Vapor deposition mask substrate, vapor deposition mask substrate manufacturing method, vapor deposition mask manufacturing method, and display device manufacturing method

Patent metadata

Field	Value
Publication number	US-10697069-B2
Application number	US-201815928357-A
Country	US
Kind code	B2
Filing date	Mar 22, 2018
Priority date	Oct 13, 2017
Publication date	Jun 30, 2020
Grant date	Jun 30, 2020

Abstract

A metal sheet has a longitudinal direction and a width direction. The metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another. Each of the shapes is an undulated shape including protrusions and depressions repeating in the width direction of the metal sheet. A length in the width direction of a surface of the metal sheet is a surface distance. A minimum value of surface distances at different positions in the longitudinal direction of the metal sheet is a minimum surface distance. A ratio of a difference between a surface distance and the minimum surface distance to the minimum surface distance is an elongation difference ratio in the width direction. A maximum value of elongation difference ratios is less than or equal to 2×10 −5 .

First claim

The invention claimed is:

1. A vapor deposition mask substrate, comprising:
a metal sheet that has a shape of a strip and is configured to be etched to include a plurality of holes and used to manufacture a vapor deposition mask, wherein
the metal sheet has a longitudinal direction and a width direction,
the metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another,
each of the shapes comprises an undulated shape including protrusions and depressions repeating in the width direction of the metal sheet,
a length in the width direction of a surface of the metal sheet is a surface distance,
a minimum value of surface distances at different positions in the longitudinal direction of the metal sheet is a minimum surface distance,
a ratio of a difference between a surface distance and the minimum surface distance to the minimum surface distance is an elongation difference ratio in the width direction, and
a maximum value of elongation difference ratios is less than or equal to 2×10 −5 .

2. The vapor deposition mask substrate according to claim 1 , wherein
the vapor deposition mask substrate has a unit length in the longitudinal direction of 500 mm, and
an average value of elongation difference ratios per the unit length is less than or equal to 0.5×10 −5 .

3. The vapor deposition mask substrate according to claim 1 , wherein
the vapor deposition mask substrate has a unit length in the longitudinal direction of 500 mm, and
a number of peaks that have elongation difference ratios of greater than or equal to 0.5×10 −5 per the unit length is less than or equal to three.

4. The vapor deposition mask substrate according to claim 1 , wherein
the vapor deposition mask substrate has a unit length in the longitudinal direction of 500 mm, and
a minimum value of distances between peaks that have elongation difference ratios of greater than or equal to 0.5×10 −5 per the unit length is greater than or equal to 100 mm.

5. A method for manufacturing a vapor deposition mask substrate according to claim 1 , which comprises the metal sheet that has the shape of the strip and is configured to be etched to include the plurality of holes and used to manufacture the vapor deposition mask, the method comprising:
obtaining the metal sheet by rolling a base material such that
the metal sheet has the longitudinal direction and the width direction,
the metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another,
each of the shapes comprises the undulated shape including protrusions and depressions repeating in the width direction of the metal sheet,
the length in the width direction of the surface of the metal sheet is the surface distance,
the minimum value of surface distances at different positions in the longitudinal direction of the metal sheet is the minimum surface distance,
the ratio of a difference between the surface distance and the minimum surface distance to the minimum surface distance is the elongation difference ratio in the width direction, and
the maximum value of elongation difference ratios is less than or equal to 2×10 −5 .

6. A method for manufacturing a vapor deposition mask, the method comprising:
forming a resist layer on the metal sheet of claim 1 having the shape of the strip; and
forming a plurality of holes in the metal sheet by etching using the resist layer as a mask to form a mask portion, wherein
the metal sheet has the longitudinal direction and the width direction,
the metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another,
each of the shapes comprises the undulated shape including protrusions and depressions repeating in the width direction of the metal sheet,
the length in the width direction of the surface of the metal sheet is the surface distance,
the minimum value of surface distances at different positions in the longitudinal direction of the metal sheet is the minimum surface distance,
the ratio of a difference between the surface distance and the minimum surface distance to the minimum surface distance is the elongation difference ratio in the width direction, and
the maximum value of elongation difference ratios is less than or equal to 2×10 −5 .

7. The method for manufacturing a vapor deposition mask according to claim 6 , wherein
the mask portion is one of a plurality of mask portions,
forming the mask portion includes forming the mask portions on the single metal sheet,
the mask portions each include a separate side surface including some of the holes, and
the method further comprises joining the side surfaces of the mask portions to a single frame portion such that the single frame portion surrounds the holes of each mask portion.

8. A method for manufacturing a display device, the method comprising:
preparing a vapor deposition mask manufactured by the method for manufacturing a vapor deposition mask according to claim 6 ; and
forming a pattern by vapor deposition using the vapor deposition mask.

Assignees

• Toppan Printing Co Ltd

Inventors

• Shinno Mikio

Classifications

• C23C14/24

  Vacuum evaporation · CPC title

• C23C14/042 Primary

  using masks · CPC title

• C21D8/02

  during manufacturing of plates or strips (C21D8/12 takes precedence) · CPC title

• C25D3/562

  containing more than 50% by weight of iron or nickel or cobalt · CPC title

• C21D9/52

  for wires; for strips {; for rods of unlimited length} · CPC title