Multi-layer coating with diffusion barrier layer and erosion resistant layer

Patent metadata

Field	Value
Publication number	US-11008653-B2
Application number	US-201715844335-A
Country	US
Kind code	B2
Filing date	Dec 15, 2017
Priority date	Jul 15, 2016
Publication date	May 18, 2021
Grant date	May 18, 2021

Abstract

A multi-layer coating for a surface of an article comprises a diffusion barrier layer and an erosion resistant layer. The diffusion barrier layer may be a nitride film including but not limited to TiNx, TaNx, Zr3N4, and TiZrxNy. The erosion resistant layer may be a rare oxide film comprising YZrxOy. The diffusion barrier layer and the erosion resistant layer may be deposited on the article's surface using a thin film deposition technique including but not limited to, ALD, PVD, and CVD.

First claim

What is claimed is:

1. A coated article comprising an article and a multi-layer coating deposited on a surface of the article, the multi-layer coating comprising:
a diffusion barrier layer selected from a group consisting of TiN x , TaN x , Zr 3 N 4 , and TiZr x N y , wherein the diffusion barrier layer seals the article from diffusion of metal contaminants therethrough; and
an erosion resistant layer comprising YZr x O y , wherein the erosion resistant layer contacts and covers the diffusion barrier layer.

2. The coated article of claim 1 , wherein the diffusion barrier layer has a thickness ranging from about 10 nm to about 100 nm, and wherein the erosion resistant layer has a thickness of up to about 1 micrometer.

3. The coated article of claim 1 , wherein the multi-layer coating is able to withstand temperature cycling from about 20° C. to about 450° C. without cracking.

4. The coated article of claim 1 , wherein the diffusion barrier layer is conformal to the surface of the article.

5. The coated article of claim 1 , wherein the diffusion barrier layer has a porosity of less than 1%.

6. The coated article of claim 1 , wherein the diffusion barrier layer has a porosity of less than 0.1%.

7. The coated article of claim 1 , wherein the erosion resistant layer is conformal to the diffusion barrier layer.

8. The coated article of claim 1 , wherein the erosion resistant layer has a porosity of less than 1%.

9. The coated article of claim 1 , wherein the erosion resistant layer has a porosity of less than 0.1%.

10. A coated process chamber component comprising:
a process chamber component having a surface; and
a multi-layer coating on the surface, comprising:
a diffusion barrier layer selected from a group consisting of TiN x , TaN x , Zr 3 N 4 , and TiZr x N y , wherein the diffusion barrier layer seals the surface from diffusion of metal contaminants there through; and
an erosion resistant layer comprising YZr x O y , wherein the erosion resistant layer contacts and covers the diffusion barrier layer.

11. The coated process chamber component of claim 10 , wherein the diffusion barrier layer has a thickness ranging from about 10 nm to about 100 nm, and wherein the erosion resistant layer has a thickness of up to about 1 micrometer.

12. The coated process chamber component of claim 10 , wherein the diffusion barrier layer is conformal to the surface of the process chamber component.

13. The coated process chamber component of claim 10 , wherein the diffusion barrier layer has a porosity of less than 1%.

14. The coated process chamber component of claim 10 , wherein the diffusion barrier layer has a porosity of less than 0.1%.

15. The coated process chamber component of claim 10 , wherein the erosion resistant layer is conformal to the diffusion barrier layer.

16. The coated process chamber component of claim 10 , wherein the erosion resistant layer has a porosity of less than 1%.

17. The coated process chamber component of claim 10 , wherein the erosion resistant layer has a porosity of less than 0.1%.

Assignees

• Applied Materials Inc

Inventors

• Fenwick David
• Wu Xiaowei
• Sun Jennifer Y

Classifications

• C23C16/405

  of refractory metals or yttrium · CPC title

• C23C16/455

  characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber · CPC title

• C23C16/34

  Nitrides {(C23C16/303 takes precedence)} · CPC title

• C23C14/08

  Oxides (C23C14/10 takes precedence) · CPC title

• C23C14/0641

  Nitrides (C23C14/0617 takes precedence) · CPC title