Treatment system and method

Patent metadata

Field	Value
Publication number	US-10312075-B2
Application number	US-201614989227-A
Country	US
Kind code	B2
Filing date	Jan 6, 2016
Priority date	Sep 30, 2015
Publication date	Jun 4, 2019
Grant date	Jun 4, 2019

Abstract

A method of descumming a dielectric layer is provided. In an embodiment the dielectric layer is deposited over a substrate, and a photoresist is applied, exposed, and developed after the photoresist has been applied. Once the pattern of the photoresist is transferred to the underlying dielectric layer, a descumming process is performed, wherein the descumming process utilizes a mixture of a carbon-containing precursor, a descumming precursor, and a carrier gas. The mixture is ignited into a treatment plasma, and the treatment plasma is applied to the dielectric layer in order to descum the dielectric layer.

First claim

What is claimed is:

1. A method of manufacturing a semiconductor device, the method comprising:
applying a photoresist over a dielectric layer;
exposing a first surface of the dielectric layer through the photoresist; and
treating the first surface with a plasma process using a treatment mixture comprising a first treatment precursor and a recovery precursor, wherein treating the first surface comprises:
removing atoms from the first surface of the dielectric layer using the first treatment precursor, wherein removing atoms comprises breaking first bonds at the first surface of the dielectric layer to produce open terminal groups, the first bonds comprising bonds between silicon atoms and nitrogen atoms at the first surface of the dielectric layer; and
replacing the removed atoms by carbon atoms from the recovery precursor, wherein replacing the atoms comprises bonding the open terminal groups with the carbon atoms from the recovery precursor.

2. The method of claim 1 , wherein the recovery precursor comprises methane, wherein the first treatment precursor comprises oxygen.

3. The method of claim 2 , wherein the treatment mixture further comprises a carrier gas.

4. The method of claim 3 , wherein the treatment mixture comprises about 15% methane, 5% oxygen, and 80% argon.

5. The method of claim 1 , wherein the first surface has a first concentration of carbon prior to treating the first surface and a second concentration of carbon different from the first concentration of carbon after treating the first surface.

6. The method of claim 5 , wherein the second concentration of carbon is larger than the first concentration of carbon.

7. A method of manufacturing a semiconductor device, the method comprising:
depositing a low-k dielectric layer over a substrate;
patterning the low-k dielectric layer to form a first surface of the low-k dielectric layer; and
after the patterning the low-k dielectric layer, descumming the first surface of the low-k dielectric layer, wherein descumming the first surface of the low-k dielectric layer comprises:
breaking first bonds between silicon atoms and nitrogen atoms at the first surface of the low-k dielectric layer using a treatment precursor, wherein breaking first bonds creates first open terminal groups at the first surface of the low-k dielectric layer; and
bonding carbon atoms from a recovery precursor to the first open terminal groups.

8. The method of claim 7 , wherein the descumming the low-k dielectric layer comprises applying a plasma of the recovery precursor, the treatment precursor, and a carrier gas.

9. The method of claim 8 , wherein the recovery precursor comprises methane.

10. The method of claim 9 , wherein the treatment precursor comprises oxygen.

11. The method of claim 7 , further comprising:
applying a photoresist onto the low-k dielectric layer;
exposing and developing the photoresist, wherein the descumming the low-k dielectric layer is performed through the photoresist after the exposing and developing the photoresist.

12. The method of claim 11 , further comprising patterning the low-k dielectric layer, wherein the descumming the low-k dielectric layer is performed through the photoresist after the patterning the low-k dielectric layer.

13. The method of claim 7 , wherein the low-k dielectric layer comprises SiOCN.

14. A method of manufacturing a semiconductor device, the method comprising:
depositing a dielectric layer, wherein the dielectric layer comprises first bonds between silicon atoms and oxygen atoms, second bonds between silicon atoms and carbon atoms, and third bonds between silicon atoms and nitrogen atoms;
patterning an opening that extends from a first side of the dielectric layer to a second side of the dielectric layer opposite the first side;
after the patterning the opening, breaking the second bonds and the third bonds by applying a plasma of a descumming precursor, wherein the breaking the second bonds leaves first open terminal groups, and the breaking the third bonds leaves second open terminal groups; and
bonding the first open terminal groups and the second open terminal groups to carbon by applying a plasma of a recovery precursor.

15. The method of claim 14 , wherein the plasma of the descumming precursor comprises a plasma of oxygen.

16. The method of claim 15 , wherein the plasma of the recovery precursor is a plasma of methane.

17. The method of claim 14 , further comprising:
applying a photoresist to the dielectric layer; and
transferring a pattern of the photoresist to the dielectric layer to pattern the opening.

18. The method of claim 17 , further comprising:
removing the photoresist; and
removing a damaged portion of the dielectric layer after the removing the photoresist.

19. The method of claim 7 , wherein descumming the first surface of the low-k dielectric layer further comprises:
breaking second bonds between silicon atoms and carbon atoms at the first surface of the low-k dielectric layer using the treatment precursor, wherein breaking second bonds creates second open terminal groups at the first surface of the low-k dielectric layer; and
bonding carbon atoms from the recovery precursor to the second open terminal group.

20. The method of claim 7 , wherein the recovery precursor is a carbon-containing precursor.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Kao Wan-Yi
• Hsu Kuang-Yuan
• Lee Tze-Liang

Classifications

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• H10P76/204 Primary

  of organic photoresist masks · CPC title

• H10P70/23 Primary

  during, before or after processing of insulating materials · CPC title

• H10P50/73

  using masks for insulating materials · CPC title

• H10P14/6532 Primary

  by exposure to a plasma · CPC title