Gas diffuser mounting plate for reduced particle generation

US10883174B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10883174-B2
Application numberUS-201816201755-A
CountryUS
Kind codeB2
Filing dateNov 27, 2018
Priority dateNov 27, 2018
Publication dateJan 5, 2021
Grant dateJan 5, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Embodiments of the present disclosure generally provide apparatus and methods for a gas diffuser assembly for a vacuum chamber, the gas diffuser assembly comprising a mounting plate, the mounting plate comprising a hub, a plurality of curved spokes extending from the hub in a radial direction, a gusset portion coupled between the hub and each of the curved spokes, each of the gusset portions having a convex curve disposed in an axial direction, and one or more mounting holes coupled to the curved spokes.

First claim

Opening claim text (preview).

The invention claimed is: 1. A gas diffuser assembly for a vacuum chamber, the gas diffuser assembly comprising: a ring-shaped mounting plate, comprising: a hub; a plurality of curved spokes extending from the hub in a radial direction and interfacing with an arc segment at a distal end thereof, wherein a plurality of openings are formed in the ring-shaped mounting plate, each of the plurality of openings are bounded by the hub, the arc segment, and two of the plurality of curved spokes; a gusset portion coupled between the hub and each of the curved spokes, the gusset portion having a convex curve disposed in an axial direction; and one or more mounting holes positioned adjacent to the curved spokes. 2. The gas diffuser assembly of claim 1 , wherein each of the mounting holes is formed in a circular mounting structure between the curved spokes. 3. The gas diffuser assembly of claim 1 , wherein one of the one or more mounting holes is positioned at the distal end of each of the curved spokes. 4. The gas diffuser assembly of claim 1 , wherein each of the curved spokes includes a distal body. 5. The gas diffuser assembly of claim 4 , wherein each of the curved spokes includes an acute angled portion and an obtuse angled portion at the distal body. 6. The gas diffuser assembly of claim 1 , wherein each of the curved spokes includes an acute angled portion and an obtuse angled portion. 7. The gas diffuser assembly of claim 1 , wherein the hub includes a flat surface. 8. The gas diffuser assembly of claim 1 , wherein the hub includes a rounded surface. 9. The gas diffuser assembly of claim 1 , wherein each of the curved spokes include an obtuse angled portion adjacent to the gusset portion. 10. A gas diffuser assembly for a vacuum chamber, the gas diffuser assembly comprising: a ring-shaped mounting plate, comprising: a hub; a plurality of spokes extending from the hub in a radial direction and interfacing with an arc segment at a distal end thereof; a plurality of gusset portions coupled between the hub and the spokes, each of the gusset portions having a convex curve disposed in an axial direction; one or more mounting holes formed in the ring-shaped mounting plate between the spokes, wherein a plurality of openings are formed in the ring-shaped mounting plate, each of the openings being bounded by the hub, the arc segment, and two of the plurality of curved spokes; and a threaded hole formed in the hub. 11. The gas diffuser assembly of claim 10 , wherein each of the mounting holes is disposed at a height that is greater than a height of the ring-shaped mounting plate. 12. The gas diffuser assembly of claim 10 , wherein one of the one or more mounting holes is positioned at the distal end of each of the spokes. 13. The gas diffuser assembly of claim 10 , wherein each of the spokes includes a distal body. 14. The gas diffuser assembly of claim 13 , wherein each of the spokes includes an acute angled portion and an obtuse angled portion at the distal body. 15. The gas diffuser assembly of claim 10 , wherein each of the spokes includes an acute angled portion and an obtuse angled portion. 16. The gas diffuser assembly of claim 10 , wherein the hub includes a flat surface. 17. The gas diffuser assembly of claim 10 , wherein the hub includes a rounded surface. 18. A gas diffuser assembly for a vacuum chamber, the gas diffuser assembly comprising: a ring-shaped mounting plate; and a gas deflector coupled to the ring-shaped mounting plate by a single fastener, wherein the mounting plate comprises: a hub; a plurality of curved spokes extending from the hub in a radial direction and interfacing with an arc segment at a distal end thereof, wherein a plurality of openings is formed in the ring-shaped mounting plate, and wherein each of the plurality of openings is bounded by the hub, the arc segment, and two of the plurality of curved spokes; and one or more mounting holes coupled to the curved spokes. 19. The gas diffuser assembly of claim 18 , wherein the plurality of curved spokes are positioned at 90 degree intervals on the hub. 20. The gas diffuser assembly of claim 18 , wherein each of the curved spokes includes a distal body and an acute angled portion and an obtuse angled portion.

Assignees

Inventors

Classifications

  • Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

  • Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

  • using radio frequency discharges · CPC title

  • using DC or AC discharges · CPC title

  • Fixed means, e.g. wings, baffles · CPC title

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What does patent US10883174B2 cover?
Embodiments of the present disclosure generally provide apparatus and methods for a gas diffuser assembly for a vacuum chamber, the gas diffuser assembly comprising a mounting plate, the mounting plate comprising a hub, a plurality of curved spokes extending from the hub in a radial direction, a gusset portion coupled between the hub and each of the curved spokes, each of the gusset portions ha…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/0402. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 05 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).