Field guided post exposure bake application for photoresist microbridge defects

Patent metadata

Field	Value
Publication number	US-2016291476-A1
Application number	US-201514677552-A
Country	US
Kind code	A1
Filing date	Apr 2, 2015
Priority date	Apr 2, 2015
Publication date	Oct 6, 2016
Grant date	—

Abstract

Embodiments described herein generally relate to methods for mitigating patterning defects. More specifically, embodiments described herein relate to utilizing field guided post exposure bake processes to mitigate microbridge photoresist defects. An electric field may be applied to a substrate being processed during a post exposure bake process. Photoacid generated as a result of the exposure may be moved along a direction defined by the electric field. The movement of the photoacid may contact microbridge defects and facilitate the removal of the microbridge defects from the surface of a substrate.

First claim

What is claimed is:

1 . A method of processing a substrate, comprising:
positioning a substrate having a photoresist material disposed thereon patterned with latent image lines in a processing chamber; heating the photoresist material; applying an electric field to the photoresist material in a direction parallel to the latent image lines; and altering a photoacid distribution along the direction parallel to the latent image lines.

2 . The method of claim 1 , further comprising exposing the photoresist material to electromagnetic radiation.

3 . The method of claim 1 , wherein heating the photoresist material comprises:
heating the photoresist material to a temperature of between about 30° C. and 140° C.

4 . The method of claim 1 , wherein applying the electric field comprises:
maintaining a field strength of the electric field of between about 1 MV/meter and about 5 MV/meter.

5 . The method of claim 4 , wherein applying the electric field comprises:
pulsing direct current to an electrode assembly.

6 . The method of claim 4 , wherein applying the electric field comprises:
pulsing an alternating current to an electrode assembly.

7 . The method of claim 1 , wherein applying the electric field comprises:
applying a voltage having a first polarity to a first antenna and applying a voltage having a second polarity that is opposite the first polarity to a second antenna.

8 . The method of claim 7 , wherein the first antenna is disposed above the substrate and the second antenna is disposed below the substrate.

9 . The method of claim 1 , wherein the photoresist material comprises a photoacid generator.

10 . A method of processing a substrate, the method comprising:
disposing a photoresist layer comprising a photoacid generator on a substrate; exposing a first portion of the photoresist layer unprotected by a photomask to electromagnetic radiation in a lithographic exposure process; and applying an electric field by applying positive and negative voltages to a first pair of antennae and a second pair of antennae to alter movement of photoacid generated from the photoacid generator in a direction parallel with a plane defined by the substrate.

11 . The method of claim 10 , further comprising:
electrically floating the substrate.

12 . The method of claim 10 , wherein the electric field is applied to the photoresist layer during a post-exposure bake process performed after the lithographic exposure process.

13 . The method of claim 10 , wherein applying the electric field further comprises:
controlling photoacid movement in a direction parallel to one or more latent image lines formed in the photoresist layer by the lithographic exposure process.

14 . The method of claim 10 , wherein applying the electric field further comprises:
charging a first antenna disposed above the photoresist layer and a second antenna disposed below the photoresist layer with a first voltage; and charging a third antenna disposed above the photoresist layer and a fourth antenna disposed below the photoresist layer with a second voltage, wherein the first and second voltages have opposite polarities.

15 . The method of claim 14 further comprising:
moving the substrate via a conveyor.

16 . The method of claim 14 , wherein the first voltage and the second voltage each comprises one of a direct current voltage, an alternating current voltage, or a pulse.

17 . The method of claim 10 , further comprising:
heating the photoresist layer to a temperature between about 30° C. and 140° C.

18 . A method of processing a substrate, comprising:
disposing a photoresist layer comprising a photoacid generator on a substrate; exposing a first portion of the photoresist layer unprotected by a photomask to electromagnetic radiation in a lithographic exposure process to form one or more latent image lines; positioning the substrate having the photoresist material disposed thereon patterned with latent image lines in a processing chamber; heating the substrate and the photoresist layer; applying an electric field to alter movement of photoacid generated from the photoacid generator in a direction parallel to the latent image lines, wherein the applying an electric field comprises:
applying a first voltage to a first antenna disposed above the photoresist layer and a second antenna disposed below the photoresist layer; and
applying a second voltage to a third antenna disposed above the photoresist layer and a fourth antenna disposed below the photoresist layer, wherein the first and second voltages have opposite polarities; and
altering a photoacid distribution along the direction parallel to the latent image lines.

19 . The method of claim 18 , wherein the first voltage and the second voltage each comprises one of a direct current voltage, an alternating current voltage, or a pulse.

20 . The method of claim 18 , wherein the substrate and the photoresist layer are heated to a temperature between about 30° C. and 140° C.

Assignees

• Applied Materials Inc

Inventors

• Godet Ludovic
• Nam Sang Ki
• Ouyang Christine Y

Classifications

• G03F7/38 Primary

  Treatment before imagewise removal, e.g. prebaking {(G03F7/265 takes precedence)} · CPC title

• G03F7/40 Primary

  Treatment after imagewise removal, e.g. baking · CPC title