Low magnetic moment materials for spin transfer torque magnetoresistive random access memory devices

Patent metadata

Field	Value
Publication number	US-10833253-B2
Application number	US-201615017001-A
Country	US
Kind code	B2
Filing date	Feb 5, 2016
Priority date	Feb 5, 2016
Publication date	Nov 10, 2020
Grant date	Nov 10, 2020

Abstract

A magnetoresistive random access memory device (MRAM) device is described. The MRAM device has a stack arrangement in which a tunnel barrier layer is formed over a magnetizable reference layer, a metal layer is formed over the tunnel barrier layer, a free layer of a magnetizable material is formed over the metal layer, and an oxide layer is formed over the free layer as a cap layer. The resulting MRAM device has a thin free layer that exhibits a low magnetic moment.

First claim

What is claimed is:

1. A magnetoresistive random access memory device for storing at least one bit of information, the device comprising:
a reference layer of a magnetic material having a fixed magnetic polarity formed directly on an electrode;
an oxide tunnel barrier layer formed directly on the reference layer;
a non-oxide metal layer formed directly on the tunnel barrier layer, the metal layer being non-programmable and distinct from a non-uniform free layer;
the non-uniform free layer of a magnetic material having a changeable magnetic polarity formed directly on the metal layer, wherein the metal layer is interposed between the free layer and the tunnel barrier layer, the metal layer selected to reduce formation of free layer islands at thicknesses less than about 10 Å; and
a cap layer formed over the free layer.

2. The device of claim 1 , wherein the free layer has a thickness of about 7 Å to about 10 Å.

3. The device of claim 1 , wherein the free layer is present directly on top of the metal layer and has a thickness of about 7 Å to about 10 Å.

4. The device of claim 1 , wherein the reference layer is comprised of a metal selected from the group consisting of iron, nickel, cobalt, chromium, boron, manganese, platinum, palladium, ruthenium, tantalum, tungsten, copper and alloys thereof.

5. The device of claim 1 , wherein the reference layer is comprised of a multilayer arrangement comprising a region comprising a metal selected from the group consisting of iron, nickel, cobalt, chromium, boron, manganese, platinum, palladium, ruthenium, tantalum, tungsten, copper and alloys thereof and a region comprised of a metal selected from cobalt, nickel, platinum, palladium, iridium, ruthenium, an alloy of cobalt-iron-terbium, an alloy of cobalt-iron-gadolinium, an alloy of cobalt-chromium platinum, an alloy of cobalt-platinum, an alloy of cobalt-palladium, an ally of iron-platinum and an alloy of iron-palladium.

6. The device of claim 1 , wherein the tunnel barrier layer comprises a metal oxide material selected from the group consisting of magnesium oxide, aluminum oxide and titanium oxide.

7. The device of claim 1 , wherein the free layer comprises a material selected from the group consisting of cobalt, iron, an alloy of cobalt-iron, nickel, an alloy of nickel-iron and an alloy of cobalt-iron-boron.

8. The device of claim 1 , wherein the metal layer comprises a material selected from the group consisting of aluminum, magnesium, calcium, vanadium and titanium.

9. The device of claim 1 , wherein the cap layer is comprised of a material selected from the group consisting of oxides of aluminum, oxides of magnesium, oxides of magnesium and titanium, oxides of magnesium and tantalum, oxides of titanium, oxides of tantalum, oxides of tungsten, oxides of iridium and oxides of ruthenium.

10. The device of claim 1 , wherein the reference layer is comprised of a metal region, a magnetic anisotropy region, and a spacer layer disposed between the metal region and the magnetic anisotropy region.

11. The device of claim 10 , wherein the spacer layer comprises a material selected from the group consisting of tungsten, tantalum, and copper.

12. A magnetoresistive random access memory device for storing at least one bit of information, the device comprising:
a reference layer comprised of a magnetic material, the reference layer having a fixed magnetic polarity and formed directly on an electrode;
an oxide tunnel barrier layer formed directly on the reference layer;
a non-oxide metal layer formed directly on the tunnel barrier layer, the metal layer being non-programmable and distinct from a non-uniform free layer;
the non-uniform free layer of a magnetic material having a changeable magnetic polarity formed directly on the metal layer, wherein the metal layer is interposed between the free layer and the tunnel barrier layer, the metal layer selected to reduce formation of free layer islands at thicknesses less than about 10 Å; and
a cap layer formed over the free layer.

13. The device of claim 12 , wherein the free layer has a thickness of about 8 Å or less.

14. The device of claim 12 , wherein the reference layer is comprised of a region comprising a metal selected from the group consisting of iron, nickel, cobalt, chromium, boron, manganese, platinum, palladium, ruthenium, tantalum, tungsten, copper and alloys thereof and a region comprising a metal selected from cobalt, nickel, platinum, palladium, iridium, ruthenium, an alloy of cobalt-iron-terbium, an alloy of cobalt-iron-gadolinium, an alloy of cobalt-chromium platinum, an alloy of cobalt-platinum, an alloy of cobalt-palladium, an ally of iron-platinum and an alloy of iron-palladium.

15. The device of claim 12 , wherein the tunnel barrier layer comprises a metal oxide material selected from the group consisting of magnesium oxide, aluminum oxide and titanium oxide.

16. The device of claim 12 , wherein the free layer comprises a material selected from the group consisting of cobalt, iron, an alloy of cobalt-iron, nickel, an alloy of nickel-iron and an alloy of cobalt-iron-boron.

17. The device of claim 12 , wherein the metal layer comprises a material selected from the group consisting of aluminum, magnesium, calcium, vanadium and titanium.

18. The device of claim 12 , wherein the cap layer is comprised of a material selected from the group consisting of oxides of aluminum, oxides of magnesium, oxides of magnesium and titanium, oxides of magnesium and tantalum, oxides of titanium, oxides of tantalum, oxides of tungsten, oxides of iridium and oxides of ruthenium.

19. A method for forming a magnetoresistive random access memory device for storing at least one bit of information, the method comprising:
forming an oxide tunnel barrier layer directly on a reference layer, the reference layer comprised of a magnetic material with a fixed magnetic polarity and formed directly on an electrode;
forming a non-oxide metal layer directly on the tunnel barrier layer, the metal layer being non-programmable and distinct from a non-uniform free layer;
forming the non-uniform free layer of a magnetic material having a changeable magnetic polarity directly on the metal layer, wherein the metal layer is interposed between the free layer and the tunnel barrier layer, the metal layer selected to reduce formation of free layer islands at thicknesses less than about 10 Å;
forming a cap layer over the free layer; and
annealing the device structure.

20. The method of claim 19 , wherein the metal layer is formed directly over the tunnel barrier layer.

Assignees

• IBM

Inventors

• Hu Guohan

Classifications

• H10N50/01

  Manufacture or treatment · CPC title

• H10N50/85 Primary

  Materials of the active region · CPC title

• H01L27/222

  Electricity · mapped topic

• H01L43/10 Primary

  Electricity · mapped topic

• H01L43/12

  Electricity · mapped topic