Method for etching copper layer

Patent metadata

Field	Value
Publication number	US-10825688-B2
Application number	US-201716308428-A
Country	US
Kind code	B2
Filing date	Jun 7, 2017
Priority date	Jun 10, 2016
Publication date	Nov 3, 2020
Grant date	Nov 3, 2020

Abstract

A method MT in an embodiment is a method for etching an etching target layer EL which is included in a wafer W and contains copper. The wafer W includes the etching target layer EL, and a mask MK provided on the etching target layer EL. In the method MT, the etching target layer EL is etched by repeatedly executing a sequence SQ including a first step of generating a plasma of a first gas in a processing container 12 of a plasma processing apparatus 10 in which the wafer W is accommodated, a second step of generating a plasma of a second gas in the processing container 12, and a third step of generating a plasma of a third gas in the processing container 12. The first gas contains a hydrocarbon gas, the second gas contains either a rare gas or a mixed gas of a rare gas and hydrogen gas, and the third gas contains hydrogen gas.

First claim

The invention claimed is:

1. A method for etching a copper layer of a workpiece, the workpiece including the copper layer and a mask provided on the copper layer, the method comprising:
etching the copper layer by repeatedly executing a sequence including
a first step of generating a plasma of a first gas in a processing container of a plasma processing apparatus in which the workpiece is accommodated,
a second step of generating a plasma of a second gas in the processing container after the first step, and
a third step of generating a plasma of a third gas in the processing container after the second step, wherein

the first gas contains a hydrocarbon gas,
the second gas contains either a rare gas or a mixed gas of a rare gas and hydrogen gas,
the third gas contains hydrogen gas, and
an amount of copper of the copper layer etched by the plasma of the second gas in the second step is larger than an amount of copper of the copper layer etched by the plasma of the first gas in the first step, and is larger than an amount of copper of the copper layer etched by the plasma of the third gas in the third step.

2. The method according to claim 1 , wherein,
in the third step, a bias voltage applied to the workpiece in a case of generating the plasma of the third gas is in a range of higher than 100 V and lower than 600 V.

3. The method according to claim 1 , wherein
the first gas contains CH 4 gas.

4. The method according to claim 1 , wherein
an electrode plate of an upper electrode of the plasma processing apparatus contains silicon carbide or copper, and
the upper electrode is provided above a placing table which supports the workpiece in the processing container.

5. The method according to claim 1 , further comprising:
a fourth step of applying a DC voltage or applying a high-frequency voltage between an upper electrode and a lower electrode of the plasma processing apparatus, wherein
the upper electrode is provided above a placing table which supports the workpiece in the processing container,
the lower electrode is provided in the placing table, and
the fourth step is executed after the sequence is repeatedly executed so that an etching of the copper layer is ended and the workpiece is unloaded.

6. The method according to claim 1 , wherein
the workpiece further includes an underlayer,
the copper layer is provided on the underlayer, and
the method further comprises a fifth step of removing copper of the copper layer remaining on the underlayer after the copper layer is etched until the underlayer is reached by repeatedly executing the sequence and before the underlayer is etched.

7. The method according to claim 6 , wherein
a material of the underlayer is Ta, TaN, or Ru, and
in the fifth step, copper remaining on the underlayer is removed by wet cleaning using hydrofluoric acid or citric acid.

8. A method for etching a copper layer of a workpiece, the workpiece including the copper layer and a mask provided on the copper layer, the method comprising:
etching the copper layer by repeatedly executing a sequence including
a first step of generating a plasma of a first gas in a processing container of a plasma processing apparatus in which the workpiece is accommodated,
a second step of generating a plasma of a second gas in the processing container after the first step, and
a third step of generating a plasma of a third gas in the processing container after the second step, wherein

the first gas contains a hydrocarbon gas,
the second gas contains either a rare gas or a mixed gas of a rare gas and hydrogen gas,
the third gas contains hydrogen gas, and
a film thickness of a film formed on the mask and the copper layer by the plasma of the first gas in the first step is 0.8 nm or more and 1.2 nm or less.

9. The method according to claim 8 , wherein
an execution time of the first step is increased or decreased according to an aspect ratio of a groove of a pattern defined by the mask during execution of the first step.

10. The method according to claim 8 , wherein
an execution time of the second step is increased or decreased according to an aspect ratio of a groove of a pattern defined by the mask during execution of the second step.

11. The method according to claim 8 , wherein,
in the second step, a bias voltage applied to the workpiece in a case of generating the plasma of the second gas is in a range of 100 V to 400 V.

12. The method according to claim 11 , wherein
an execution time of the second step is 2.0 times or more and 3.5 times or less a time necessary for etching the film and removing the film under a process condition of the second step.

13. The method according to claim 8 , wherein
the film contains hydrogen and carbon.

14. The method according to claim 13 , wherein
carbon contained in the film diffuses into the copper layer by the plasma of the second gas, and a mixed layer containing copper and carbon is formed on the copper layer.

15. The method according to claim 14 , wherein
the mixed layer activated by sputtering forms an organic copper compound which is volatilized, and etching to the mixed layer is performed.

16. The method according to claim 15 , wherein
carbon is removed from the mixed layer by the plasma of the third gas.

Assignees

• Tokyo Electron Ltd

Inventors

• Tahara Shigeru
• Urayama Daisuke
• Matsumoto Kenji
• Miyoshi Hidenori

Classifications

• H10P50/267

  using plasmas · CPC title

• H10W20/48

  Insulating materials thereof · CPC title

• H10W20/0633

  using subtractive patterning of the conductive members · CPC title

• H10W20/063

  by forming conductive members before forming protective insulating material · CPC title

• H10P50/242 Primary

  of Group IV materials · CPC title