Apparatus and method for bonding substrates

Patent metadata

Field	Value
Publication number	US-11139170-B2
Application number	US-201916540133-A
Country	US
Kind code	B2
Filing date	Aug 14, 2019
Priority date	Sep 25, 2013
Publication date	Oct 5, 2021
Grant date	Oct 5, 2021

Abstract

A device and method is described for producing an electrically conductive direct bond between a bonding side of a first substrate and a bonding side of a second substrate. A workspace is included that can be closed, gas-tight, against the environment and can be supplied with a vacuum. The workspace includes a) at least one plasma chamber for modifying at least one of the bonding sides and at least one bonding chamber for bonding the bonding sides, and/or b) at least one combined bonding/plasma chamber for modifying at least one of the bonding sides and for bonding the bonding sides.

First claim

Having described the invention, the following is claimed:

1. A device for producing an electrically conductive direct bond between a bonding side of a first substrate and a bonding side of a second substrate, at least one of the substrates being crystalline or monocrystalline, the device comprising:
a workspace that is hermetically sealable against an oxidizing atmosphere and able to be evacuated, the workspace comprising at least one of:
one or more module groups comprising one or more plasma chamber modules and one or more bonding chamber modules, the one or more plasma chamber modules respectively comprising plasma chamber gas supplies through which plasma ions generated in an external plasma source are transported to the one or more plasma chamber modules for use in plasma treatment of at least one of the bonding sides, the one or more plasma chamber modules being configured to modify the at least one of the bonding sides and remove an oxide present on the at least one of the bonding sides via reduction with the plasma treatment to expose the substrate lying under the oxide, the one or more bonding chamber modules being configured to bond the at least one of the bonding sides; and
one or more combined bonding/plasma chamber modules respectively comprising combined bonding/plasma chamber gas supplies through which plasma ions generated in the external plasma source are transported to the one or more combined bonding/plasma chamber modules for use in plasma treatment of the at least one of the bonding sides, the one or more combined bonding/plasma chamber modules being configured to modify the at least one of the bonding sides, remove an oxide present thereon via reduction with the plasma treatment to expose the substrate lying under the oxide, and bond the at least one of the bonding sides.

2. The device according to claim 1 , wherein, when the workspace comprises the one or more module groups, the workspace further comprises a movement mechanism configured to move the first and second substrates in the workspace from a storage container sealed to the workspace to the one or more module groups.

3. The device according to claim 1 , wherein the at least one of the one or more plasma chamber modules and the one or more combined bonding/plasma chamber modules comprises a reducing gas supplied thereto through the gas supplies, the reducing gas being configured to modify the oxide present on the at least one of the bonding sides.

4. The device according to claim 1 , wherein at least one of the one or more plasma chamber modules and the one or more combined bonding/plasma chamber modules comprises an upper electrode supplied with AC voltage and a lower electrode supplied with AC voltage,
wherein, between the upper electrode and the lower electrode, ions strike a surface of at least one of the substrates at an ion energy of less than 1000 eV.

5. The device according to claim 4 , wherein the AC voltage supplied to the upper electrode has a frequency that is greater than a frequency of the AC voltage supplied to the lower electrode.

6. The device according to claim 1 , further comprising:
a source-detector system docked on or arranged in the workspace, the source-detector system being configured to detect a condition or a change in the condition of the oxide present on the at least one of the bonding sides during the modifying of the at least one of the bonding sides.

7. A method for producing an electrically conductive direct bond between a bonding side of a first substrate and a bonding side of a second substrate in a workspace that is hermetically sealed against an oxidizing atmosphere and is able to be evacuated, the workspace including at least one of one or more module groups and one or more combined bonding/plasma chamber modules, the one or more module groups comprising one or more plasma chamber modules and one or more bonding chamber modules, the one or more plasma chamber modules respectively comprising plasma chamber gas supplies, the one or more combined bonding/plasma chamber modules respectively comprising combined bonding/plasma chamber gas supplies, at least one of the substrates being crystalline or monocrystalline, the method comprising:
modifying at least one of the bonding sides in at least one of the one or more plasma chamber modules of the one or more module groups and the one or more bonding/plasma chamber modules, the modifying comprising
transporting plasma ions generated in an external plasma source to the at least one of the one or more plasma chamber modules of the one or more module groups and the one or more bonding/plasma chamber modules respectively through the plasma chamber gas supplies and the combined bonding/plasma chamber gas supplies for use in plasma treatment of the at least one of the bonding sides; and
removing an oxide present on the at least one of the bonding sides via reduction with the plasma treatment in the at least one of the one or more plasma chamber modules of the one or more module groups and the one or more bonding/plasma chamber modules to expose the substrate lying under the oxide; and

bonding the at least one of the bonding sides in at least one of the one or more bonding chamber modules of the one or more module groups and the one or more bonding/plasma chamber modules.

8. The method according to claim 7 , wherein the modifying further comprises at least one of:
altering the oxide on the at least one of the bonding sides; and
at least partially removing part of the oxide from the at least one of the bonding sides.

9. The method according to claim 7 , wherein the modifying further comprises introducing, into the one or more plasma chamber modules of the one or more module groups through the plasma chamber gas supplies and the one or more bonding/plasma chamber modules through the combined bonding/plasma chamber gas supplies, one or more reducing gases selected from the group consisting of hydrogen, nitrogen oxides, carbon monoxide, and methane.

10. The method according to claim 9 , wherein the reducing gases are mixed with one or more inert gases selected from the group consisting of xenon, argon, helium, nitrogen, and carbon dioxide.

11. The method according to claim 7 , further comprising:
applying an ion energy of less than 1000 eV between an upper electrode and a lower electrode of the at least one of the one or more plasma chamber modules of the one or more module groups and the one or more bonding/plasma chamber modules to supply the ion energy to the one of the bonding sides.

12. The method according to claim 11 , wherein an AC voltage with a frequency greater than a frequency of an AC voltage applied to the lower electrode is supplied to the upper electrode.

Assignees

• Ev Group E Thallner Gmbh

Inventors

• Wimplinger Markus
• Dragoi Viorel
• Flotgen Christoph

Classifications

• H10P72/0428

  Apparatus for mechanical treatment or grinding or cutting · CPC title

• H10P34/40

  with high-energy radiation · CPC title

• H10P10/128 Primary

  by direct semiconductor to semiconductor bonding · CPC title

• H10P90/1914 Primary

  using bonding · CPC title

• H01J37/321

  the radio frequency energy being inductively coupled to the plasma · CPC title