Charged particle beam device

Patent metadata

Field	Value
Publication number	US-11355308-B2
Application number	US-202016927925-A
Country	US
Kind code	B2
Filing date	Jul 13, 2020
Priority date	Aug 30, 2019
Publication date	Jun 7, 2022
Grant date	Jun 7, 2022

Abstract

A charged particle beam device includes an input and output device that receives, as inputs, a charged particle beam condition, a light condition, and electronic device circuit information, a charged particle beam control system that controls a charged particle beam applied to a sample based on the electron beam condition, a light control system that controls light applied to the sample based on the light condition, a detector that detects second electrons emitted from the sample by the application of the charged particle beam and the light and outputs a detection signal, and a calculator that generates a calculation netlist based on the electronic device circuit information, generates a light irradiation netlist based on the calculation netlist and the light condition, estimates a first irradiation result when the charged particle beam and the light are applied to the sample based on the light irradiation netlist and the charged particle beam condition, and compares the first irradiation result with a second irradiation result when the charged particle beam and the light are actually applied to the sample based on the electron beam condition.

First claim

What is claimed is:

1. A charged particle beam device comprising:
an input and output display device configured to receive, as input, a charged particle beam condition related to a charged particle beam applied in order to estimate a circuit state of a sample, a light condition related to light applied in order to estimate the circuit state of the sample, and electronic device circuit information for defining a circuit of the sample;
a charged particle beam control system comprising a lens barrel mounted on a sample chamber and operatively coupled with a controller configured to control a charged particle beam applied to the sample based on the charged particle beam condition;
a light control system comprising an adjustable light source and said controller configured to control the light applied to the sample via the adjustable light source based on the light condition;
a detector that detects secondary electrons emitted from the sample by the application of the charged particle beam and the light, and outputs a detection signal based on the secondary electrons; and
a computer configured to generate a calculation netlist based on the electronic device circuit information, generate a light irradiation netlist based on the calculation netlist and the light condition, estimate a first irradiation result when the charged particle beam and the light are applied to the sample based on the light irradiation netlist and the charged particle beam condition, and compare the first irradiation result with a second irradiation result when the charged particle beam and the light are applied to the sample based on the charged particle beam condition.

2. The charged particle beam device according to claim 1 , wherein the computer is further configured to update the light irradiation netlist when the first irradiation result and the second irradiation result are different, and identify the light irradiation netlist as a netlist that describes the circuit state of the sample when the first irradiation result and the second irradiation result match.

3. The charged particle beam device according to claim 2 , wherein the computer is further configured to update the light irradiation netlist by changing a parameter included in the light irradiation netlist.

4. The charged particle beam device according to claim 1 , wherein the second irradiation result includes any one of the detection signal, an inspection image based on the detection signal, brightness of the inspection image, and brightness of each pixel of the inspection image.

5. The charged particle beam device according to claim 1 , wherein the computer is further configured to estimate a plurality of the first irradiation results, and select the first irradiation result matching the actually measured second irradiation result from the plurality of first irradiation results.

6. The charged particle beam device according to claim 1 , wherein the electronic device circuit information includes a netlist indicating a circuit configuration of the sample, coordinates indicating positions of plug electrodes on a surface of the sample, and a correspondence table in which the coordinates and the netlist are associated.

7. The charged particle beam device according to claim 6 , wherein the netlist includes a model indicating a defect of the circuit configuration.

8. The charged particle beam device according to claim 1 , wherein
the charged particle beam condition includes a pulsing condition of the charged particle beam, and
a charged particle beam pulse is applied to the sample based on the pulsing condition of the charged particle beam.

9. The charged particle beam device according to claim 1 , wherein
the light condition includes a pulsing condition of the light, and
a light pulse is applied to the sample based on the pulsing condition of the light.

10. The charged particle beam device according to claim 1 , wherein
the light condition includes a wavelength condition for defining a wavelength of the light, and
light rays having different wavelengths are applied to the sample.

11. The charged particle beam device according to claim 1 , wherein the light is applied to an electrode in an area outside an irradiation area of the charged particle beam.

12. The charged particle beam device according to claim 1 , wherein, when the first irradiation result and the second irradiation result are different, the computer is further configured to correct the charged particle beam condition and/or the light condition.

13. The charged particle beam device according to claim 1 , wherein the computer is further configured to generate the light condition based on the calculation netlist.

Assignees

• Hitachi High Tech Corp

Inventors

• Shirasaki Yasuhiro
• Tsuno Natsuki
• SHOUJI Minami
• Nakamura Yohei
• Fukuda Muneyuki

Classifications

• G01R31/305

  using electron beams {(investigating or analysing materials by measuring photoelectric effect G01N23/227)} · CPC title

• H01J2237/2817

  Pattern inspection · CPC title

• H01J37/28

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J37/226 Primary

  Optical arrangements for illuminating the object; optical arrangements for collecting light from the object · CPC title

• H01J37/244

  Detectors; Associated components or circuits therefor · CPC title