Display apparatus and fabricating method thereof
US-9978728-B2 · May 22, 2018 · US
US10770440B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10770440-B2 |
| Application number | US-201715459336-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 15, 2017 |
| Priority date | Mar 15, 2017 |
| Publication date | Sep 8, 2020 |
| Grant date | Sep 8, 2020 |
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The present disclosure relates to semiconductor structures and, more particularly, to a micro-light emitting diode (LED) display assembly and methods of manufacture. The structure includes an interposer and a plurality of micro-LED arrays each of which include a plurality of through-vias connecting pixels of the plurality of micro-LED arrays to the interposer.
Opening claim text (preview).
What is claimed: 1. A structure, comprising: an interposer; a plurality of light emitting diode (LED) arrays each of which comprise a plurality of pixels composed of multiple sub-pixels; a plurality of through-vias composed of an insulator liner, diffusion barrier metal and electroplated metallization feature, each through via of the plurality of through-vias being directly below and connecting to each pixel of the plurality of pixels of each of the plurality of LED arrays by a metal pad that is in physical contact and directly below the each pixel, wherein each through via of the plurality of through vias is further connected to the interposer and a single through via is used per pixel; and a horizontal plate composed of GaN, wherein the plurality of pixels share the horizontal plate composed of GaN from above the plurality of pixels. 2. The structure of claim 1 , wherein the interposer is a silicon interposer with driver circuits. 3. The structure of claim 1 , wherein the interposer is a glass interposer. 4. The structure of claim 1 , wherein the through-vias are through silicon vias. 5. The structure of claim 4 , wherein each of the pixels is connected to the interposer by a separate one of the through silicon vias. 6. The structure of claim 1 , wherein the pixels are composed of GaN and the through-vias are copper through silicon vias integrated into a same die as the pixels. 7. The structure of claim 1 , wherein the through-vias are connected to the interposer by pillars which match a pitch of the through-vias. 8. The structure of claim 1 , wherein the plurality of LED arrays are equally spaced apart on the interposer. 9. The structure of claim 8 , wherein an across die pixel pitch is equal to a pixel pitch within each of the plurality of LED arrays. 10. The structure of claim 1 , wherein a diameter of the through vias is about ½ a pixel pitch. 11. The structure of claim 1 , further comprising a back-end of the line wiring scheme which is interposed between the interposer and the plurality of LED arrays, the back-end of the line wiring scheme connects the each of the plurality of through-vias of each of the pixels to the interposer by separate pillars aligned with each of the plurality of through-vias of each of the pixels. 12. A structure comprising: an interposer comprising a plurality of through vias; a plurality of light emitting diode (LED) arrays each of which comprises a plurality of pixels, a plurality of through-vias composed of an insulator liner, a barrier metal and electroplated metallization feature and each one of the plurality of through vias being directly below and connecting a separate pixel of the plurality of pixels by a metal pad that is directly below and in physical contact with the separate pixel, and wherein each pixel of the plurality of pixels is composed of multiple sub-pixels; a back-end of the line wiring scheme which is positioned between and connected to the interposer and the plurality of LED arrays by a plurality of pillars, wherein each pillar of the plurality of pillars is aligned with and connects to the separate pixel of the plurality of pixels by a respective one of the plurality of through-vias such that only a single pillar the single pixel, respectively; and a horizontal plate composed of GaN, wherein the plurality of pixels share the horizontal plate composed of GaN from above the plurality of pixels. 13. The structure of claim 12 , wherein: the plurality of LED arrays are equally spaced apart; and an across die pixel pitch is equal to a pixel pitch within each of the plurality of -LED arrays. 14. The structure of claim 13 , wherein the pixels are composed of GaN and the through-vias of the plurality of the plurality of LED arrays are copper through silicon vias integrated into a same die as the pixels. 15. The structure of claim 14 , wherein the through silicon vias are connected to the back end of the-line wiring scheme by the pillars. 16. The structure of claim 15 , wherein the pillars are solder connections. 17. The structure of claim 15 , wherein the pillars match a pitch of the through silicon vias. 18. The structure of claim 14 , wherein a diameter of each through-via is about ½ a pixel pitch. 19. The structure of claim 12 , wherein the back-end of the line interposer is a silicon interposer with driver circuits. 20. The structure of claim 12 , wherein the back-end of the line interposer is a glass interposer.
Package configurations · CPC title
wherein the TFTs are in active matrices · CPC title
characterised by multiple TFTs · CPC title
Interconnections, e.g. lead-frames, bond wires or solder balls · CPC title
containing nitrogen, e.g. GaN · CPC title
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