Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods

Patent metadata

Field	Value
Publication number	US-10844484-B2
Application number	US-201816130798-A
Country	US
Kind code	B2
Filing date	Sep 13, 2018
Priority date	Sep 22, 2017
Publication date	Nov 24, 2020
Grant date	Nov 24, 2020

Abstract

An apparatus for dispensing a vapor phase reactant to a reaction chamber is disclosed. The apparatus may include: a first chamber configured for holding a source chemical with a first fill level; and a second chamber configured for holding the source chemical with a second fill level and in fluid communication with the first chamber via a fluid channel below the first and second fill levels. The apparatus may also include: a second chamber inlet opening in fluid communication with a pressurizing gas feed provided with a flow controller configured for controlling a flow of a pressurizing gas in the second chamber to control the first fill level in the first chamber. Methods for dispensing a vapor phase reactant are also provided.

First claim

What is claimed is:

1. An apparatus for dispensing a vapor phase reactant to a reaction chamber, the apparatus comprising:
a first chamber configured for holding a source chemical with a first fill level;
a liquid level sensor for measuring the first fill level in the first chamber;
a second chamber configured for holding the source chemical with a second fill level and in fluid communication with the first chamber via a fluid channel below the first and second fill levels;
a first chamber inlet opening in fluid communication with a carrier gas feed line configured for flowing a carrier gas into the first chamber to cause a vapor of the source chemical to become entrained in the carrier gas to produce the vapor phase reactant;
a first chamber outlet opening in fluid communication with a gas outlet line and configured for dispensing the vapor phase reactant from the first chamber;
a second chamber inlet opening in fluid communication with a pressurizing gas feed line provided with a flow controller configured for controlling a flow of a pressurizing gas in the second chamber to control the first fill level in the first chamber; and
a control unit operably connected to the liquid level sensor and the flow controller, wherein the control unit is programmed to control flow of the pressurizing gas into the second chamber via the flow controller based on an output of the liquid level sensor to regulate the first fill level at a constant level.

2. The apparatus of claim 1 , wherein the carrier gas feed line is configured for flowing the carrier gas into the first chamber above the first fill level.

3. The apparatus of claim 1 , further comprising a second chamber outlet opening in fluid communication with a gas outlet line configured to release at least a portion of the pressuring gas from the second chamber.

4. The apparatus of claim 1 , further comprising an additional liquid level sensor disposed within the second chamber and contacting the source chemical.

5. The apparatus of claim 1 , further comprising an additional second chamber inlet opening in fluid communication with a vapor feed line configured for flowing additional source chemical into the second chamber.

6. The apparatus of claim 1 , wherein the first chamber comprises an inner cylinder and the second chamber comprises an outer partially hollow cylinder disposed concentric with and surrounding the inner cylinder.

7. The apparatus of claim 6 , further comprising a heating apparatus disposed between the inner cylinder and the outer cylinder.

8. The apparatus of claim 1 , further comprising a heating apparatus disposed around the first chamber.

9. The apparatus of claim 1 , further comprising a heating apparatus disposed around the second chamber.

10. The apparatus of claim 1 , wherein a total volume of source chemical held within the first chamber and the second chamber is greater than 4 liters.

11. The apparatus of claim 1 , wherein a temperature gradient across a total volume of the source chemical is less than 1° C.

Assignees

• Asm Ip Holding Bv

Inventors

• Jdira Lucian
• Terhorst Herbert
• Tsuji Naoto
• Susa Yoshio

Classifications

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/04 Primary

  Apparatus for manufacture or treatment · CPC title

• C23C16/45561

  Gas plumbing upstream of the reaction chamber · CPC title

• C23C16/4481 Primary

  by evaporation using carrier gas in contact with the source material (C23C16/4486 takes precedence) · CPC title

• C23C16/45557

  Pulsed pressure or control pressure · CPC title