Compound and composition for forming organic film

Patent metadata

Field	Value
Publication number	US-11022882-B2
Application number	US-201816013728-A
Country	US
Kind code	B2
Filing date	Jun 20, 2018
Priority date	Jun 20, 2018
Publication date	Jun 1, 2021
Grant date	Jun 1, 2021

Abstract

A compound shown by the following general formula (1-1),

AR1 and AR2 each independently represent an aromatic ring or an aromatic ring containing at least one nitrogen and/or sulfur atom, two AR1s, AR1 and AR2, or two AR2s are optionally bonded; AR3 represents a benzene, naphthalene, thiophene, pyridine, or diazine ring; A represents an organic group; B represents an anionic leaving group; Y represents a divalent organic group; “p” is 1 or 2; “q” is 1 or 2; “r” is 0 or 1; “s” is 2 to 4; when s=2, Z represents a single bond, divalent atom, or divalent organic group; and when s=3 or 4, Z represents a trivalent or quadrivalent atom or organic group. This compound cures to form an organic film, and also forms an organic under layer film.

First claim

The invention claimed is:

1. A compound having one of the structures shown by the following general formula (1-4),

wherein:
AR3 represents a benzene ring, a thiophene ring, a pyridine ring, or a diazine ring optionally having a substituent;
AR6 and AR7 each represent a benzene ring, a thiophene ring, or a pyridine ring optionally having a substituent;
X represents a single bond or any of groups shown by the following formula (1-2-1′);

when X is a single bond, at least one of AR6 and AR7 is not a benzene ring;
“s” is 2 to 4; when s=2, Z represents a single bond, a divalent atom, or a divalent organic group, and when s=3 or 4, Z represents a trivalent or quadrivalent atom or organic group.

2. The compound according to claim 1 , wherein when X is a single bond, at least one of AR6 and AR7 is a pyridine ring optionally having a substituent.

3. A compound having one of the structures shown by the following general formula (1-5),

wherein:
AR3 represents a benzene ring, a thiophene ring, a pyridine ring, or a diazine ring optionally having a substituent;
AR6 and AR7 each represent a benzene ring, a thiophene ring, or a pyridine ring optionally having a substituent;
X represents a single bond or any of groups shown by the following formula (1-2-1′);

“s” is 2 to 4; when s=2, Z represents a single bond, a divalent atom, or a divalent organic group; and when s=3 or 4, Z represents a trivalent or quadrivalent atom or organic group, wherein and
when X is a single bond, at least one of AR6 and AR7 is a pyridine ring optionally having a substituent, and at least one of AR6 and AR7 is not a benzene ring.

Assignees

• Shinetsu Chemical Co
• IBM

Inventors

• Tachibana Seiichiro
• Watanabe Takeru
• Niida Keisuke
• Nagai Hiroko
• Sawamura Takashi
• Ogihara Tsutomu
• Hess Alexander Edward
• Breyta Gregory
• Sanders Daniel Paul
• Wojtecki Rudy J

Classifications

• H10P76/2041

  Photolithographic processes · CPC title

• H10P50/692

  characterised by their composition, e.g. multilayer masks or materials · CPC title

• H10P50/73

  using masks for insulating materials · CPC title

• H10P50/287

  by chemical means · CPC title

• H10P50/283

  by chemical means · CPC title