Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process

Patent metadata

Field	Value
Publication number	US-11307497-B2
Application number	US-201916293150-A
Country	US
Kind code	B2
Filing date	Mar 5, 2019
Priority date	Mar 28, 2018
Publication date	Apr 19, 2022
Grant date	Apr 19, 2022

Abstract

A compound including two or more partial structures shown by the following general formula (1-1) in the molecule,wherein each Ar independently represents an aromatic ring optionally having a substituent or an aromatic ring that contains at least one nitrogen atom optionally having a substituent, and two Ars are optionally bonded with each other to form a ring structure; the broken line represents a bond with an organic group; B represents an anionic leaving group that is capable of forming a reactive cation due to effect of either or both of heat and acid. This provides a compound that is capable of curing under the film forming conditions in air or an inert gas without forming byproducts, and forming an organic under layer film that has good dry etching durability during substrate processing not only excellent characteristics of gap filling and planarizing a pattern formed on a substrate.

First claim

The invention claimed is:

1. A composition for forming an organic film, comprising:
(A) a compound shown by the following general formula (1-2), and
(B) an organic solvent,

wherein AR1 and AR2 each represent a benzene ring, a naphthalene ring, or a pyridine ring optionally having an alkoxy group, an alkenyloxy group, or an aryloxy group having 1 to 30 carbon atoms; “m” is 1; AR1 and AR2 form a bridged structure in which the aromatic rings of AR1 and AR2 are bonded with each other through X; X represents a single bond or any of groups shown by the following formulae (3);

Y represents an n-valent organic group having 1 to 30 carbon atoms in which n=2 to 4 or an organic group-containing polymer having n-pieces of repeating units in which 2≤n≤1000; and R represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms.

2. The composition for forming an organic film according to claim 1 , further comprising one or more components selected from the group consisting of (C) an acid generator, (D) a surfactant, (E) a compound having a partial structure of an aromatic ring other than the compound of the component (A), and (F) a plasticizer.

3. The composition for forming an organic film according to claim 2 , wherein the component (E) has a weight average molecular weight of 500 to 100,000.

4. A substrate for manufacturing a semiconductor apparatus, comprising a basis substrate and an organic film formed on the basis substrate, the organic film being a cured material of the composition for forming an organic film according to claim 1 .

5. A method for forming an organic film applied in a semiconductor apparatus manufacturing process, the method comprising:
applying the composition for forming an organic film according to claim 1 on a body to be processed by spin coating; and
heating the body to be processed, on which the composition for forming an organic film has been applied, at a temperature of 50° C. or more and 600° C. or less for 5 to 7200 seconds in an inert gas atmosphere to form a cured film.

6. A method for forming an organic film applied in a semiconductor apparatus manufacturing process, the method comprising:
applying the composition for forming an organic film according to claim 1 on a body to be processed by spin coating;
heating the body to be processed, on which the composition for forming an organic film has been applied, at a temperature of 50° C. or more and 300° C. or less for 5 to 600 seconds in air to form a coating film, and
heating the body to be processed, on which the coating film has been formed, subsequently at a temperature of 200° C. or more and 600° C. or less for 10 to 7200 seconds in an inert gas atmosphere to form a cured film.

7. The method for forming an organic film according to claim 5 , wherein the inert gas has an oxygen content of 1% or less.

8. The method for forming an organic film according to claim 5 , wherein the body to be processed has steps or a structure with a height of 30 nm or more.

9. A patterning process comprising:
forming an organic film on a body to be processed from the composition for forming an organic film according to claim 1 ;
forming a silicon-containing resist middle layer film on the organic film from a resist middle layer film material containing silicon;
forming a resist upper layer film on the silicon-containing resist middle layer film from a resist upper layer film material composed of a photoresist composition;
forming a circuit pattern in the resist upper layer film;
transferring the pattern to the silicon-containing resist middle layer film by etching using the resist upper layer film having the formed circuit pattern as a mask;
transferring the pattern to the organic film by etching using the silicon-containing resist middle layer film having the transferred pattern as a mask; and
transferring the pattern to the body to be processed by etching using the organic film having the transferred pattern as a mask.

10. A patterning process comprising:
forming an organic film on a body to be processed from the composition for forming an organic film according to claim 1 ;
forming a silicon-containing resist middle layer film on the organic film from a resist middle layer film material containing silicon;
forming an organic antireflective film on the silicon-containing resist middle layer film;
forming a resist upper layer film on the organic antireflective film from a resist upper layer film material composed of a photoresist composition to form a four-layered film structure;
forming a circuit pattern in the resist upper layer film;
transferring the pattern to the organic antireflective film and the silicon-containing resist middle layer film by etching using the resist upper layer film having the formed circuit pattern as a mask;
transferring the pattern to the organic film by etching using the silicon-containing resist middle layer film having the transferred pattern as a mask; and
transferring the pattern to the body to be processed by etching using the organic film having the transferred pattern as a mask.

11. A patterning process comprising:
forming an organic film on a body to be processed from the composition for forming an organic film according to claim 1 ;
forming an inorganic hard mask selected from a silicon oxide film, a silicon nitride film, a silicon oxynitride film, a titanium oxide film, and a titanium nitride film on the organic film;
forming a resist upper layer film on the inorganic hard mask from a resist upper layer film material composed of a photoresist composition;
forming a circuit pattern in the resist upper layer film;
transferring the pattern to the inorganic hard mask by etching using the resist upper layer film having the formed circuit pattern as a mask;
transferring the pattern to the organic film by etching using the inorganic hard mask having the transferred pattern as a mask; and
transferring the pattern to the body to be processed by etching using the organic film having the transferred pattern as a mask.

12. A patterning process comprising:
forming an organic film on a body to be processed from the composition for forming an organic film according to claim 1 ;
forming an inorganic hard mask selected from a silicon oxide film, a silicon nitride film, a silicon oxynitride film, a titanium oxide film, and a titanium nitride film on the organic film;
forming an organic antireflective film on the inorganic hard mask;
forming a resist upper layer film on the organic antireflective film from a resist upper layer film material composed of a photoresist composition to form a four-layered film structure;
forming a circuit pattern in the resist upper layer film;
transferring the pattern to the organic antireflective film and the inorganic hard mask by etching using the resist upper layer film having the formed circuit pattern as a mask;
transferring the pattern to the organic film by etching using the inorganic hard mask having the transferred pattern as a mask; and
transferring the pattern to the body to be processed by etching using the organic film having the transferred pattern as a mask.

13. The patterning process according to claim 11 , wherein the inorganic hard mask is formed by a CVD method or an ALD method.

14. The patterning process according to claim 9 , wherein the circuit pattern is formed by a photolithography with a wavelength ranging from 10 nm t

Assignees

• Shinetsu Chemical Co

Inventors

• Tachibana Seiichiro
• Watanabe Takeru
• Niida Keisuke
• Nagai Hiroko
• Sawamura Takashi
• Ogihara Tsutomu

Classifications

• H10P76/20

  of masks comprising organic materials · CPC title

• H10P50/287

  by chemical means · CPC title

• C07C35/38 Primary

  derived from the fluorene skeleton · CPC title

• G03F7/027

  Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) · CPC title

• G03F7/004

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title