Vapor deposition mask base material, vapor deposition mask base material manufacturing method, and vapor deposition mask manufacturing method

Patent metadata

Field	Value
Publication number	US-11390953-B2
Application number	US-202016985229-A
Country	US
Kind code	B2
Filing date	Aug 5, 2020
Priority date	Apr 14, 2016
Publication date	Jul 19, 2022
Grant date	Jul 19, 2022

Abstract

The ratio of the difference between a surface distance L at each of the different positions in a width direction DW of a metal sheet and a minimum surface distance Lm to the minimum surface distance Lm is an elongation difference ratio. The elongation difference ratio in a center section in the width direction DW of the metal sheet is less than or equal to 3×10−5. The elongation difference ratios in two edge sections in the width direction DW of the metal sheet are less than or equal to 15×10−5. The elongation difference ratio in at least one of the two edge sections in the width direction DW of the metal sheet is less than the elongation difference ratio in the center section in the width direction of the metal sheet.

First claim

The invention claimed is:

1. A vapor deposition mask substrate, comprising a metal sheet that has a shape of a strip and is configured to be etched to include a plurality of holes so that the metal sheet is used to manufacture a vapor deposition mask, wherein
the metal sheet is made of nickel or nickel-iron alloy,
the metal sheet has a thickness of between 10 μm and 50 μm inclusive,
the metal sheet has shapes that are taken along a longitudinal direction of the metal sheet at different positions in a width direction of the metal sheet and differ from one another, each of the shapes being an undulated shape including protrusions and depressions repeating in the longitudinal direction of the metal sheet,
a length in the longitudinal direction of a surface of the metal sheet is a surface distance,
a minimum value of surface distances at different positions in the width direction of the metal sheet is a minimum surface distance,
a ratio of a difference between a surface distance at each of the different positions in the width direction of the metal sheet and the minimum surface distance to the minimum surface distance is an elongation difference ratio,
the metal sheet has a center section and two edge sections, the center section being located between the two edge sections in the width direction of the metal sheet,
the length of each edge section in the width direction is 30% of the length of the metal sheet in the width direction,
the length of the center section in the width direction is 40% of the length of the metal sheet in the width direction,
the elongation difference ratio in the center section of the metal sheet is less than or equal to 3×10 −5 ,
the elongation difference ratios in two edge sections of the metal sheet are less than or equal to 15×10 −5 , and
the elongation difference ratio in at least one of the two edge sections of the metal sheet is less than the elongation difference ratio in the center section of the metal sheet.

2. The vapor deposition mask substrate according to claim 1 , wherein
the elongation difference ratio in only one of the two edge sections is less than the elongation difference ratio in the center section, and
a difference between maximum values of the elongation difference ratios in the two edge sections is between 3×10 −5 and 11×10 −5 inclusive.

3. The vapor deposition mask substrate according to claim 1 , wherein
the elongation difference ratios in the two edge sections are less than the elongation difference ratio in the center section, and
the elongation difference ratios in the two edge sections and the elongation difference ratio in the center section are less than or equal to 1×10 −5 .

4. A method for manufacturing a vapor deposition mask substrate according to claim 1 , wherein the vapor deposition mask substrate comprises a metal sheet that has a shape of a strip and is configured to be etched to include a plurality of holes so that the metal sheet is used to manufacture a vapor deposition mask, the method comprising:
obtaining the metal sheet by rolling a base material.

5. A method for manufacturing a vapor deposition mask, the method comprising:
forming a resist layer on a vapor deposition mask substrate according to claim 1 ; and
forming a plurality of holes in the vapor deposition mask substrate by etching using the resist layer as a mask to form a mask portion.

6. The method for manufacturing a vapor deposition mask according to claim 5 , wherein
the mask portion is one of a plurality of mask portions,
the mask portions each include a separate side surface including openings of some of the holes, and
the method further comprising joining a single frame portion to the side surfaces such that the single frame portion surrounds the holes in the mask portions.

Assignees

• Toppan Printing Co Ltd

Inventors

• Shinno Mikio
• Terada Reiji
• Nishitsuji Kiyoaki
• Kurata Masashi
• Takeda kenta
• Mikami Naoko
• Akiyama Sumika

Classifications

• C23C14/24

  Vacuum evaporation · CPC title

• B21B2261/06

  Width · CPC title

• C23F1/16

  Acidic compositions (C23F1/42 takes precedence) · CPC title

• C23F1/02 Primary

  Local etching · CPC title

• C23C16/042

  using masks · CPC title