Ground return for thin film formation using plasma
US-12378669-B2 · Aug 5, 2025 · US
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An Hsiang patents
An Hsiang is listed as an inventor on 5 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | An Hsiang |
| Total patents | 5 |
| First publication | Aug 2, 2018 |
| Latest publication | Aug 5, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Ground return for thin film formation using plasma
US-2023243035-A1 · Aug 3, 2023 · US
Gas diffuser mounting plate for reduced particle generation
US-10883174-B2 · Jan 5, 2021 · US
Gas diffuser mounting plate for reduced particle generation
US-2020165726-A1 · May 28, 2020 · US
Applying equalized plasma coupling design for mura free susceptor
US-2018218905-A1 · Aug 2, 2018 · US
Recent patents
Latest publications not already listed above.
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Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 5 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C23C16/505 | 5 |
| H01J37/3244 | 4 |
| C23C16/4405 | 3 |
| H10P14/6336 | 3 |
| C23C16/545 | 2 |