Tunnel junction laminated film, magnetic memory element, and magnetic memory
US-2024284803-A1 · Aug 22, 2024 · US
US9105340B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9105340-B2 |
| Application number | US-201314027503-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 16, 2013 |
| Priority date | Mar 2, 2009 |
| Publication date | Aug 11, 2015 |
| Grant date | Aug 11, 2015 |
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A memory cell comprises a magnetic tunnel junction (MTJ) structure that includes a free layer coupled to a bit line and a pinned layer. A magnetic moment of the free layer is substantially parallel to a magnetic moment of the pinned layer in a first state and substantially antiparallel to the magnetic moment of the pinned layer in a second state. The pinned layer has a physical dimension to produce an offset magnetic field corresponding to a first switching current of the MTJ structure to enable switching between the first state and the second state when a first voltage is applied from the bit line to a source line coupled to an access transistor and a second switching current to enable switching between the second state and the first state when the first voltage is applied from the source line to the bit line.
Opening claim text (preview).
What is claimed is: 1. An apparatus comprising: a magnetic tunnel junction (MTJ) structure including: a free layer; an antiferromagnetic layer; and a pinned layer positioned between the free layer and the antiferromagnetic layer, wherein the pinned layer is distinct from the antiferromagnetic layer, and wherein a magnetic moment of the free layer is substantially parallel to a magnetic moment of the pinned layer in a first state and substantially antiparallel to the magnetic…
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