Method for manufacturing semiconductor device, method for processing substrate, substrate processing apparatus and recording medium
US-2015364318-A1 · Dec 17, 2015 · US
characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/455 |
| Official title | characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber |
| Display label | characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber |
| Total patents | 2,050 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 209 |
| 2016 | 198 |
| 2017 | 222 |
| 2018 | 164 |
| 2019 | 170 |
| 2020 | 189 |
| 2021 | 157 |
| 2022 | 165 |
| 2023 | 159 |
| 2024 | 172 |
| 2025 | 191 |
| 2026 | 54 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Deposition Apparatus and Use Methods
US-2015361556-A1 · Dec 17, 2015 · US
Defect control and stability of dc bias in rf plasma-based substrate processing systems using molecular reactive purge gas
US-2015354061-A1 · Dec 10, 2015 · US
Gas distribution system
US-9206512-B2 · Dec 8, 2015 · US
Plasma reactor with a ceiling electrode supply conduit having a succession of voltage drop elements
US-9202674-B2 · Dec 1, 2015 · US
Plasma processing method and apparatus
US-2015340208-A1 · Nov 26, 2015 · US
Film-forming manufacturing apparatus and method
US-2015329967-A1 · Nov 19, 2015 · US
Substrate processing apparatus
US-2015322571-A1 · Nov 12, 2015 · US
Gas distribution showerhead for inductively coupled plasma etch reactor
US-2015318147-A1 · Nov 5, 2015 · US
Tiled showerhead for a semiconductor chemical vapor deposition reactor
US-9175393-B1 · Nov 3, 2015 · US
Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium
US-2015307988-A1 · Oct 29, 2015 · US
Plasma-generating unit and substrate treatment apparatus including the same
US-2015311038-A1 · Oct 29, 2015 · US
Film forming apparatus
US-9163311-B2 · Oct 20, 2015 · US
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
US-9163309-B2 · Oct 20, 2015 · US
Gas barrier film and method for manufacturing gas barrier film
US-2015291813-A1 · Oct 15, 2015 · US
Low-k films with enhanced crosslinking by uv curing
US-2015284849-A1 · Oct 8, 2015 · US
Coating layer of zirconium composite material and method of forming coating layer
US-2015284843-A1 · Oct 8, 2015 · US
Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
US-2015279682-A1 · Oct 1, 2015 · US
Vapor phase growth apparatus and vapor phase growth method
US-2015279659-A1 · Oct 1, 2015 · US
Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium
US-2015267294-A1 · Sep 24, 2015 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/455?
- CPC C23C16/455 is the Cooperative Patent Classification code for “characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber.”
- How many patents are filed under CPC C23C16/455 (characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber)?
- Our database includes 2,050 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/455 growing?
- Publication counts under this code: 172 in 2024 vs 191 in 2025 (latest complete years).