Crystal growth atmosphere for oxyorthosilicate materials production

US10774440B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10774440-B2
Application numberUS-201916251118-A
CountryUS
Kind codeB2
Filing dateJan 18, 2019
Priority dateNov 24, 2010
Publication dateSep 15, 2020
Grant dateSep 15, 2020

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A method of growing a rare-earth oxyorthosilicate crystal, and crystals grown using the method are disclosed. The method includes preparing a melt by melting a first substance including at least one first rare-earth element and providing an atmosphere that includes an inert gas and a gas including oxygen.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of growing a rare-earth oxyorthosilicate crystal, comprising: preparing a melt by: melting a first substance comprising at least one first rare-earth element; melting at least one of: a substance comprising a group 2 element, a substance comprising a group 3 element, a substance comprising a group 6 element, or a substance comprising a group 7 element; providing an atmosphere comprising an inert gas and a gas including oxygen, wherein the atmosphere comprises less than 300 parts per million of oxygen, the atmosphere being in contact with a surface of the melt; where the gas including oxygen is derived from the decomposition of one of an acid, a solid salt, a liquid salt, or a combination thereof; wherein the acid, the solid salt or the liquid salt comprises sodium carbonate, potassium carbonate, ammonium carbonate, copper carbonate, lanthanum carbonate, cesium carbonate, or a combination thereof; where the acid, the solid salt and/or the liquid salt is located in a vessel that contains the melt at the time of the decomposition; providing a seed crystal; contacting the surface of the melt with the seed crystal; and withdrawing the seed crystal from the melt. 2. The method of claim 1 , wherein the gas including oxygen further comprises an additional oxygen-containing compound that disassociates to oxygen. 3. The method of claim 1 , wherein the inert gas has a thermal conductivity less than or equal to 150 mW/m-° K at the temperature used during crystal growth. 4. The method of claim 1 , wherein the gas including oxygen further comprises carbon dioxide. 5. The method of claim 1 , wherein the gas including oxygen further comprises at least one of carbon monoxide, oxygen, sulfur trioxide, phosphorous pentoxide, or an oxide of nitrogen. 6. The method of claim 5 , wherein the oxide of nitrogen comprises at least one of NO 2 , N 2 O, NO, N 2 O 3 , or N 2 O 5 . 7. The method of claim 1 , wherein the atmosphere comprises less than 200 parts per million of oxygen. 8. The method of claim 7 , wherein the inert gas comprises at least one of helium, argon, krypton, or xenon. 9. The method of claim 7 , wherein the inert gas comprises nitrogen. 10. The method of claim 1 , further comprising melting a second substance comprising a second rare-earth element, the second rare-earth element being incorporated into the rare-earth oxyorthosilicate crystal as a dopant. 11. The method of claim 10 , wherein the second rare-earth element is cerium. 12. The method of claim 1 , wherein the growing of the oxyorthosilicate crystal comprises growing a lutetium oxyorthosilicate crystal. 13. The method of claim 1 , wherein the acid, the solid salt or the liquid salt further comprises a nitrate, a phosphate, a manganate, a permanganate, a sulfate, a phosphate, or a combination thereof. 14. A method of decreasing oxygen vacancies incorporated in a rare-earth oxyorthosilicate crystal, the method comprising: preparing a melt by melting a first substance comprising at least one first rare-earth element; providing an atmosphere comprising an inert gas and a gas including oxygen, the atmosphere including less than 300 ppm oxygen, the atmosphere being in contact with a surface of the melt; where the gas including oxygen is derived from the decomposition of one of an acid, a solid salt, a liquid salt, or a combination thereof; wherein the acid, the solid salt or the liquid salt comprises sodium carbonate, potassium carbonate, ammonium carbonate, copper carbonate, lanthanum carbonate, cesium carbonate, or a combination thereof; where the acid, the solid salt and/or the liquid salt is located in a vessel that contains the melt at the time of the decomposition; providing a seed crystal; contacting the surface of the melt with the seed crystal; and withdrawing the seed crystal from the melt. 15. The method of claim 14 , wherein the gas including oxygen further comprises an additional oxygen-containing compound that disassociates to oxygen. 16. The method of claim 14 , wherein the inert gas has a thermal conductivity less than or equal to 150 mW/m-° K at the temperature used during crystal growth. 17. The method of claim 15 , wherein the additional oxygen-containing compound comprises carbon dioxide. 18. The method of claim 14 , wherein the additional oxygen-containing compound comprises least one of carbon monoxide, oxygen, sulfur trioxide, phosphorous pentoxide, or an oxide of nitrogen. 19. The method of claim 18 , wherein the oxide of nitrogen comprises at least one of NO 2 , N 2 O, NO, N 2 O 3 , or N 2 O 5 . 20. The method of claim 14 , wherein the acid, the solid salt or the liquid salt further comprises a nitrate, a phosphate, a manganate, a permanganate, a sulfate, a phosphate, or a combination thereof.

Assignees

Inventors

Classifications

  • Silicates · CPC title

  • Silicates · CPC title

  • adding crystallising materials or reactants forming it in situ to the melt · CPC title

  • Silicates · CPC title

  • C30B15/04Primary

    adding doping materials, e.g. for n-p-junction · CPC title

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What does patent US10774440B2 cover?
A method of growing a rare-earth oxyorthosilicate crystal, and crystals grown using the method are disclosed. The method includes preparing a melt by melting a first substance including at least one first rare-earth element and providing an atmosphere that includes an inert gas and a gas including oxygen.
Who is the assignee on this patent?
Siemens Medical Solutions Usa Inc
What technology area does this patent fall under?
Primary CPC classification C09K11/77742. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 15 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).