Compound, method for manufacturing the compound, and composition for forming organic film

Patent metadata

Field	Value
Publication number	US-10604618-B2
Application number	US-201816013672-A
Country	US
Kind code	B2
Filing date	Jun 20, 2018
Priority date	Jun 20, 2018
Publication date	Mar 31, 2020
Grant date	Mar 31, 2020

Abstract

A compound includes two or more structures shown by the following general formula (1-1) in the molecule,

“Ar” represents an aromatic ring or one that contains at least one nitrogen atom and/or sulfur atom optionally having a substituent, and two Ars are optionally bonded with each other to form a ring structure; the broken line represents a bond with Y; Y represents a divalent or trivalent organic group having 6 to 30 carbon atoms that contains an aromatic ring or a heteroaromatic ring optionally having a substituent, the bonds of which are located in a structure of the aromatic ring or the heteroaromatic ring; R represents a hydrogen atom or a monovalent group having 1 to 68 carbon atoms. This compound can be cured even in an inert gas not only in air atmosphere without forming byproducts, and can form an organic under layer film.

First claim

The invention claimed is:

1. A compound comprising two or more structures shown by the following general formula (1-1) in the molecule,

wherein each “Ar” independently represents an aromatic ring optionally having a substituent or an aromatic ring that contains at least one nitrogen atom and/or sulfur atom optionally having a substituent, and two Ars are optionally bonded with each other to form a ring structure; a broken line represents a bond with Y; Y represents a divalent or trivalent organic group having 6 to 30 carbon atoms that contains an aromatic ring optionally having a substituent or a heteroaromatic ring optionally having a substituent, the bonds of which are located in a structure of the aromatic ring or the heteroaromatic ring; R represents a hydrogen atom or a monovalent group having 1 to 68 carbon atoms.

2. The compound according to claim 1 , wherein the compound has units shown by the following general formulae (2-1) and (2-2),

wherein AR1 and AR2 each represent a benzene ring, a pyridine ring, or a naphthalene ring optionally having an alkoxy group, an alkenyloxy group, an alkynyloxy group, or an aryloxy group having 1 to 30 carbon atoms; “m” is 0 or 1; when m=0, aromatic rings of AR1 and AR2 do not form a bridged structure with each other, when m=1, AR1 and AR2 form a bridged structure in which aromatic rings of AR1 and AR2 are bonded with each other through X; X represents a single bond or any of groups shown by the following formulae (3);

“n” is 2 or 3; Z represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms; “a” bonds with “b”, and “c” represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms or bonds with “a”.

3. A method for manufacturing the compound according to claim 2 , comprising the steps of:
manufacturing a diol and/or triol by a reaction shown by the following formula (5-1),

wherein M represents Li or Mg-Hal, and Hal represents Cl, Br, or I;
manufacturing a dihalogenated compound and/or a trihalogenated compound by a reaction shown by the following formula (5-2),

and manufacturing a polymer by a reaction shown by the following formula (5-3),

wherein M1 represents Li or Mg-Hal; “a” bonds with “b”, and “d” represents a hydrogen atom or bonds with “a”.

4. A method for manufacturing the compound according to claim 2 , comprising the steps of:
manufacturing a diol and/or triol by a reaction shown by the following formula (5-1),

wherein M represents Li or Mg-Hal, and Hal represents Cl, Br, or I;
manufacturing a dihalogenated compound and/or a trihalogenated compound by a reaction shown by the following formula (5-2),

manufacturing a polymer by a reaction shown by the following formula (5-4), followed by introducing a substituent to a terminal of the polymer by a reaction shown by the following formula (5-5),

wherein M1 represents Li or Mg-Hal; “a” bonds with “b”; “e” represents M1 or bonds with “a”; and “f” represents a monovalent organic group having 1 to 30 carbon atoms or bonds with “a”.

5. A method for manufacturing the compound according to claim 1 , comprising the steps of:
manufacturing a diol and/or triol by a reaction shown by the following formula (4-1),

wherein “n” is 2 or 3; M represents Li or Mg-Hal, and Hal represents Cl, Br, or I;
manufacturing a dihalogenated compound and/or a trihalogenated compound by a reaction shown by the following formula (4-2),

and manufacturing a compound by a reaction shown by the following formula (4-3),

wherein M1 represents Li or Mg-Hal.

6. A composition for forming an organic film, comprising (A) a compound having two or more structures shown by the following general formula (1-1) in the molecule and (B) an organic solvent,

wherein each “Ar” independently represents an aromatic ring optionally having a substituent or an aromatic ring that contains at least one nitrogen atom and/or sulfur atom optionally having a substituent, and two Ars are optionally bonded with each other to form a ring structure; a broken line represents a bond with Y; Y represents a divalent or trivalent organic group having 6 to 30 carbon atoms that contains an aromatic ring optionally having a substituent or a heteroaromatic ring optionally having a substituent, the bonds of which are located in a structure of the aromatic ring or the heteroaromatic ring; R represents a hydrogen atom or a monovalent group having 1 to 68 carbon atoms.

7. The composition for forming an organic film according to claim 6 , wherein the compound of (A) has units shown by the following general formulae (2-1) and (2-2),

wherein AR1 and AR2 each represent a benzene ring, a pyridine ring, or a naphthalene ring optionally having an alkoxy group, an alkenyloxy group, an alkynyloxy group, or an aryloxy group having 1 to 30 carbon atoms; “m” is 0 or 1; when m=0, aromatic rings of AR1 and AR2 do not form a bridged structure with each other, when m=1, AR1 and AR2 form a bridged structure in which aromatic rings of AR1 and AR2 are bonded with each other through X; X represents a single bond or any of groups shown by the following formulae (3);

“n” is 2 or 3; Z represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms; “a” bonds with “b”, and “c” represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms or bonds with “a”.

8. The composition for forming an organic film according to claim 7 , wherein the component (A) has a weight-average molecular weight between 500 and 20,000 Da.

9. The composition for forming an organic film according to claim 8 , further comprising at least one of (C) an acid generator, (D) a surfactant, (E) a cross-linking agent, and (F) a plasticizer.

10. The composition for forming an organic film according to claim 7 , further comprising at least one of (C) an acid generator, (D) a surfactant, (E) a cross-linking agent, and (F) a plasticizer.

11.

Assignees

• Shinetsu Chemical Co
• IBM

Inventors

• Tachibana Seiichiro
• Watanabe Takeru
• Niida Keisuke
• Nagai Hiroko
• Sawamura Takashi
• Ogihara Tsutomu
• Hess Alexander Edward
• Breyta Gregory
• Sanders Daniel Paul
• Wojtecki Rudy J

Classifications

• G03F7/004

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title

• C07D335/12

  Thioxanthenes · CPC title

• C07D333/08

  Hydrogen atoms or radicals containing only hydrogen and carbon atoms · CPC title

• C07D311/82

  Xanthenes · CPC title

• C07D209/86

  with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system · CPC title