B2 |
| Application number | US-202117210702-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 24, 2021 |
| Priority date | Aug 16, 2019 |
| Publication date | Jul 26, 2022 |
| Grant date | Jul 26, 2022 |
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Control system configured for sample tracking in an electron microscope environment registers a movement associated with a region of interest located within an active area of a sample under observation with an electron microscope. The registered movement includes at least one directional constituent. The region of interest is positioned within a field of view of the electron microscope. The control system directs an adjustment of the electron microscope control component to one or more of dynamically center and dynamically focus the view through the electron microscope of the region of interest. The adjustment comprises one or more of a magnitude element and a direction element.
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What is claimed is: 1. A control system configured for sample tracking in an electron microscope environment, the control system comprising: a memory; a processor; and a microscope control component, the control system configured to: register a movement associated with a region of interest located within an active area of a sample under observation with an electron microscope, wherein the registered movement includes at least one directional constituent, wherein the region of interest is positioned within a field of view of the electron microscope; direct an adjustment of the microscope control component to one or more of: dynamically center a view through the electron microscope of the region of interest, and dynamically focus the view through the electron microscope of the region of interest; wherein the adjustment comprises one or more of: a magnitude element, and a direction element. 2. The control system of claim 1 , wherein the control system is further configured to apply an in-situ stimulus to the region of interest, wherein the adjustment comprises a drift correction along an x-axis and a y-axis. 3. The control system of claim 2 , wherein the control system is further configured to apply an in-situ stimulus to the region of interest, wherein the adjustment comprises a drift correction along a z-axis. 4. The control system of claim 1 , wherein the control system is further configured to alert a user when the registered movement is below a predetermined value or predetermined rate. 5. The control system of claim 1 , wherein the microscope control component is in electronic communication with one or more of: a mechanical stage, a goniometer, a piezo component of the stage, an illumination of an electron beam, a projection of the electron beam, an electromagnetic deflection of the electron beam, and a movement of the electron beam. 6. The control system of claim 1 , wherein the control system is further configured to register the movement at a micron scale, a nanometer scale, or an atomic scale. 7. The control system of claim 1 , wherein the control system is further configured to simultaneously register movement associated with a plurality of regions of interest located in the sample under observation. 8. The control system of claim 1 , wherein the control system is configured to register the movement by referencing a template image of the region of interest against a remainder of the active area of the sample. 9. The control system of claim 8 , wherein the control system is further configured to manipulate a template image of the region of interest over a predetermined period of time to generate a current morphology profile or a current intensity profile. 10. The control system of claim 1 , wherein the control system is further configured to capture the registered movement as a drift vector associated with one or more of: a structure of interest, a region of interest, and a background region, of the sample under observation.
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